Gas intake system and substrate processing equipment
A technology of air intake system and air inlet, applied in the field of microelectronics, can solve the problems of low efficiency, limited shortening of the intake pipeline 20, and long exhaust time of residual gas, so as to improve process efficiency, shorten exhaust time, The effect of improving efficiency
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[0031] In order to enable those skilled in the art to better understand the technical solutions of the present invention, the air intake system and substrate processing equipment provided by the present invention will be described in detail below with reference to the accompanying drawings.
[0032] figure 2 It is a schematic diagram of the intake system provided by the first embodiment of the present invention. See figure 2 The air inlet system includes an air inlet communicating with the reaction chamber, an air inlet pipe, an exhaust pump 35, and at least one gas source, and different gas sources have different gas types. Wherein, the gas inlet can be a component or structure that can communicate with the reaction chamber, such as a gas nozzle or a through hole; the gas source includes at least one carrier gas source and at least one reactive gas source; A gas that does not physically or chemically interact with the substrate during the etching process and is used to adjust ...
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