A packaging method for a photosensitive chip and a packaging structure using the packaging method
A photosensitive chip and packaging method technology, applied in radiation control devices, etc., can solve the problems of high process cost, process cost reduction, photosensitive chip packaging pollution, etc., and achieve simplified packaging process, reduced packaging cost, and reduced requirements for process capability Effect
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Embodiment 1
[0023] A method for encapsulating a photosensitive chip, the manufacturing method comprising the following steps: Process 1: protecting the photosensitive area of the photosensitive chip; wherein, the step of protecting the photosensitive area further includes the following steps: first, a transparent IR glass 1 is provided, and the photosensitive area is protected by photolithography. Form a wall structure on the IR glass 1 to make a walled glass; then cut the walled glass to form a single optical cover; according to the size and shape of the photosensitive chip 3 wafer, reshape the optical cover on a glued substrate 2 First, form an optical glass that matches the photosensitive chip 3 wafer; Step 2: Thinning and cutting, and dividing the photosensitive chip into individual chips; Step 3: Encapsulation by WireBond process.
[0024] The finally formed CIS packaging structure includes IR glass 1, bonding wire 6, substrate 2, photosensitive chip 3, CV wall 4 and pad 7, photosen...
Embodiment 2
[0025] Embodiment 2, the rest is the same as the above-mentioned embodiment 1, the difference is that the above process 1 and process 2 can also be to first thin the photosensitive chip, then protect the photosensitive area of the photosensitive chip, and then thin and protect the photosensitive Regions of the photosensitive chip are diced into individual chips.
Embodiment 3
[0026] Embodiment 3, the rest is the same as the above-mentioned embodiment 1, the difference is that in the above-mentioned step 1, to protect the photosensitive area of the photosensitive chip, 1000 angstroms of aluminum or silicon dioxide can also be deposited first.
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