Etching liquid for forming texture
A technology of etching liquid and texture, which is applied in the field of etching liquid, and can solve the problem that the etching liquid cannot be as it is.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment
[0042] The present invention is described more specifically based on examples. However, the present invention is not limited to the following examples.
[0043] [Example, comparative example]
[0044] Sodium hydroxide and a phosphonic acid derivative or a salt thereof were mixed at a ratio shown in Table 1, and then ion-exchanged water was added to prepare an aqueous solution. It is the etching solution of the present invention. The etchant was heated to 80° C., and a single crystal silicon wafer cut using any of the loose abrasive systems or fixed abrasive systems shown in Table 1 was immersed in the etchant for 20 minutes, then washed with water and dried. The texture structure of the obtained silicon wafer was evaluated by the following two items.
[0045] (1) Appearance evaluation of texture structure
[0046]The texture structure was observed by using a scanning electron microscope (JEOL's JSM-6380LV). Observed under 1000 times magnification, the surface of the base ...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com