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Device for generation of high-power vacuum ultraviolet laser by direct frequency multiplication and method thereof

A vacuum ultraviolet and ultraviolet laser technology, which is applied in lasers, laser components, optics, etc., can solve the problems of low frequency doubling conversion efficiency, unstable power, low output power, etc., achieve high frequency doubling conversion efficiency and increase output power , the effect of narrow line width

Active Publication Date: 2014-10-15
TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI
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Problems solved by technology

[0006] The invention provides a device and method for generating high-power vacuum ultraviolet laser, which can solve the current problem of being unable to generate higher power output of hundreds of milliwatts or even watt-level vacuum ultraviolet lasers, and solve the problem that when generating higher power, the multiplier Low frequency conversion efficiency, low output power, unstable power, and difficulty in practical application

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  • Device for generation of high-power vacuum ultraviolet laser by direct frequency multiplication and method thereof
  • Device for generation of high-power vacuum ultraviolet laser by direct frequency multiplication and method thereof
  • Device for generation of high-power vacuum ultraviolet laser by direct frequency multiplication and method thereof

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Embodiment Construction

[0033] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.

[0034] The invention provides a device for direct frequency doubling to generate high power: hundreds of milliwatts or even watts of vacuum ultraviolet laser, the device is as figure 1 The shown includes: a narrow-linewidth all-solid-state ultraviolet laser pump source (1), a direct frequency doubling device (3), a vacuum cavity (5) and a power measurement system (6); the device also includes a beam shaping system (2) And four-dimensional pre-adjustment flat turntable (4);

[0035] Wherein the beam shaping system is located between the laser pump source and the vacuum chamber; the four-dimensional pre-adjusted translation table is fixed in the vacuum chamber, including a three-dimensional electric translation table, a one-dimensional electric rotation table and corresponding adapter plates; The direct frequency doubling device is fix...

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Abstract

The invention provides a device for generation of high-power vacuum ultraviolet laser by direct frequency multiplication and a method thereof. The device comprises a laser pumping source, a direct frequency multiplication device, a vacuum cavity, a power measuring system, a light beam shaping system and a four-dimensional pre-adjusting flat turning table. The laser pumping source is a narrow line-width all-solid-state ultraviolet laser pumping source. The light beam shaping system is arranged between the laser pumping source and the vacuum cavity. The four-dimensional pre-adjusting flat turning table is fixed in the vacuum cavity. The direct frequency multiplication device is fixed on an adapter plate. The method comprises the steps that phase matching under the low-power pumping condition is firstly realized, based on which the angle of the direct frequency multiplication device is pre-adjusted so that phase matching under the high-power condition is realized in advance. High-power hundred milliwatt and watt level vacuum ultraviolet laser output can be realized so that the generated vacuum ultraviolet laser has characteristics of being narrow in line-width, high in frequency multiplication conversion efficiency, high in frequency multiplication output power, stable in output power under high power and practical.

Description

technical field [0001] The invention relates to the field of all-solid-state vacuum ultraviolet lasers, in particular to a device and method for direct frequency doubling to generate high-power vacuum ultraviolet lasers. Background technique [0002] Vacuum ultraviolet (VUV) light source generally refers to the electromagnetic radiation band with a wavelength between 40nm and 185nm. The field has important application value and is one of the most important development directions in the laser field. [0003] At present, vacuum ultraviolet laser sources mainly include ArF excimer lasers and all-solid-state lasers generated by nonlinear crystal sum frequency (such as TU-L series products of Photonic Company). The excimer laser source is currently the most widely used vacuum ultraviolet coherent light source, and its wavelength is 157nm and other specific spectral lines in the vacuum ultraviolet band. Excimer lasers have the advantages of high average power, high pulse energy,...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S3/109H01S3/094G02F1/37G02F1/355
Inventor 宗楠杨峰徐志张申金彭钦军许祖彦王志敏
Owner TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI
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