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NEA photoelectric cathode preparation process

A preparation process and photocathode technology, applied in cold cathode manufacturing, electrode system manufacturing, discharge tube/lamp manufacturing, etc., can solve the problems of sensitivity, stability, noise, life and yield gap of the three generations of micro-light tubes, etc. Achieve the effect of good desorption effect, intuitive activation degree and easy control

Inactive Publication Date: 2014-10-22
SICHUAN TIANWEI ELECTRONICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

After more than ten years of development, China has made great progress in the research of NEA photocathode, but there is still a big gap between the three generations of micro-light tubes compared with foreign countries in terms of sensitivity, stability, noise, life and yield.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] A process for preparing NEA photocathode, comprising sequential high-temperature Cs / O cyclic activation and low-temperature Cs activation on P-type GaN materials, wherein the step of high-temperature Cs / O cyclic activation further includes sequential chemical cleaning and high-temperature heating purification, Between the high temperature Cs / O cycle activation and the low temperature Cs activation step, low temperature heating purification is also included, and the low temperature Cs / O cycle activation step is also included after the low temperature Cs activation step;

[0018] The chemical cleaning includes using carbon tetrachloride, acetone, anhydrous ethanol, and deionized water to perform ultrasonic cleaning on the sample in sequence, and the cleaning time is within the range of 4-5min;

[0019] The high-temperature heating and purification includes a heating step, a heat preservation step and a cooling step that are performed in sequence. The temperature upper limi...

Embodiment 2

[0024] This embodiment is further limited on the basis of Embodiment 1. In order to further optimize the activation effect or obtain a better quality photocathode, the chemical cleaning further includes an etching step arranged after the ultrasonic cleaning, and the etching step adopts the following steps: Concentrated sulfuric acid, hydrogen peroxide, and deionized water are chemically etched in a mixture of 2:2:1.

[0025] The etching time is in the range of 8min-10min, and the etching temperature is between 25°C-32°C.

[0026] After the chemical etching step, a cleaning step is further included, and the cleaning step is to use deionized water to perform ultrasonic cleaning on the sample for no less than 2 minutes.

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Abstract

The invention discloses an NEA photoelectric cathode preparation process. The method comprises performing high-temperature Cs / O circulated activation and low-temperature Cs activation on P-type GaN materials. The method also comprises the steps of chemical cleaning and high-temperature heating and purification before the high-temperature Cs / O circulated activation, low-temperature heating and purification between the high-temperature Cs / O circulated activation and the low-temperature Cs activation, and low-temperature Cs / O circulated activation after the low-temperature Cs activation, wherein the chemical cleaning comprises ultrasonic cleaning of samples, the high-temperature heating and purification comprises a heating step, a heat conservation step and a cooling step which are sequentially implemented, and the low-temperature heating and purification comprises a low-temperature heating step, a low-temperature heat conservation step and a low-temperature cooling step; the activation vacuum degree of the high-temperature heating and purification, the high-temperature Cs / O circulated activation, the low-temperature Cs activation, the low-temperature Cs activation, the low-temperature heating and purification and the low-temperature Cs / O circulated activation is between 10(-7) Pa and 5*10(-6) Pa. The NEA photoelectric cathode activation method is intuitive in activation degree, easy to control and beneficial to the property of products.

Description

technical field [0001] The invention relates to a production process of miniature lamps used for lighting or indication, in particular to a preparation process of NEA photocathode. Background technique [0002] Negative Electron Affinity (NEA) photocathodes have the advantages of wide spectral response range, high sensitivity, small dark emission, concentrated emission electron energy distribution and angular distribution, and great potential for long-wave response expansion, and are widely used in vehicle, airborne and individual soldiers. At the same time, as a high-performance spin electron source, NEA photocathode has also been widely used in high-energy physics, microelectronics technology, electron beam planar printing and electron microscopy. After more than ten years of development, great progress has been made in the research of NEA photocathode in China, but there is still a big gap between the sensitivity, stability, noise, life and yield of the third-generation m...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J9/02
Inventor 曾卢游华亮
Owner SICHUAN TIANWEI ELECTRONICS