Method and system for depositing indium tin oxide at low temperature

A technology of indium tin oxide and deposition method, which is applied in the direction of ion implantation plating, metal material coating process, coating, etc., can solve the problems of lower resistivity and low transmittance, and achieve improved production efficiency and good crystallinity , Improve the effect of coating quality

Active Publication Date: 2014-10-29
深圳豪威显示科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The disadvantage of this coating method is that there is a requirement for the indium tin oxide target material, a special proportion of the indium tin oxide target material is required, and special reaction gases such as hydrogen and nitrogen are also required.
[0008] In addition, some existing so-called low-temperature coatings usually encounter

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  • Method and system for depositing indium tin oxide at low temperature
  • Method and system for depositing indium tin oxide at low temperature
  • Method and system for depositing indium tin oxide at low temperature

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Embodiment Construction

[0018] The present invention will be described in detail below in conjunction with specific embodiments and accompanying drawings.

[0019] see figure 1 , shows an indium tin oxide low-temperature deposition system 10 provided by an embodiment of the present invention, which includes a vacuum coating chamber 12, an indium tin oxide target 13, and a substrate support device 14 opposite to the target 13, and also includes a cooling A cooling and degassing device 15 and a magnetic field device 17 for removing water vapor and impurity gases in the vacuum coating chamber 12, the cooling and degassing device 15 is installed around the indium tin oxide target 13, and the magnetic field sent by the magnetic field device 17 makes the indium tin oxide target The surface magnetic field strength is in the range of 600-900 Gauss.

[0020] figure 1 Among them, the base material 18 can be a sheet base material or a roll material, and the base material example is a sheet, and the base mater...

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Abstract

The invention relates to a method and a system for depositing indium tin oxide at a low temperature. The method comprises the following steps of placing a base material into a vacuum film-coating chamber in which an indium tin oxide target material is provided; installing a cooling and vapor-removing device at the periphery of the indium tin oxide target; carrying out vapor-removal treatment on the base material by the cooling and vapor-removing device to remove vapor and impurity gases; controlling surface magnetic field strength of the indium tin oxide target material to be within a range of 600-900 gausses, carrying out film-coating in the presence of a working gas at a temperature of 100 DEG C, and forming an indium tin oxide film on the base material. The system comprises a vacuum film-coating chamber, an indium tin oxide target material, a base material supporting device, a cooling and vapor-removing device and a magnetic field device. The method and the system disclosed by the invention can be carried out at a low temperature, the cooling and vapor-removing device is used for refrigerating to capture vapor and impurity gases, purify and deposit an atmosphere and improve film-coating quality, and magnetic field strength is improved to obtain an indium tin oxide crystal with high quality and low resistivity.

Description

technical field [0001] The invention relates to the technical field of thin film deposition, in particular to a low-temperature deposition method and system of indium tin oxide. Background technique [0002] The vacuum coating technology of indium tin oxide (referred to as ITO) is becoming more and more mature, especially at relatively high temperatures, the coating technology of indium tin oxide is close to perfection, but at low temperatures, especially at room temperature, indium oxide The tin coating technology is not so mature, and the quality of indium tin oxide film formation at low temperature is also very low, which in turn affects the function of its products. [0003] Now in the touch screen market, the single-chip touch screen is printed with ink first, and then coated with indium tin oxide. The ink is not resistant to high temperature, especially white ink and colored ink, which are very sensitive to temperature. In addition, the transparent indium tin oxide for...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/08
Inventor 许生王学雷许朝阳
Owner 深圳豪威显示科技有限公司
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