Probe self-damping method applied to fast scanning atomic force microscopy
An atomic force microscope and fast scanning technology, applied in scanning probe technology, scanning probe microscopy, measuring devices, etc., can solve the problems of complex focusing optical path, difficulty in applying fast scanning atomic force microscope, low first resonance frequency, etc. Achieve the advantage of high efficiency, the advantage of realization feasibility, the effect of low control voltage
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[0030] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.
[0031] The steps of the inventive method are as follows:
[0032] 1) Processing ZnO thin films on atomic force microscope probes;
[0033] The top layer of Ti / Au alloy film 2, the middle layer of ZnO film 3, and the bottom layer of Ti / Au alloy film 4 are processed to the back of the silicon nitride probe 1 of the atomic force microscope in a sandwich structure by dry etching. figure 2 Shown is the image of the silicon nitride probe 1 under the electron microscope after the film structure has been processed, and its cross-sectional view is shown in image 3 As shown, the thickness of the top layer Ti / Au alloy film 2 and the bottom layer Ti / Au alloy film 4 are both about 0.2um, and the thickness of the ZnO thin film 3 is about 2um. The positive electrode 6 and the negative electrode 7 are respectively drawn from the top layer Ti / Au alloy film ...
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