Nano cerium oxide polishing liquid composition

Abstract

The invention provides a cerium oxide polishing liquid suitable for polishing rock crystals, photomask quartz glass, semiconductor devices and glass-prepared hard disks and polishing low-dielectric-constant materials for interlayer insulating films of semiconductor devices of siloxane and the like. The polishing liquid contains surface modified nano cerium oxide, silicon dioxide, a dispersing agent, an oxidizing agent, an alkaline compound, an alcohol compound and water. Preferably, stearic acid treated nano cerium oxide is selected, the particle size is preferably 10-100 nm, and the mass content is 1-10%; preferably, the particle size of the colloidal silicon dioxide is 40-100 nm, and the mass content is 0.1-5%; preferably, the polishing liquid contains 0.01-5% of the high-molecular dispersing agent, 1-10% of the hydrogen peroxide oxidizing agent, and the balance an alcohol-water mixture, wherein the pH value of a slurry is 8-10. The nano cerium oxide polishing liquid selects the surface modified nano cerium oxide, has addition of a proper amount of the silicon dioxide, thereby reducing the grinding trigger time and improving the processing stability.

Description

Technical field [0001] The invention relates to a nano ceria polishing liquid composition, which has good dispersibility and storage stability, and has excellent polishing properties, high polishing efficiency, good surface performance, and no scratches. Low dielectric constant materials for interlayer insulating films used in semiconductor devices such as crystals, quartz glass for photomasks, semiconductor devices, glass hard disks, siloxanes, organic polymers, porous materials, CVD polymers, etc. Of polishing. Background technique [0002] Rare earth oxide cerium oxide is a cheap and versatile material. Compared with alumina and silica abrasives, cerium oxide abrasives have low hardness, which makes it difficult to scratch the abrasive surface, and has low polishing surface roughness and polishing efficiency. High advantages, so it is widely used in semiconductor, insulating thin layer, precision glass, VLSI silicon dioxide dielectric layer chemical mechanical polishing, as w...

AI Technical Summary

Problems solved by technology

However, the traditional cerium oxide slurry has the following disadvantages: after long-term storage, the slurry is unstable, cerium oxide particles are easy to precipitate, and are