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Method for forming patterns using laser etching

A laser etching and patterning technology, applied in the manufacturing of electrical components, circuits, semiconductor/solid-state devices, etc., can solve problems such as the inability to solve the visibility problem of transparent electrodes, to solve the visibility problem, achieve pattern resolution, excellent The effect of fine line widths

Inactive Publication Date: 2014-12-24
INKTEC CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In the prior art mentioned above, various methods of forming micro-patterned electrodes using laser light are disclosed, and a method of easily etching transparent electrodes using high energy in a short wavelength band is described. However, there are problems that cannot be solved for transparent electrodes. Disadvantages of Visibility Issues

Method used

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  • Method for forming patterns using laser etching
  • Method for forming patterns using laser etching
  • Method for forming patterns using laser etching

Examples

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manufacture example 1

[0039] Manufacturing example 1 (formation of metal nanowire layer)

[0040] Metal nanowires and additives in various weight ratios are added to pure water to make them uniformly dispersed and fully mixed to manufacture metal nanowire inks for transparent electrodes. Use the manufactured metal nanowire ink to coat conductive electrode films on various substrate films by rod coating method, and dry them in a hot air oven at a temperature range of 80-130°C for 1-10 minutes. Various substrates are endowed with hydrophilic groups through the pretreatment process, so that the electrode ink composed of water solvent is evenly coated.

manufacture example 2

[0041] Production example 2 (formation of protective layer)

[0042] The protective film layer was produced by coating various concentrations of heat-curable and UV-curable protective film solutions on the manufactured conductive electrode by the disclosed coating method. Coat the protective film solution on the conductive electrode by spin coating method, dry in a hot air oven at 120°C for 1-10 minutes, or, for the UV type, perform curing in a UV curing unit at 1000-1500mJ. The electrical characteristics of the conductive electrode coated with the protective film layer vary depending on the ratio of metal nanowires, specifically, in the range of 100-300Ω / □. In addition, regarding the optical properties, the electro-optical transmittance is in the range of 89-91%, and the haze is in the range of 1-3%, and the optical properties will be different according to the choice of different solvents.

Embodiment 2

[0046] On the conductive electrode layer produced by the method of Production Example 1, a protective film was formed by the method of Production Example 2. In order to form a fine pattern on the surface of the electrode, an IR laser with a wavelength of 300-1064nm (manufacturer: EO Technics) at a frequency of 400kHz and a pulse width of 1-50ns is directly irradiated onto the surface of the electrode layer to achieve a fine pattern. (refer to image 3 )

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Abstract

The invention relates to a method for manufacturing the fine pattern of a conductive metal wire transparent electrode having superior index matching properties using various laser powers. More particularly, the method for manufacturing the fine pattern of a conductive metal wire transparent electrode includes: (1) forming a uniform conductive metal nanowire on various base materials; (2) forming various polymer layers, which are optically transparent and have insulating properties, on the conductive transparent electrode; and (3) directly irradiating the surface of a conductive film with a laser in order to form a fine pattern electrode. Thus, the method for manufacturing a conductive pattern electrode includes: uniformly arranging metal nanowires to form a conductive layer having low resistance; and forming a protection film using an insulating polymer on the conductive electrode layer to protect the conductive electrode layer. Also, when such technology for forming the conductive fine pattern electrode is used, the laser power may be varied in order to address the chronic visibility problems of the transparent electrode and to achieve superior pattern resolution and fine line width.

Description

technical field [0001] The present invention relates to a method for manufacturing a conductive micro-patterned electrode using a laser. More specifically, it is characterized in that a low-resistance conductive layer is formed by uniformly arranging metal nanowires, and an insulating polymer is formed on the conductive electrode layer. protective film to protect the conductive electrode film. In addition, when using this technique of forming a conductive micro-patterned electrode by changing the laser power, it is possible to solve the problem of visibility inherent in transparent electrodes and achieve excellent pattern resolution and fine line width. Background technique [0002] In general, electronic components such as displays and transistors commonly require fine patterns of metal thin films for electrodes and metalization lines. The micropatterns of these metal thin films are usually formed through vacuum deposition and photolithography processes of the thin films. ...

Claims

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Application Information

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IPC IPC(8): H01L21/027
CPCH01L21/461
Inventor 郑光春李仁淑崔静娥
Owner INKTEC CO LTD
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