Atomic layer deposition preparation method of CuNi alloy film for catalytic methanol synthesis reaction

Abstract

The invention discloses an atomic layer deposition preparation method of a CuNi alloy film for catalytic methanol synthesis reaction, which comprises the following steps: cleaning a substrate; applying a film; putting in a reaction cavity, and introducing a Cu-containing precursor; introducing nitrogen to remove non-adsorbed Cu precursor residues; introducing a reducer to react the reducer with the Cu-containing product; introducing nitrogen to remove the reaction residues of the reducer and Cu-containing product; introducing a Ni-containing precursor; introducing nitrogen to remove the reaction residues and excess reducer; introducing a reducer to react the reducer with the Ni-containing product; introducing nitrogen to remove the reaction residues of the reducer and Ni-containing product; forming a CuNi film on the substrate; and repeating the operation many times to form a plurality of CuNi films on the substrate, thereby completing the preparation of the CuNi alloy. The Ni-containing precursor can be introduced before the Cu-containing precursor. The material has favorable reactivity for catalytic methanol synthesis.

Description

technical field [0001] The invention relates to the technical field of deposition methods of alloy thin films, in particular to an atomic layer deposition preparation method of CuNi alloy thin films used to catalyze methanol synthesis reactions. Background technique [0002] Methanol is an important organic chemical raw material and an ideal alternative clean fuel. Especially with the change of the energy structure, the proportion of the dominant petroleum resources in the entire energy structure will gradually decrease, and the importance of natural gas and coal as chemical and energy raw materials will be further highlighted. As a key process of C1 chemical industry, synthetic methanol is one of the best ways to produce other chemical products or synthetic fuels from natural gas or coal. At present, the low-pressure methanol synthesis catalysts widely used in industry are copper-based catalysts. This catalyst still has problems such as poor thermal stability, easy sinter...

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Problems solved by technology

[0005] In view of the deficiencies in the prior art, the object of the present invention is to provide an atomic layer deposition method of a CuNi alloy thin film, and use it as a catalyst for methanol synthesis reaction, in order to solve the poor thermal stability of the existing catalyst for the reaction , easy sintering and other issues to provide a theoretical basis for the preparation of similar alloy materials to lay a good foundation

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