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Method for manufacturing array substrate of liquid crystal display

A liquid crystal display and array substrate technology, which is applied in the field of manufacturing array substrates for liquid crystal displays, and can solve the problems of poor etching performance of three-layer copper-based metal films, poor heat release stability and poor storage stability, etc.

Inactive Publication Date: 2015-01-14
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When the copper-molybdenum film was etched with this etching solution, the band profile had excellent linearity, and there was no residue of the molybdenum alloy after etching, but the problem was that the copper-molybdenum film thus etched was not stable after the etching solution was stored for 30 days. The number of sheets is significantly reduced, so its exothermic stability and its storage stability are extremely poor, and its etching performance to three-layer copper-based metal films such as MoTi / Cu / MoTi films is extremely poor

Method used

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  • Method for manufacturing array substrate of liquid crystal display
  • Method for manufacturing array substrate of liquid crystal display
  • Method for manufacturing array substrate of liquid crystal display

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1-1 to 1-4 and comparative example 1-1 to 1-4

[0039] Examples 1-1 to 1-4 and Comparative Examples 1-1 to 1-4: Preparation of etchant compositions

[0040] As given in Table 1 below, 180 kg of the etchant compositions of Examples 1-1 to 1-4 and Comparative Examples 1-1 to 1-4 were prepared.

[0041] [Table 1]

[0042] (Unit: wt%)

[0043]

[0044] ※Fluorinated compounds: ammonium bifluoride (NH 4 F·HF)

[0045] ※Azole compound: 3-amino-1,2,4-triazole

[0046] ※IDA: Iminodiacetic acid

[0047] ※NTA: Nitrilotriacetic acid

Embodiment 2-1 to 2-4 and comparative example 2-1 to 2-3

[0074] Examples 2-1 to 2-4 and Comparative Examples 2-1 to 2-3: Preparation of etchant compositions

[0075] As given in Table 3 below, 180 kg of the etchant compositions of Examples 2-1 to 2-4 and Comparative Examples 2-1 to 2-3 were prepared.

[0076] [table 3]

[0077] (Unit: wt%)

[0078]

[0079] ※Fluorinated compounds: ammonium bifluoride (NH 4 F·HF)

[0080] ※Azole compound: 3-amino-1,2,4-triazole

[0081] ※TEG: Triethylene glycol

[0082] ※IDA: Iminodiacetic acid

[0083] Test Example: Performance Evaluation of Etchant Composition

[0084]

[0085] MoTi was deposited on a glass substrate (100mm×100mm), a copper film was deposited on the MoTi, and then a photoresist with a predetermined pattern was formed on the glass substrate through a photolithography process. Thereafter, an etching process of Cu / MoTi was performed using the respective etchant compositions of Examples 2-1 to 2-4 and Comparative Examples 2-1 to 2-3.

[0086] The etching process was pe...

Embodiment 3-1 to 3-5 and comparative example 3-1 to 3-3

[0117] Examples 3-1 to 3-5 and Comparative Examples 3-1 to 3-3: Preparation of etchant compositions

[0118] As given in Table 5 below, 180 kg of the etchant compositions of Examples 3-1 to 3-5 and Comparative Examples 3-1 to 3-3 were prepared.

[0119] [table 5]

[0120] (Unit: wt%)

[0121]

[0122] ※Fluorinated compounds: ammonium bifluoride (NH 4 F·HF)

[0123] ※Azole compound: 3-amino-1,2,4-triazole

[0124] ※Polyol type surfactant: triethylene glycol

[0125] ※IDA: Iminodiacetic acid

[0126] ※Phosphate: sodium dihydrogen phosphate

[0127] Test Example: Evaluation of Etchant Composition Performance

[0128]

[0129] MoTi was deposited on a glass substrate (100mm×100mm), a copper film was deposited on the MoTi, and then a photoresist with a predetermined pattern was formed on the glass substrate through a photolithography process. Thereafter, an etching process of a three-layer film (MoTi / Cu / MoTi) was performed using the respective etchant compositions o...

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Abstract

The present invention relates to a method for manufacturing the array substrate of a liquid crystal display, which comprises the following steps of a) forming a gate electrode on a substrate; b) forming a gate insulating layer on the substrate with the gate electrode; c) forming a semiconductor layer (n+a-Si: H and a-Si: H) on the gate insulating layer; d) forming a source electrode / a drain electrode on the semiconductor layer; and e) forming a pixel electrode connected to the drain electrode.

Description

[0001] Cross References to Related Applications [0002] This application claims Korean Patent Application KR10-2013-0077822 filed on July 3, 2013, Korean Patent Application KR10-2013-0077823 filed on July 3, 2013, and Korean Patent Application KR10-2013 filed on July 3, 2013 2013-0077824, which is hereby incorporated by reference in its entirety into this application. technical field [0003] The invention relates to a method for manufacturing an array substrate for a liquid crystal display. Background technique [0004] A typical electronic circuit for driving semiconductor devices and flat panel displays is a thin film transistor (TFT). Generally, a manufacturing process of a TFT includes the steps of: forming a metal film as a material for gate electrode lines and data lines on a substrate; forming a photoresist on selective regions of the metal film; and using the The photoresist acts as a mask to etch the metal film. [0005] Generally, a copper film or copper alloy...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1333
CPCH01L27/1259G02F1/133351C23F1/18C23F1/44
Inventor 金镇成李铉奎赵成培梁圭亨李恩远权玟廷
Owner DONGWOO FINE CHEM CO LTD