Substrate with transparent electrode, method for manufacturing same, and touch panel

A technology of transparent electrodes and manufacturing methods, applied in cable/conductor manufacturing, circuits, electrical components, etc., can solve problems such as no research, and achieve the effect of improving identification

Active Publication Date: 2015-01-21
KANEKA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in Patent Documents 3 and 4, there is no research on p...

Method used

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  • Substrate with transparent electrode, method for manufacturing same, and touch panel
  • Substrate with transparent electrode, method for manufacturing same, and touch panel
  • Substrate with transparent electrode, method for manufacturing same, and touch panel

Examples

Experimental program
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Effect test

Embodiment 1

[0111] On one side of a biaxially stretched PET film with a thickness of 188 μm and a hard coat layer (refractive index 1.53) made of polyurethane resin formed on both sides, silicon Oxide (SiO x Layer) composed of medium refractive index transparent dielectric layer (first dielectric layer), high refractive index transparent dielectric layer (second dielectric layer) composed of niobium oxide, and silicon oxide (SiO 2 ) composed of a low refractive index dielectric layer (third dielectric layer).

[0112] First, using B-Si as the target material, while introducing oxygen / argon (20sccm / 400sccm) mixed gas into the device, the pressure in the device is 0.2Pa, the substrate temperature is -20°C, and the power density is 1.4W / cm 2 sputtering under conditions. Obtained SiO y The film thickness of the layer was 5 nm, and the refractive index was 1.65.

[0113] In the SiO x A high refractive index transparent dielectric layer is formed on the layer. Using niobium (Nb) as the ta...

Embodiment 2～9 and comparative example 1～3

[0119] Film thickness d of the second dielectric layer 2, The film thickness d of the third dielectric layer 3 And the film thickness of the transparent electrode layer was changed as shown in Table 1. Other than that, in the same manner as in Example 1, after forming the first dielectric layer, the second dielectric layer, the third dielectric layer, and the transparent electrode layer sequentially, patterning and heat treatment of the transparent electrode layer were performed.

Embodiment 10

[0122] The magnetic flux density at the time of forming the transparent electrode layer can be adjusted to 16 mT by changing the permanent magnet attached to the sputtering apparatus. The voltage of the MF power supply during sputtering film formation was 511V. Except for this, patterning and heat treatment of the transparent electrode layer were performed after sequentially forming the first dielectric layer, the second dielectric layer, the third dielectric layer, and the transparent electrode layer in the same manner as in Example 1 above.

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Abstract

The purpose of the present invention is to provide a substrate with a transparent electrode in which the pattern cannot be readily visually identified even when the transparent electrode layer has been patterned, and a method for manufacturing the same. This substrate with a transparent electrode has, on at least one of the surfaces of a transparent film, a first dielectric layer, a second dielectric layer, a third dielectric layer, and a patterned transparent electrode layer, in the sequence listed. The first dielectric layer is a silicon oxide layer having SiOx as a principal component. The second dielectric layer is a metal oxide layer having an oxide of a metal as a principal component. The third dielectric layer is a silicon oxide layer having SiOy as a principal component. The transparent electrode layer is an electroconductive metal oxide layer having an indium-tin composite oxide as a principal component. The refractive index (n1) of the first dielectric layer, the refractive index (n2) of the second dielectric layer, and the refractive index (n3) of the third dielectric layer satisfy the relationship n3 < n1 < n2. Each of the dielectric layers and the transparent electrode layer preferably has a film thickness and a refractive index within a predetermined range.

Description

technical field [0001] The present invention relates to a substrate with a transparent electrode applicable to an electrostatic capacitive touch panel and a manufacturing method thereof. Moreover, this invention relates to the touch panel provided with the board|substrate with this transparent electrode. Background technique [0002] A substrate with a transparent electrode in which a transparent electrode layer is formed on a transparent substrate such as a film or glass can be used as a transparent electrode for displays such as touch panels, light-emitting elements, and photoelectric conversion elements. When the substrate with transparent electrodes is used for position detection of capacitive touch panels, the transparent electrode layer can be finely patterned. As a patterning method, for example, after forming a transparent electrode layer on substantially the entire surface of a transparent substrate, a method of removing the transparent electrode layer by etching o...

Claims

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Application Information

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IPC IPC(8): H01B5/14B32B9/00C23C14/08C23C14/10C23C14/34H01B13/00
CPCC23C14/086B32B9/00C23C14/34C23C14/10C23C14/083C23C14/0036C23C14/35C23C14/562G06F3/0412G06F2203/04103G06F3/0443C23C14/08G06F1/16G06F2203/04112G06F3/0448
Inventor 上田拓明近藤晃三檀野和久
Owner KANEKA CORP
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