Method for imaging processing of nanorod/nanoneedle forest structure

Abstract

The invention relates to a method for imaging processing of a nanorod/nanoneedle forest structure. The method comprises a step (a) of cleaning a first substrate and a second substrate; a step (b) of enabling a first substrate similar material layer similar to a first substrate material to be arranged on the lower surface of the second substrate, and arranging a plurality of punchthrough structures on the second substrate so as to form a hollow substrate; a step (c) of pasting the hollow substrate to the upper surface of the first substrate so as to form a corrosion cavity between the lower surface of the hollow substrate and the upper surface of the first substrate; a step (d) of utilizing the punchthrough structures of the hollow substrate to etch the upper surface of the first substrate; and a step (e) of removing the hollow substrate from the upper surface of the first substrate, so as to obtain the nanorod/nanoneedle forest structure on the first substrate. According to the method, the limitation of an electron beam photoetching and focused ion beam etching technology in the aspect of batch processing can be overcome, the process complexity can be effectively reduced, and the imaging nanorod/nanoneedle forest structure having controllability is achieved.

Description

technical field [0001] The invention relates to a pattern processing method, in particular to a pattern processing method of a nano-column / needle forest structure, belonging to the technical field of nano-structure processing. Background technique [0002] Large-area nanopillar / needle structure, due to its structural characteristics such as large surface-to-volume ratio, large roughness, large surface area, tip, multi-pore / slit, etc., it presents super-hydrophilic / hydrophobic, enhanced plasmon oscillation, field emission, light filtering, Light absorption and other properties are often applicable to microfluidic devices, surface-enhanced Raman scattering devices, biomedical detection or functional devices, optoelectronic devices, optical sensor devices, new energy devices, etc., so it has gradually become one of the research hotspots in recent years. In many cases, the large-area, high-density nanopillar / needle structure looks like a dense forest, so it is also called the na...

AI Technical Summary

Problems solved by technology

Theoretically, electrochemical wet etching technology can easily obtain the nano-forest structure, but the controllability of the structure is relatively poor, and the acid etching method also uses metal nanoparticles, which also increases the complexity of the process

The combination of nanosphere etching technology and anisotropic etching can also be used to process nanopillar / needle forest structures. However, the patterning of monolayer nanospheres requires strict control conditions, and even under strict control Under the premise of this, it is still difficult to realize the graphic arrangement of single-layer small balls in a large area

This limits the integrated application of the nanopillar / needle forest structure in specific micro-nano devices

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