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A kind of preparation method of array substrate

An array substrate and substrate surface technology, which is applied in the field of array substrate preparation, can solve the problems of film layer structure damage, product quality impact, and reduction of bright spot defect repair effects.

Inactive Publication Date: 2017-08-01
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the thinner thickness of the pixel electrode layer 104, the recognition degree of optical detection is reduced, resulting in an increase in the missed detection rate.
And while performing the above repair process, other thin film layer structures that have been formed will be damaged, such as the passivation layer and common electrode layer on the surface of the pixel electrode layer 104 (not shown in the figure).
Thereby reducing the repair effect of bright spot defects and affecting the quality of products

Method used

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  • A kind of preparation method of array substrate
  • A kind of preparation method of array substrate
  • A kind of preparation method of array substrate

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preparation example Construction

[0032] An embodiment of the present invention provides a method for preparing an array substrate, which may include forming such as Figure 1a In the illustrated method of a plurality of pixel electrode layer 104 patterns arranged in a matrix form, when the above-mentioned method of forming the pixel electrode layer 104 pattern is adopted, a conductive layer 20 electrically connecting two adjacent pixel electrode layer 104 patterns is also formed. ,like figure 2 As shown, the preparation method of the above-mentioned array substrate may also include:

[0033] S101 , forming a photoresist layer 30 on the surface of the substrate on which the conduction layer 20 is formed.

[0034] S102, forming a first photoresist removal region A and a photoresist retention region B through a single exposure and development process, the first photoresist removal region A corresponds to the position of the conductive layer 20, and the photoresist retention region B is formed correspondingly o...

Embodiment 1

[0050] After the step of forming the first photoresist-removed region A and the photoresist-retained region B through the above-mentioned one-time exposure and development process, and before the step of etching the conductive layer 20 of the first photoresist-removed region A, The method can include:

[0051] The first photoresist removal region A corresponds to the pre-formed isolation region 106 , and the photoresist remaining region B corresponds to other regions on the substrate surface where the conduction layer 20 is formed.

[0052] The preparation method of the array substrate formed with the isolation region 106 is described in detail below, as image 3 shown, including:

[0053] S201, such as Figure 4a As shown, on the surface of the substrate on which the conduction layer 20 is formed (in addition, the substrate also includes an unshown gate 101, a semiconductor active layer 103, and a pixel electrode layer 104 sequentially formed on the base substrate 01) to fo...

Embodiment 2

[0062] After the step of forming the first photoresist removal region A and the photoresist retention region B through one exposure and development process, before the step of etching the conductive layer 20 of the first photoresist removal region A, the Such methods may include:

[0063] The above-mentioned first photoresist removal area A corresponds to the pattern of the pre-formed groove 1061 , and the photoresist remaining area B corresponds to other areas on the substrate surface where the above-mentioned conducting layer 20 is formed. The pre-formed isolation region 106 includes two above-mentioned grooves 1061 and an insulating portion 1062 between the two grooves 1061 .

[0064] The preparation method of the array substrate formed with the isolation region 106 is described in detail below, as Figure 5 shown, including:

[0065] S301, such as Figure 6aAs shown, on the surface of the substrate on which the conduction layer 20 is formed (in addition, the substrate a...

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Abstract

An array substrate and a manufacturing method thereof, a display apparatus are disclosed. The manufacturing method of the array substrate includes a forming a conduction layer (20) for electrically connecting two adjacent pixel electrodes (104) upon forming of the pixel electrodes (104). The method further includes forming a photoresist layer (30) on a surface of a substrate with the conduction layer (20) formed thereon; through one exposure and development process, forming a first photoresist removed region (A) and a photoresist retained region (B). The first photoresist removed region (A) corresponds to a location of the conduction layer (20); the conduction layer (20) in the first photoresist removed region (A) is etched, to form a separating region (106) configured for avoiding electrical connection of pixel electrodes (104) of two adjacent pixel units; and within the separating region (106), a metal line that is non-electrically connected to adjacent two pixel electrodes (104) is formed. With the array substrate and manufacturing method thereof, damage to excessive thin film layers in the array substrate in the course of reducing bright dot defect can be avoided.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to a method for preparing an array substrate. Background technique [0002] TFT-LCD (Thin Film Transistor Liquid Crystal Display, Thin Film Transistor Liquid Crystal Display), as a flat panel display device, has become more and more popular due to its small size, low power consumption, no radiation and relatively low production cost. It is widely used in the field of high-performance display. [0003] TFT-LCD includes a color filter substrate and an array substrate that are arranged opposite to each other. A liquid crystal layer is arranged in the array substrate and the color filter substrate. By controlling the deflection of liquid crystal molecules in the liquid crystal layer, the intensity of light can be controlled to achieve display. Image purpose. [0004] In the prior art, the structure of the array substrate can be as follows Figure 1a As shown, it includes a pl...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/12H01L21/77G03F7/00G03F7/26
CPCG02F1/136259G02F1/134372G02F1/136272H01L27/124H01L27/127
Inventor 李春王晏酩宋瑞涛吴涛孙宏伟
Owner BOE TECH GRP CO LTD