Preparation method for silicon dioxide humidity regulating material
A technology of humidity control material and silicon dioxide, applied in the direction of silicon dioxide, silicon oxide, etc., can solve the problems of high humidity and energy consumption, and achieve the effects of simple equipment, easy industrialization, and convenient reuse.
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Embodiment 1
[0013] Embodiment 1: adopt following steps:
[0014] A) According to the mass fraction, take 5 parts of polyacrylic acid with a relative molecular mass of 25,000 and 37 parts of a 60% dilute nitric acid solution in 100 parts of deionized water;
[0015] B) Take 60 parts of sodium silicate in the solution prepared in step A) according to the mass fraction, and fully stir until the sodium silicate is completely dissolved;
[0016] C) Place the homogeneous solution obtained in step B) in a closed plastic container, and let it gel in an oven at 25°C for 24 hours;
[0017] D) Fully wash the wet gel obtained in step C) with distilled water, and then dry it in a vacuum oven at 50°C for 30 minutes;
[0018] E) Aging the gel obtained in step D) in 0.1mol / L ammonia solution at 50°C for 72h;
[0019] F) The obtained xerogel was calcined in a muffle furnace at 700°C for 2 hours to obtain silica with a bimodal structure.
Embodiment 2
[0020] Embodiment 2: adopt following steps:
[0021] A) According to the mass fraction, take 8 parts of polyacrylic acid with a relative molecular mass of 25,000 and 37 parts of a 60% dilute nitric acid solution in 100 parts of deionized water;
[0022] B) Take 50 parts of sodium silicate in the solution prepared in step A) according to the mass fraction, and fully stir until the sodium silicate is completely dissolved;
[0023] C) Place the homogeneous solution obtained in step B) in a closed plastic container, and let it gel in an oven at 25°C for 24 hours;
[0024] D) Fully wash the wet gel obtained in step C) with distilled water, and then dry it in a vacuum oven at 50°C for 30 minutes;
[0025] E) Aging the gel obtained in step D) in 0.1mol / L ammonia solution at 80°C for 72h;
[0026] F) The obtained xerogel was calcined in a muffle furnace at 700°C for 2 hours to obtain silica with a bimodal structure.
Embodiment 3
[0027] Embodiment 3: adopt following steps:
[0028] A) According to the mass fraction, take 6.5 parts of polyacrylic acid with a relative molecular mass of 25000 and 37 parts of a 60% dilute nitric acid solution in 100 parts of deionized water;
[0029] B) Take 55 parts of sodium silicate in the solution prepared in step A) according to the mass fraction, and fully stir until the sodium silicate is completely dissolved;
[0030] C) Place the homogeneous solution obtained in step B) in a closed plastic container, and let it gel in an oven at 25°C for 24 hours;
[0031] D) Fully wash the wet gel obtained in step C) with distilled water, and then dry it in a vacuum oven at 50°C for 30 minutes;
[0032] E) Aging the gel obtained in step D) in 0.1mol / L ammonia solution at 65°C for 72h;
[0033] F) The obtained xerogel was calcined in a muffle furnace at 700°C for 2 hours to obtain silica with a bimodal structure.
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