Preparation method and preparation system of a selective emitter electrode solar cell

Abstract

Disclosed in the invention is a preparation method of a selective emitter electrode solar cell. The preparation method comprises: A, forming a pile surface at the front side of a silicon wafer; B, printing a phosphorus slurry at the front side of the silicon wafer; C, placing the silicon wafer into a diffusion furnace pipe, introducing mixed gas with O3 and N2 at the controlled temperature of 20 to 80 DEG C; D, introducing POCL3, N2 and O2 at the controlled temperature of 810 to 900 DEG C; E, carrying out edge etching on the silicon wafer, removing a P diffusion layer, and removing a piece of phosphorosilicate glass and the residue of the phosphorus slurry from HF acid; F, depositing an anti-reflection film at the front side of the silicon wafer; G, printing an electrode at the silicon wafer; and H, carrying out sintering. Correspondingly, the invention also provides a preparation system of a selective emitter electrode solar cell. With the method and the system, the influence on the silicon wafer by a phosphorus slurry volatile matter can be prevented; the appearance quality of the silicon wafer can be improved; and the cell conversion efficiency can be guaranteed.

Description

technical field [0001] The invention relates to the technical field of solar cells, in particular to a method and system for preparing a selective emitter electrode solar cell. Background technique [0002] The preparation of existing selective emitter electrode batteries generally adopts the single-step diffusion method of screen printing phosphorus source, and the preparation process is as follows: Phosphorus slurry is selectively printed on the front side of the silicon wafer after texturing, that is, on the grid line of the battery Phosphorus paste is printed on the printing area; put into the diffusion furnace tube and pass through POCl 3 Thermal diffusion; dephosphorous silicon glass; front anti-reflection film deposition; preparation and sintering of front and back metal electrodes. The advantage of the selective emission electrode cell is that the preparation method is simple, the cost is low, and it can be industrialized on a large scale. However, since the printe...

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Problems solved by technology

However, since the printed phosphorous paste contains a lot of impurities, which will be volatilized in the diffusion furnace tube, these impurities will deposit on the surface of the silicon wafer or undergo various physical and chemical reactions with silicon, resulting in poor appearance of the silicon wafer, such as spots, Limited space for improving battery efficiency

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