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Illumination system

An illumination system and a right-angle prism technology, applied in the field of illumination systems, can solve the problems of reducing the illuminance of the mask surface, reducing the energy coupling efficiency of the quartz rod 3, etc., so as to improve the pupil uniformity, improve the energy coupling efficiency, and reduce the energy loss. Effect

Active Publication Date: 2015-03-18
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this solution, the pupil uniformity of the system can be greatly improved by changing the incident end of the quartz rod 3 into a square symmetrical structure. Please refer to Figure 4 , the pupil uniformity of the mask surface reached 0.8% at this time, but for the rectangular light incident end, the size of the light incident end of the square aperture 4 is smaller than that of the quartz rod 3, which greatly reduces the size of the quartz rod 3 Excellent energy coupling efficiency, greatly reducing the mask surface illumination of the system

Method used

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Examples

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Embodiment 1

[0051] A lighting system provided by the invention, such as Figure 5 to Figure 9 shown, including sequentially arranged light sources ( Figure 5 not shown in), ellipsoidal bowl assembly 10, coupling lens group 20, deflection module 30, microlens array 40, quartz rod 50, relay lens group 60 and illumination object 70, preferably, the light source is a high voltage Mercury lamp, the ellipsoidal bowl assembly 10 is an ellipsoidal bowl reflector, the light incident end of the folding module 30 is square, the shape of the light outgoing end of the folding module 30 and the light incident end of the quartz rod 50 Similarly, the light emitted by the light source enters the coupling lens group 20 after being converged by the ellipsoidal bowl assembly 10, and then passes through the folding module 30, the microlens array 40 and the quartz rod 50 for multiple reflections to homogenize the light. After that, it enters the relay lens group 60 and is finally imaged on the illumination o...

Embodiment 2

[0062] The difference between this embodiment and Embodiment 1 is that the positions of the coupling lens groups are set differently.

[0063] Specifically, the object focal planes of the light source and the coupling lens group 20 are respectively located at the two focal points of the elliptical bowl assembly 10, and the light incident end of the folding module 30 is located at the focal points of the elliptical bowl assembly 10 , the object focal plane of the coupling lens group 20 coincides with the light exit end of the folding module 30, and the microlens array 40 is located at the light exit end of the folding module 30 and the light entrance end of the quartz rod 50 Between, the object-side focal plane of the relay lens group 60 coincides with the light-emitting end of the quartz rod 50 , and the illumination object 70 is located at the image-side focal plane of the relay lens group 60 . This embodiment can achieve the goal of improving the system mask surface illumina...

Embodiment 3

[0065] Please refer to Figure 10 , 11 , as the first modification of the folding module, a surface whose length and width are L*2L in the first prism on the left side and a side whose length and width are L*2L respectively in the third rectangular prism on the right side The surface forms the light-incident end of the folding module, and its length and width are 2L*2L; in the second prism in the upper part, a surface with a length and width of L*2L and a surface of the second right-angle prism in the lower part The surface whose length and width are respectively L*2L constitutes the light output end of the folding module, and its length and width are respectively L*4L.

[0066] Part of the light entering the light-incident end of the refraction module passes through the first prism, the first right-angle prism, and the second right-angle prism in sequence, and then exits the refraction module; the other part of the light-incident end of the refraction module enters The ligh...

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Abstract

The invention relates to an illumination system. The illumination system comprises a light source, an ellipsoid bowl assembly, a coupling lens set, a bending-over module, a micro-lens array, a quartz rod, a relay lens set and an illumination object which are arrayed in sequence, wherein the light incoming end of the bending-over module is square and the shape of a light outgoing end of the bending-over module is the same as that of the light incoming end of the quartz rod; light sent by the light source is converged by the ellipsoid bowl assembly, then enters the coupling lens set, is reflected and dodged by the bending-over module, the micro-lens array and the quartz rod for multiple times and then enters the relay lens set; and finally, the light is imaged on the illumination object. According to the illumination system, the bending-over module is additionally arranged, the light incoming end of the bending-over module is square and the light outgoing end of the bending-over module is rectangular, so that the optical pupil uniformity of a mask surface of the illumination system is improved, and the energy coupling efficiency of the system is improved.

Description

technical field [0001] The invention relates to the field of photolithography machines, in particular to an illumination system. Background technique [0002] A projection lithography machine is a device that transfers the mask surface pattern to the substrate surface / silicon wafer surface to form the required pattern, and then integrates the required integrated circuit (IC). Among them, the illumination system provides a uniform illumination spot for the mask surface of the lithography machine, which is the energy source of the lithography machine. The spot energy and pupil uniformity of the mask surface are important indicators of the illumination system. The size of the spot energy determines the The productivity of the machine, and the uniformity of the pupil determines the relative difference in the directional width of the exposure line during the exposure of the lithography machine, which indirectly affects the resolution of the lithography machine. For a scanning op...

Claims

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Application Information

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IPC IPC(8): G03F7/20
Inventor 景磊湛宾洲
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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