Illumination system

An illumination system and a right-angle prism technology, applied in the field of illumination systems, can solve the problems of reducing the illuminance of the mask surface, reducing the energy coupling efficiency of the quartz rod 3, etc., so as to improve the pupil uniformity, improve the energy coupling efficiency, and reduce the energy loss. Effect

Active Publication Date: 2015-03-18
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this solution, the pupil uniformity of the system can be greatly improved by changing the incident end of the quartz rod 3 into a square symmetrical structure. Please refer to Figure 4 , the pupil uniformity of the mask surface reached 0.8% at this time, but for the rectan

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0050] Example 1

[0051] A lighting system provided by the present invention, such as Figure 5 to Figure 9 As shown, including light sources arranged in sequence ( Figure 5 Not shown), the ellipsoid bowl assembly 10, the coupling lens group 20, the turning module 30, the micro lens array 40, the quartz rod 50, the relay lens group 60, and the illumination object 70. Preferably, the light source is a high voltage Mercury lamp, the ellipsoidal bowl assembly 10 is an ellipsoidal bowl reflector, the light incident end of the folding module 30 is square, the light output end of the folding module 30 and the light incident end of the quartz rod 50 are shaped Similarly, the light emitted by the light source is condensed by the ellipsoidal bowl assembly 10 and then enters the coupling lens group 20, and then passes through the reflex module 30, the microlens array 40 and the multiple reflection uniform light of the quartz rod 50 Then it enters the relay lens group 60 and finally forms...

Example Embodiment

[0061] Example 2

[0062] The difference between this embodiment and Embodiment 1 is that the position of the coupling lens group is different.

[0063] Specifically, the object focal planes of the light source and the coupling lens group 20 are respectively located at the two focal points of the ellipsoidal bowl assembly 10, and the light incident end of the deflection module 30 is located at the focal point of the ellipsoidal bowl assembly 10. , The object focal plane of the coupling lens group 20 coincides with the light output end of the folding module 30, and the microlens array 40 is located at the light output end of the folding module 30 and the light input end of the quartz rod 50 In between, the object focal plane of the relay lens group 60 coincides with the light exit end of the quartz rod 50, and the illumination object 70 is located at the image focal plane of the relay lens group 60. This embodiment can achieve the goal of increasing the system mask surface illumina...

Example Embodiment

[0064] Example 3

[0065] Please refer to Picture 10 , 11 , As the first modification of the folding module, on the left side of the first prism, the length and width are L*2L, and on the right, the third right-angle prism, the length and width are L*2L. The surface forms the light-incident end of the folding module, and its length and width are respectively 2L*2L; in the upper part of the second prism, the length and width are respectively L*2L and a surface of the second right-angle prism at the lower part The surface of the length and width respectively L*2L constitutes the light output end of the folding module, and the length and width are respectively L*4L.

[0066] A part of the light that enters the light entrance end of the folding module passes through the first prism, the first right-angle prism, and the second right-angle prism in sequence, and then exits the folding module; and enters the other part of the light entrance end of the folding module The light passes thr...

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Abstract

The invention relates to an illumination system. The illumination system comprises a light source, an ellipsoid bowl assembly, a coupling lens set, a bending-over module, a micro-lens array, a quartz rod, a relay lens set and an illumination object which are arrayed in sequence, wherein the light incoming end of the bending-over module is square and the shape of a light outgoing end of the bending-over module is the same as that of the light incoming end of the quartz rod; light sent by the light source is converged by the ellipsoid bowl assembly, then enters the coupling lens set, is reflected and dodged by the bending-over module, the micro-lens array and the quartz rod for multiple times and then enters the relay lens set; and finally, the light is imaged on the illumination object. According to the illumination system, the bending-over module is additionally arranged, the light incoming end of the bending-over module is square and the light outgoing end of the bending-over module is rectangular, so that the optical pupil uniformity of a mask surface of the illumination system is improved, and the energy coupling efficiency of the system is improved.

Description

technical field [0001] The invention relates to the field of photolithography machines, in particular to an illumination system. Background technique [0002] A projection lithography machine is a device that transfers the mask surface pattern to the substrate surface / silicon wafer surface to form the required pattern, and then integrates the required integrated circuit (IC). Among them, the illumination system provides a uniform illumination spot for the mask surface of the lithography machine, which is the energy source of the lithography machine. The spot energy and pupil uniformity of the mask surface are important indicators of the illumination system. The size of the spot energy determines the The productivity of the machine, and the uniformity of the pupil determines the relative difference in the directional width of the exposure line during the exposure of the lithography machine, which indirectly affects the resolution of the lithography machine. For a scanning op...

Claims

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Application Information

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IPC IPC(8): G03F7/20
Inventor 景磊湛宾洲
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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