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Micropattern formation method, release method, magnetic recording medium manufacturing method, magnetic recording medium, and stamper manufacturing method

A pattern, concave-convex pattern technology, applied in pattern record carrier, pattern surface photoengraving process, manufacture of base layer, etc., can solve the problems of uniform microfabrication difficulty and so on

Inactive Publication Date: 2015-03-18
KK TOSHIBA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the case of applying the conventional technology to form and peel off the metal fine particle mask pattern, the above-mentioned problems arise, and uniform microfabrication is remarkably difficult.

Method used

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  • Micropattern formation method, release method, magnetic recording medium manufacturing method, magnetic recording medium, and stamper manufacturing method
  • Micropattern formation method, release method, magnetic recording medium manufacturing method, magnetic recording medium, and stamper manufacturing method
  • Micropattern formation method, release method, magnetic recording medium manufacturing method, magnetic recording medium, and stamper manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0254] Example 1 is an example of forming fine unevenness using noble metal / base metal fine particles.

[0255]First, a coating solution for forming a metal fine particle mask was prepared. This solution contains a first solvent containing noble metal fine particles and a second solvent containing a polymer chain having a base metal terminal as described above.

[0256] In this example, Au having an average particle diameter of 8 nm and a pitch of 13.5 nm was used for noble metal fine particles, and an Au dispersion liquid containing 2.8% by weight of noble metal fine particles was prepared by using toluene as the first solvent.

[0257] In addition, polystyrene having a thiol group in the base metal material portion was used, and toluene was used as the second solvent. The average molecular weight of polystyrene was 1,300, and the concentration by weight relative to the second solvent was 0.5%, thereby preparing a polystyrene solution.

[0258] This polystyrene serves as a ...

Embodiment 2

[0267] Example 2 is an example of the case where Au fine particles are further removed from the unevenness formed in the same manner as in Example 1.

[0268] After performing dry etching on the Si to-be-processed layer, Au fine particles were removed by wet etching. As an etchant, a mixed liquid obtained by diluting iodine and potassium iodide with isopropanol was used, and the weight ratio of iodine:potassium iodide:isopropanol was adjusted to 1:1:12. Next, the sample was immersed in the mixed solution for 5 minutes, and washed with isopropyl alcohol to clean the sample. Figure 18 It is the upper surface SEM image of the sample after microparticle peeling. In addition to the concavo-convex pattern, it was confirmed on the SEM that since the concavo-convex contrast was weakened, the Au microparticles were dissolved and removed to form Si concavities and convexities.

Embodiment 3

[0270] Examples 3 to 24 are the results of producing magnetic recording media using noble metal / base metal fine particles as a mask, and further evaluating the magnetic head floating characteristics with respect to the medium.

[0271] An example using samples having a common layer configuration will be described below. First, a magnetic recording layer was formed on a glass substrate. As the plate, a 2.5-inch-diameter ring-shaped substrate was used, on which a magnetic recording layer was formed by a DC sputtering method. The process gas is Ar, and the setting is: gas pressure 0.7Pa, gas flow rate 35sccm, input power 500W, and form a 10nm-thick NiTa underlayer / 4nm-thick Pd underlayer / 20nm-thick Ru underlayer / 3nm-thick CoPt from the substrate side As for the recording layer, a 1 nm-thick Pd protective layer was finally formed to obtain a magnetic recording layer.

[0272] Next, a mask layer was formed. C film was selected as the mask layer, and Si film was used as the trans...

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Abstract

According to one embodiment, there is provided a pattern formation method including forming a target layer to be processed on a substrate, adding a second dispersion containing a polymer material including a polymer chain having a base metal at a terminal end and a second solvent to a first dispersion containing noble-metal microparticles and a first solvent, thereby preparing a noble-metal microparticle layer coating solution in which microparticles covered with the polymer material are dispersed, arranging the noble-metal microparticles covered with the polymer material on the target layer by using the noble-metal microparticle layer coating solution, and transferring a projections pattern of the noble-metal microparticles covered with the polymer material to the target layer.

Description

[0001] related application [0002] This application claims the priority of the basic application based on Japanese Patent Application No. 2013-187570 (filing date: September 10, 2013). This application incorporates the entire content of the basic application by referring to this basic application. technical field [0003] Embodiments of the present invention relate to a pattern forming method, a peeling method, a method of manufacturing a magnetic recording medium, a magnetic recording medium, and a method of manufacturing a stamper. Background technique [0004] In recent years, along with a remarkable increase in the amount of information, realization of a large-capacity information recording device has been desired. For example, in semiconductor memory devices, miniaturization of element sizes is being actively promoted in order to increase the mounting density per unit area for the purpose of increasing the capacity. The wiring size of transistors is miniaturized in t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G11B5/84G03F7/00
CPCG11B5/746G11B5/8404G11B5/743G11B5/855
Inventor 泷泽和孝木村香里竹尾昭彦
Owner KK TOSHIBA
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