Method for preparing yttrium-oxide-stabilized hafnium oxide vacuum coating material

Abstract

The invention relates to a method for preparing an yttrium-oxide-stabilized hafnium oxide vacuum coating material. The method is characterized by comprising the following steps: 1) evenly mixing raw materials (hafnium oxide and yttrium oxide powder), wherein a molar ratio of hafnium oxide to yttrium oxide is (73-98): (2-27); adding a polyvinyl alcohol binder so that the powder materials are agglomerated and granulating to obtain granular material; (2) pre-sintering the granular material at a pre-sintering temperature of 1260 DEG C; and (3) sintering in a vacuum sintering furnace at the vacuum degree of 1*10<-2>-1*10<-4> Pa and the heating speed of 3-8 DEG C / min; when the temperature reaches 1700-2280 DEG C, carrying out heat preservation for more than 150 minutes, and then naturally cooling to room temperature. By the method, the problems of instability and non-uniform refractive index during the coating of traditional hafnium oxide coating material can be solved and meanwhile, the damage threshold of a hafnium oxide film is increased.

Description

technical field

[0001] The invention belongs to the technical field of vacuum coating, in particular to a method for preparing a yttrium oxide-stabilized hafnium oxide vacuum coating material. Background technique

[0002] To prepare laser thin films with high damage threshold, in the visible and near-infrared bands, high refractive index materials have undergone a process from TiO 2 (n=2.4), Ta 2 o 5 (n=2.1) to ZrO 2 (n=2.1), HfO 2 (n=2.0) Changes in transformation. Therefore, when people design and manufacture high-performance optical thin film elements with high threshold requirements, they often tend to use HfO 2 / SiO 2 The combination.

[0003] In the UV band, the current research on ultraviolet film materials is mainly focused on excimer laser wavelengths 351nm (XeF), 308nm (XeCl), 248nm (KrF), 193nm (ArF) and Nd‐YAG laser triple frequency and quadruple Frequency (355nm and 266nm), the shorter the wavelength, the less membrane material available.

[0004] HfO ...