48results about How to "Refractive index stabilization" patented technology

The invention discloses a method for preparing a graduated color film through a magnetron sputtering machine. The method comprises the following steps that S1, an optical film system is designed; S2,a baffle is designed, and the shape of the baffle is designed according to thickness change of an optical thin film structure simulated by software; S3, vacuum coating is conducted; and S4, color andoptical performance examination is conducted, the color LAB value, visible light reflectivity curve and visible light transmittance curve of a product obtained after vacuum coating are detected, if the test result is qualified, mass production preparation can be made, and if the test result is unqualified, operation returns to the step S1. A transition area of a graduated color film prepared withthe method is natural in gradual color change, the product color is easy to adjust, and graduated color films of different colors and visual effects can be prepared according to user preparations. Compared with electric beam evaporation deposition, a film layer prepared with the magnetron sputtering machine is compact in structure, the refractive index is stable, the film layer is more stable in optical performance, and thus color stability is better.

The invention relates to a negative photoresist-based diffuser photo-etching process, which comprises the following steps that: firstly, photoresist is coated on the surface of an underlay, then the underlay which is coated with the negative photoresist in a rotating way is prebaked so as to remove solvent of the negative photoresist; then exposure is carried out, a diffuser is arranged on a mask plate, and the diffuser and the mask plate are used as a mask to perform ultraviolet exposure on the negative photoresist; finally the post-baking and developing are carried out, the negative photoresist in an exposure area is cross-linked in the post-baking process and is free from being dissolved in developing liquid, and a structure with a particular cross section is obtained; and the diffuser and the mask plate are collectively used as the mask to anticipate the exposure of the photoresist. The negative photoresist-based diffuser photo-etching process has advantages of wide application range, simple technique process, good technical repeatability, unnecessary modification of present photo-etching equipment, low cost, easiness in mass production and the like.

The present invention provides a melting device for melting glass complex powder into high-quality molten glass and a melting method therefor. The glass melting device comprises an outer crucible, a bubbler tube, an discharge tube and a heating device, and further comprises an inner crucible with a convex curved surface body structure, wherein the bubbler tube is inserted into the outer crucible; the inner crucible is arranged on the bottom in the outer crucible and a plurality of through holes are formed inthe convex curved surface of the inner crucible. By changing the structures of devices such as the outer crucible, the inner crucible, the bubbler tube, the discharge tube and the like, the glass melting device can improve a flow path of the molten glass, optimizes the whole flow and residence time, effectively reduces an area in which the molten glass flows slowly around the inner crucible, improves the residence time concentration degree of the molten glass in the melting device and improves the uniformity of the glass components, thereby ensuring physical and chemical performances such as the refractive index, the the Abbe number and the like of a glass product to be more uniform and stable.

The invention discloses a silk-screen-printing-free light guide plate online production process and production device. During production, an optical granular raw material is prepared by selecting a PMMA, PS, PC, MS, PET or PP material of which the light transmittance is 87-90% and the refractive index is 1.53-1.62; and inorganic silicon or nano barium sulfate is selected as a dispersing agent. The process comprises the following steps: material selection; drying; material supply; hot melting; extrusion calendaring molding; cooling and detection; and film covering, cutting and stacking. By adoption of the silk-screen-printing-free light guide plate online production process and production device provided by the invention, multi-layer optical composite plates of various sizes and materials can be effectively produced; and the production equipment cost and the material requirements are low, the light transmittance and the precision of each finished product are high, and the practical value is very high.

The invention discloses online hot pressed composite panel production equipment which comprises a drier, a dedustor, a distributor, a single screw extruder, a full-automatic multi-layer coextrusion clothes rack die head, a multi-roll calender, a slow cooling rack, a defect detector, a thickness detector, a temperature equalizer, a precise temperature hot press, a traction mulch applicator, an edge cutting traction machine, a transverse cutting machine and a manipulator. A production process of the online hot pressed composite panel comprises the specific steps: S1, material selection; S2, drying; S3, material supply; S4, hot melting; S4, extrusion calendaring forming; S6, cooling and detection; S7, temperature control and hot pressing; and S8, tailoring and stacking. According to the online hot pressed composite panel production equipment and the production process thereof, one material is used and is primarily calendered and formed, so that the manufacturing process is simple, the production efficiency is high, the overall cost is low, the environment is little in influence, and the product is good in transmittance.

The invention discloses a zero-scattering linear particle and an electromagnetic invisible material formed by the same. The center of the particle is a metallic structure including metal units that are arranged in a linear mode periodically; the adjacent metal units are connected by connecting columns; the outsides of the metal units and the connecting columns are coated with a cylindrical dielectric medium, thereby forming the zero-scattering linear particle based on the solid cylindrical structure. The linear arrangement direction of the metal units and the height direction of the dielectric medium cylinder are identical with the electric field polarization direction of the incident electromagnetic wave during working. According to the invention the particle with the simple structure can be processed conveniently and can be processed into a material or structure with any shape according to different application demands. According to the instance simulation verification, a scattering width tending to zero can be obtained at the work frequency; and expanding to all frequency bands including a radio frequency band, a terahertz band, and even an optical wave band and the like can be realized directly by structural dimension scaling. Therefore, the provided particle can be widely applied to related application fields of the invisible material.

A filtering chip of infrared ray proof type is featured as enabling to effectively filter out infrared ray and enabling to be directly used as packaging glass of image sensing component.

The invention relates to a high-transmittance optical brightness enhancement film. The film comprises a brightness enhancement film body (11), and a microprism structure (12) disposed on the upper surface of the brightness enhancement film body (11), wherein the pitch of the microprism structure is 25 [mu]m to 200 [mu]m. A manufacture apparatus of the film comprises a hot-air machine (2), a feed hopper (3), a hot-air drier (4), an air lock device (5), a hot melt device (6), a pattern roller (8) and a grinding roller (9), wherein the outlet end of the hot melt device (6) is equipped with a calender roller group (7), and the pattern roller (8) and the grinding roller (9) are in cooperation and disposed at the left side of the calender roller group (7). A manufacture process of the film comprises the following steps: S1, pattern roller preparation; S2, material preparing; S3, drying; S4, hot melting of granular materials; S5, calendaring; S6, moulding; and S7, final processing. The advantages are that processing cost is low, the influence on the environment in the manufacture process is small, the manufacture technology is simple, and transmittance is high.

A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.

The invention relates to a vaporizing material for a high refraction optics film, namely a compound with the chemical reaction of LaTiO3. The material is formed by single structure with no other doping. The density of the material is 5.2 to 5.9g / cm<3 > with good filling performance, taking Ti2O3 and La2O3, or TiO2, La2O3 and Ti as the material to be reacted under high temperature and vacuum state to produce TiO3. The LaTiO3 vaporizing material is used for producing the high refraction optics film which is a rigid medium film with good performance. The high refraction optics film is an antireflection coating of filming of a resin lens, a dichroic prism or a broad band. In the method of producing the high refraction optics film, the vaporizing material LaTiO3 is not changed in the vaporizing process and the vaporizing material LaTiO3 in crucible needs no update to keep stable refraction rate of the film. Multi high-refraction optics films are produced through once fusion and multi times of vaporization.

The invention discloses Ce-containing low-temperature sealing glass as well as preparation and application method of the Ce-containing low-temperature sealing glass. The Ce-containing low-temperature sealing glass consists of the following raw materials: B2O3, Bi2O3, ZnO and Ce(NO3)3 in a molar ratio of (10-50):(20-40):(5-30):(0-30). Through the coordination between high-concentration Bi2O3 and B2O3, the softening temperature of glass is lowered, so that low-temperature sealing is realized; Ce<3+> in a glass network prepared by melting quenching is transformed into Ce<4+>, the transformation of Bi<3+> in glass into Bi<5+> is prevented, and the refractive index of glass is stabilized; and Ce not only can further lower the softening temperature of the sealing glass, but also can adjust the expansion factor of the glass so as to remarkably improve the sealing property of the sealing glass. Moreover, Ce remarkably reduces the surface tension of the glass, improves the interface bonding property between the sealing glass and an alloy connector and is applicable to the field of photoelectric materials and other low-temperature precise sealing. According to the invention, the preparation raw materials are simple and easily available, the cost is low, the technology is simple and feasible, and the prepared low-temperature sealing glass has good performance and stable refractive index and meets the conditions of practical utilization and industrialization.

The invention relates to a broadband low-dispersion metamaterial which comprises a first substrate and a plurality of artificial microstructures, wherein the plurality of artificial microstructures are attached to one side surface of the first substrate, each artificial microstructure is a silk yarn made of conductive materials, each artificial microstructure is provided with a first main yarn and a second main yarn which are intersected, the two ends of the first main yarn are connected with two first knuckle lines, and the two ends of the second main yarn are connected with two second knuckle lines. According to the broadband low-dispersion metamaterial disclosed by the invention, a relatively stable refractive index can be provided in a broader frequency range, namely that the metamaterial has a broadband low-dispersion characteristic.

The invention discloses Fe-containing low-temperature sealing glass as well as preparation and use methods thereof. The Fe-containing low-temperature sealing glass is prepared from the following raw materials: B2O3, Bi2O3, ZnO and Fe2O3. Through the coordinating function of Bi2O3 and B2O3, the softening temperature of glass is reduced, and the low-temperature sealing is realized; by the adding of Fe2O3, the softening temperature of the sealing glass can be further reduced, and the refractive index of the glass can be stabilized; and furthermore, magnetic Fe3O4 generated inside can improve the automatic application efficiency of a sealing process. The preparation raw materials are simple and readily available; the process is stable, and the cost is reduced; and the Fe-containing low-temperature sealing glass is applicable to the field of photoelectric materials and other low-temperature precision packages.

Disclosed are methods involving the therapeutic use of human PRG4 (lubricin) protein, to improve vision, to reduce aberrations such as impaired night vision, halos, and glare, to improve the stability of the tear film, and to homogenize the refractive index of the surface of the eye.

The invention provides a semiconductor silicon-based optical waveguide device and a preparation method thereof, and relates to the field of optical waveguide chip producing and manufacturing. The preparation method of the semiconductor silicon-based optical waveguide device comprises the following steps that (a) a bottom cladding layer is deposited on a non-polished surface of a single-surface-polished silicon wafer; (b) a lower cladding layer, a core layer and a mask layer are deposited in an overlapped mode in sequence on a polished surface of the single-surface-polished silicon wafer; (c) awaveguide channel is formed after the core layer is etched, and the mask layer is removed; and (d) an upper cladding layer is deposited on the etched core layer, and thus the semiconductor silicon-based optical waveguide device is obtained. Preferably, the mask layer is a metal mask layer, and the technical problems that quartz substrate slices are used in conventional waveguide devices, the dependency on the quality of the substrate slices is high and special quartz processing equipment needs to be ordered for manufacturing are solved. According to the preparation method of the semiconductorsilicon-based optical waveguide device, semiconductor silicon is adopted as a substrate slice, compatibility with silicon semiconductor manufacturing equipment is good, the influence of the substrateslice refractive index is avoided, and design and manufacturing are more flexible.

The invention relates to a method for preparing an yttrium-oxide-stabilized hafnium oxide vacuum coating material. The method is characterized by comprising the following steps: 1) evenly mixing raw materials (hafnium oxide and yttrium oxide powder), wherein a molar ratio of hafnium oxide to yttrium oxide is (73-98): (2-27); adding a polyvinyl alcohol binder so that the powder materials are agglomerated and granulating to obtain granular material; (2) pre-sintering the granular material at a pre-sintering temperature of 1260 DEG C; and (3) sintering in a vacuum sintering furnace at the vacuum degree of 1*10<-2>-1*10<-4> Pa and the heating speed of 3-8 DEG C / min; when the temperature reaches 1700-2280 DEG C, carrying out heat preservation for more than 150 minutes, and then naturally cooling to room temperature. By the method, the problems of instability and non-uniform refractive index during the coating of traditional hafnium oxide coating material can be solved and meanwhile, the damage threshold of a hafnium oxide film is increased.

The invention discloses Sn-containing low-temperature seal glass and preparing and using methods thereof. The Sn-containing low-temperature seal glass is composed of B2O3, Bi2O3, ZnO and SnO2 according to a molar ratio of 10-50:20-40:5-30:0-30. Softening temperature of the glass is lowered through synergism of high-concentration Bi2O3 and B2O3 to realize low-temperature seal; Sn2+ in a glass network prepared through melting-quenching is converted into Sn4+ in the process of heating, conversion from Bi3+ in the glass to Bi5+ is stopped, and refractivity of the glass is stabilized; Sn can further lower the softening temperature of the seal glass and can adjust expansion coefficient of the glass, so that seal performance of the seal glass is improved remarkably; the glass is suitable for photoelectric materials and other low-temperature precise seal fields. The raw materials for preparation are simple and easy to obtain, the preparation method is stable, low in cost and simple and easy to implement, and practical and industrial conditions are met.

The invention relates to a gradient refractive index waveguide device and a preparation method thereof. The gradient refractive index waveguide device comprises a GRIN (Gradient Refractive Index) lens and a coating layer, wherein the GRIN lens comprises a substrate, a waveguide layer and at least two GRIN layers; the GRIN layer at the most bottom layer is deposited on the substrate; the waveguide layer is arranged between two adjacent GRIN layers; the coating layer coats the outer side of the GRIN lens; the refractive index is gradually increased from the GRIN layer at the most top layer or the GRIN layer at the most bottom layer to the waveguide layer. The gradient refractive index waveguide device disclosed by the invention solves the technical problem that the GRIN lens in the existing waveguide device cannot be photoetched or etched layer by layer, so that the fidelity is descended, and the precision is reduced; the GRIN lens is prepared by a PLC technology; the PLC technology is advantaged by that the GRIN layers and the waveguide layer in the GRIN lens can be integrated on the same chip, so that the GRIN lens prepared by the PLC technology has the advantages of monolithic integration, low cost and good reliability.

The invention discloses Mn-containing low-temperature seal glass as well as a preparation method and use method thereof. The seal glass comprises the following raw materials: B2O3, Bi2O3, ZnO and MnO2. By virtue of the coordination of high-concentration Bi2O3 and B2O3, the softening temperature of the glass is decreased, and low-temperature sealing is realized; by adding MnO2, the refractive index of the glass can be stabilized, furthermore, the softening temperature of the seal glass is further decreased, the swelling coefficient of the glass can be further regulated, and the sealing performance of the seal glass can be remarkably improved. The preparation method has the beneficial effects that the raw materials are simple and easily available, the process is simple and stable, the cost is saved, and the practical utilization and industrialization conditions are achieved. The seal glass is applicable to the fields of photoelectric materials, low-temperature precise packaging and the like.

The invention discloses Ce-containing low-temperature sealing glass as well as preparation and application method of the Ce-containing low-temperature sealing glass. The Ce-containing low-temperature sealing glass consists of the following raw materials: B2O3, Bi2O3, ZnO and Ce(NO3)3 in a molar ratio of (10-50):(20-40):(5-30):(0-30). Through the coordination between high-concentration Bi2O3 and B2O3, the softening temperature of glass is lowered, so that low-temperature sealing is realized; Ce<3+> in a glass network prepared by melting quenching is transformed into Ce<4+>, the transformation of Bi<3+> in glass into Bi<5+> is prevented, and the refractive index of glass is stabilized; and Ce not only can further lower the softening temperature of the sealing glass, but also can adjust the expansion factor of the glass so as to remarkably improve the sealing property of the sealing glass. Moreover, Ce remarkably reduces the surface tension of the glass, improves the interface bonding property between the sealing glass and an alloy connector and is applicable to the field of photoelectric materials and other low-temperature precise sealing. According to the invention, the preparation raw materials are simple and easily available, the cost is low, the technology is simple and feasible, and the prepared low-temperature sealing glass has good performance and stable refractive index and meets the conditions of practical utilization and industrialization.

The invention relates to a method to grow silicon oxide thick film by using TEOS source PECVD. The surface of silicon wafer is cleaned, then the silicon wafer is put into a reaction chamber. The TESO and H2O are carried into the reaction chamber by using bubble-fixation method with He being as carrying gas. The TESO is kept at constant temperature 30 degree C-50 degree C and H2O at 20 degree C-30 degree C by using method of heating in water bath. The silicon oxide is done with high temperature annealing. The invented method provides good performances of even film thickness (1.5%, at 2 inches substrate, refractive index being controlled within 1.453 plus or minus 0.001, stable refractive index without change after high temperature annealing and it can be used to grow thick film. The total growing technique is compatible to silicon technique.

The present invention includes apparatus and methods for producing a conditioned immersion fluid for use in an immersion lithography process. The conditioned immersion fluid protects the immersion system lens and reduces or eliminates deposition of contaminants onto the lens that can adversely affect the lens transmission and durability of an immersion lithography system.

The invention discloses a preparation method of an LED epitaxial wafer distributed Bragg reflector, and the method comprises the steps: enabling quartz to rotate around the central axis of the quartzat a first angle in a first direction, enabling an electron beam to sweep a quartz ring fan-shaped region corresponding to the first rotating angle, and carrying out the preprocessing of the fan-shaped region; rotating the quartz around the central axis of the quartz at a first angle in a second direction opposite to the first direction to enable the electron beam to sweep over the fan-shaped region again so as to grow a first DBR layer with a first refractive index on the back surface of the LED epitaxial wafer; and growing a second DBR layer with a second refractive index on the first DBR layer. Impurities on the surface of the quartz ring are removed through pretreatment, and it is ensured that the first DBR layer formed after growth is high in adhesion to the LED epitaxial wafer and not prone to falling off. The evaporation capacity of the quartz ring in the pretreatment process can be accurately controlled by adjusting the rotating speed and time of the quartz ring, so that the quartz ring is prevented from generating excessive waste.

The invention relates to a gradient refractive index waveguide device and a preparation method thereof. The gradient refractive index waveguide device comprises a GRIN (Gradient Refractive Index) lens and a coating layer, wherein the GRIN lens comprises a substrate, a waveguide layer and at least two GRIN layers; the GRIN layer at the most bottom layer is deposited on the substrate; the waveguide layer is arranged between two adjacent GRIN layers; the coating layer coats the outer side of the GRIN lens; the refractive index is gradually increased from the GRIN layer at the most top layer or the GRIN layer at the most bottom layer to the waveguide layer. The gradient refractive index waveguide device disclosed by the invention solves the technical problem that the GRIN lens in the existing waveguide device cannot be photoetched or etched layer by layer, so that the fidelity is descended, and the precision is reduced; the GRIN lens is prepared by a PLC technology; the PLC technology is advantaged by that the GRIN layers and the waveguide layer in the GRIN lens can be integrated on the same chip, so that the GRIN lens prepared by the PLC technology has the advantages of monolithic integration, low cost and good reliability.

The invention discloses Sn-containing low-temperature seal glass and preparing and using methods thereof. The Sn-containing low-temperature seal glass is composed of B2O3, Bi2O3, ZnO and SnO2 according to a molar ratio of 10-50:20-40:5-30:0-30. Softening temperature of the glass is lowered through synergism of high-concentration Bi2O3 and B2O3 to realize low-temperature seal; Sn2+ in a glass network prepared through melting-quenching is converted into Sn4+ in the process of heating, conversion from Bi3+ in the glass to Bi5+ is stopped, and refractivity of the glass is stabilized; Sn can further lower the softening temperature of the seal glass and can adjust expansion coefficient of the glass, so that seal performance of the seal glass is improved remarkably; the glass is suitable for photoelectric materials and other low-temperature precise seal fields. The raw materials for preparation are simple and easy to obtain, the preparation method is stable, low in cost and simple and easy to implement, and practical and industrial conditions are met.

The invention relates to a broadband low-dispersion metamaterial which comprises a first substrate and a plurality of artificial microstructures, wherein the plurality of artificial microstructures are attached to one side surface of the first substrate, each artificial microstructure is a silk yarn made of conductive materials, each artificial microstructure is provided with a first main yarn and a second main yarn which are intersected, the two ends of the first main yarn are connected with two first knuckle lines, and the two ends of the second main yarn are connected with two second knuckle lines. According to the broadband low-dispersion metamaterial disclosed by the invention, a relatively stable refractive index can be provided in a broader frequency range, namely that the metamaterial has a broadband low-dispersion characteristic.

This invention provides a multi-wavelength laser composed of a laser and wavelength selectable device designed with an nonuniformiy structure which can reflect the light of different wavelengths from different positions on the operation surface when the wavelength selectable light device is used as the feedback mirror of the laser array, it can feedback the light of different wavelengths along the nonuniformity direction at different positions to the laser units in the relative array and matrix of the position so as to generate laser oscillating.

The invention relates to a wideband low-dispersion metamaterial. The wideband low-dispersion metamaterial comprises a first base plate and a plurality of artificial microstructures attached onto one side surface of the first base plate, wherein the artificial microstructure is a silk yarn made from a conductive material and comprises a first main line and a second main line which are crossed; the two ends of the first main line extend to the second main line so as to form two first branch lines; and the two ends of the second main line extend to the first main line so as to form two second branch lines. According to the wideband low-dispersion metamaterial, more stable refractive index can be provided in a wider frequency range, namely the characteristics of wide band and low dispersion are achieved.

The invention relates to a high-transmittance optical brightness enhancement film. The film comprises a brightness enhancement film body (11), and a microprism structure (12) disposed on the upper surface of the brightness enhancement film body (11), wherein the pitch of the microprism structure is 25 [mu]m to 200 [mu]m. A manufacture apparatus of the film comprises a hot-air machine (2), a feed hopper (3), a hot-air drier (4), an air lock device (5), a hot melt device (6), a pattern roller (8) and a grinding roller (9), wherein the outlet end of the hot melt device (6) is equipped with a calender roller group (7), and the pattern roller (8) and the grinding roller (9) are in cooperation and disposed at the left side of the calender roller group (7). A manufacture process of the film comprises the following steps: S1, pattern roller preparation; S2, material preparing; S3, drying; S4, hot melting of granular materials; S5, calendaring; S6, moulding; and S7, final processing. The advantages are that processing cost is low, the influence on the environment in the manufacture process is small, the manufacture technology is simple, and transmittance is high.