Method for preparing graduated color film through magnetron sputtering machine
A sputtering machine and color technology, used in sputtering coating, ion implantation coating, metal material coating process, etc., can solve the problems of less gradient color forms, inconvenient production, etc., to achieve stable refractive index and satisfy the market. Variety of effects with stable optical performance
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Embodiment 1
[0108] The sputtering machine used in this embodiment is a SWOS-2000H large magnetron sputtering machine.
[0109] First, place the cleaned glass cover plate, that is, the workpiece 3, on the workpiece holder 4 of the sputtering machine, where the high refractive index target, the low refractive index target and the workpiece 3, and the shielding plate 1 are placed as Figure 3-5 As shown, the distance between the shielding plate 1 and the high refractive index target and the low refractive index target is 2 cm, and the distance between the shielding plate 1 and the workpiece 3 is 13 cm. 2 sets of shielding plates 1 shape are adopted Figure 7 The shapes shown are placed between the high refractive index target material and the low refractive index target material and the workpiece 3 respectively. Close the door and pump down to 5.0×10 -3 Pa, ion cleaning the workpiece 3 with the anode layer ion source for 10 minutes before coating.
Embodiment 2
[0117] First, place the cleaned glass cover plate, the workpiece 3, on the workpiece holder 4 of the sputtering machine, where the high extinction coefficient target material and the glass substrate are placed as Figure 7 As shown in the shielding plate 1, the distance between the shielding plate 1 and the target with high extinction coefficient is 4cm, the distance between the shielding plate 1 and the workpiece 3 is 11cm, and there is no shielding plate 1 between the other targets 2 and the workpiece 3. . The shape of the shield 1 is adopted Figure 7 The shape shown, close the door and pump to 5.0×10 -3 Pa, ion cleaning the workpiece 3 with the anode layer ion source for 10 minutes before coating.
[0118] After the ion cleaning of the anode layer is completed, the coating is started. First, the bottom layer is plated on the workpiece 3, then the first high refractive index film is plated, then the first low refractive index film is plated, and then the second high refractive ...
Embodiment 3
[0122] First, place the cleaned glass cover plate, that is, the workpiece 3, on the workpiece holder 4 of the sputtering machine, and place it between the low refractive index target and the workpiece 3. Figure 8 As shown in the shielding plate 1, the distance between the shielding plate 1 and the low refractive index target is 5cm, the distance between the shielding plate 1 and the workpiece 3 is 10cm, and the other targets 2 and the workpiece 3 are not provided with a shielding plate 1. The shape of the shield 1 is adopted Figure 8 The shape shown, close the door and pump to 5.0×10 -3 Pa, ion cleaning the workpiece 3 with the anode layer ion source for 10 minutes before coating.
[0123] After the ion cleaning of the anode layer is completed, the coating is started. First, the bottom layer is plated on the workpiece 3, then the first high refractive index film is plated, then the first low refractive index film is plated, and then the second high refractive index film is plate...
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