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LaTiO3 evaporation material for high refractivity optical film, method of producing the same and use

A technology of high refractive index and optical thin film, which is applied in optics, optical components, instruments, etc., can solve the problems of increasing process difficulty and equipment investment, and achieve the effects of high transmittance, dense film layer and stable performance

Inactive Publication Date: 2008-05-14
GENERAL RESEARCH INSTITUTE FOR NONFERROUS METALS BEIJNG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

By improving the coating process and coating equipment, a firm and dense film layer can be obtained and the adverse effect on the substrate can be reduced, but the process difficulty and equipment investment will be increased

Method used

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  • LaTiO3 evaporation material for high refractivity optical film, method of producing the same and use

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] Embodiment 1: material preparation

[0022] Ti 2 o 3 Fine powder and La 2 o 3 Mix thoroughly according to the weight ratio (3:7), grind and mix the mixture thoroughly for 4-6 hours, and press and granulate in an appropriate way, at 1700°C, vacuum degree: 2×10 -1 Pa-8×10 -2 Pa, keep warm for 3-8 hours and then cool down. Prepare a dark gray material with a density of about 5.3g / cm 3 , with a melting point of about 1800°C. The prepared high refractive index optical film uses LaTiO 3 The XRD pattern of the evaporated material is shown in Figure 1, and the XRD analysis shows that the material is composed of a single phase structure without other impurity phases.

Embodiment 2

[0023] Embodiment 2: material preparation

[0024] TiO 2 Fine powder, Ti powder and La 2 o 3 Mix thoroughly according to the weight ratio (70.3:6.7:23.0), grind and mix the mixture thoroughly for 4-6 hours, and press and granulate in an appropriate way, at 1700°C, vacuum degree: 2×10 -1 Pa-8×10 -2 Pa, keep warm for 3-8 hours and then cool down. Prepare a dark gray material with a density of about 5.5g / cm 3 , with a melting point of about 1800°C.

Embodiment 3

[0025] Example 3: Material Application

[0026] The substrate for coating is a quartz substrate, which is evaporated by electron beam evaporation equipment, and the vacuum degree is 1.5×10 -4 torr, the substrate temperature is 200°C, the evaporation temperature is about 2200°C, and the evaporation rate is , the refractive index of the prepared coating layer at 550nm is 2.11, the film layer is firm, and has no light absorption in the visible light region.

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Abstract

The invention relates to a vaporizing material for a high refraction optics film, namely a compound with the chemical reaction of LaTiO3. The material is formed by single structure with no other doping. The density of the material is 5.2 to 5.9g / cm<3 > with good filling performance, taking Ti2O3 and La2O3, or TiO2, La2O3 and Ti as the material to be reacted under high temperature and vacuum state to produce TiO3. The LaTiO3 vaporizing material is used for producing the high refraction optics film which is a rigid medium film with good performance. The high refraction optics film is an antireflection coating of filming of a resin lens, a dichroic prism or a broad band. In the method of producing the high refraction optics film, the vaporizing material LaTiO3 is not changed in the vaporizing process and the vaporizing material LaTiO3 in crucible needs no update to keep stable refraction rate of the film. Multi high-refraction optics films are produced through once fusion and multi times of vaporization.

Description

technical field [0001] The invention belongs to a kind of LaTiO used for high refractive index optical film 3 Evaporation material and its preparation method and use. Background technique [0002] High refractive index optical film materials are widely used in the design of various optical film systems. They are mainly used in conjunction with low refractive index materials or with medium and low refractive index materials to prepare various antireflection films. These films are mainly Lenses, prisms, mirrors, etc. used in optical instruments. Currently widely used high refractive index materials mainly include various titanium, zirconium, hafnium, tantalum, niobium oxides and their mixed materials. [0003] In order to further broaden the selection range of materials and meet the requirements of optical film system design, various mixed film materials have been developed and widely used in optical thin film coating. The application of the mixed film material in the film ...

Claims

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Application Information

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IPC IPC(8): G02B1/00
Inventor 张碧田潘德明王星明段华英储茂友邓世斌孙静张明贤龚述荣
Owner GENERAL RESEARCH INSTITUTE FOR NONFERROUS METALS BEIJNG
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