Displacement and oscillating angle measuring light path structure for two-dimensional holographic scanning exposure workbench

Abstract

The invention discloses a displacement and oscillating angle measuring light path structure for a two-dimensional holographic scanning exposure workbench, belongs to the field of manufacturing of holographic planar diffraction gratings, and aims to solve the problems of influence on the measurement accuracy caused by thermal expansion of an interference field carrying platform and high difficulty in processing and adjustment of a Y-axis long-strip reflecting mirror with the meter-scale size in the prior art. The displacement and oscillating angle measuring light path structure for the two-dimensional holographic scanning exposure workbench comprises an X-axis measurement system and a Y-axis measurement system, wherein the X-axis measurement system comprises an X-axis light beam direction adjuster, an X-axis interferometer, a periscope structure, an X-axis measurement reflecting mirror and an X-axis reference reflecting mirror; the Y-axis measurement system comprises a plurality of Y-axis interferometers, a Y-axis reference reflecting mirror and a Y-axis measurement reflecting mirror; laser light emitted by a double-frequency laser is split into two beams of light through a beam splitting prism, and the two beams of light enter the X-axis measurement system and the Y-axis measurement system through a steering prism respectively; the X-axis interferometer in the X-axis measurement system is used for realizing the measurement of the relative position of the X axis of the workbench through the periscope structure; the Y-axis measurement system is used for realizing the measurement of the relative position of the Y axis through the Y-axis interferometers.

Description

technical field [0001] The invention belongs to the technical field of making holographic plane diffraction gratings, and in particular relates to a holographic scanning exposure two-dimensional workbench displacement and swing angle measurement optical path structure. Background technique [0002] There are two main methods for manufacturing meter-scale holographic gratings: one is the static interference field exposure method, in which two planar Gaussian beams are superimposed to form linear interference fringes, and the interference field and the grating substrate are always kept stationary, one exposure will interfere The fringes are recorded on the exposure glue, and the same or even larger interference field is required to fabricate meter-scale gratings. The other is the scanning exposure method, which uses two small-section Gaussian lasers to interfere with each other to form interference fringes (also known as interference fields) with a spot diameter of millimeters...

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Problems solved by technology

[0004] The purpose of the present invention is to propose a holographic scanning exposure two-dimensional worktable displacement and swing angle measurement optical path structure, to solve the influence of the thermal expansion of the interference field bearing platform on the measurement accuracy and the Y-axis long reflector with a meter-level size in the prior art Difficult processing and assembly problems

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