107 results about "Field exposure" patented technology

An x-ray CT system that generates tomographic phase contrast or dark field exposures, has at least one grating interferometer with three grating structures arranged in series in the radiation direction, with a modular design of the second and third grating structures. The distance between the first grating structure of the x-ray source and the second grating structure (fashioned as a phase grating) of the respective grating / detector modules is adapted, depending on the fan angle, corresponding to a period of the grating structure of the x-ray source projected onto the grating detector module at a respective fan angle (φi).

Methods and devices are provided for support of a body structure. The devices can be adjusted within the body of a patient in a minimally invasive or non-invasive manner such as by applying energy percutaneously or external to the patient's body. The energy may include, for example, acoustic energy, radio frequency energy, light energy and magnetic energy. Thus, as the body structure changes size and / or shape, the size and / or shape of the annuloplasty rings can be adjusted to provide continued reinforcement. In certain embodiments, the devices include a shape memory material that is responsive to changes in temperature and / or exposure to a magnetic field. A material having enhanced absorption characteristics with regard to a desired heating energy may be used in order to facilitate heating and adjustment of the support device.

Disclosed is a resist pattern forming method wherein an exposure mask with a light blocking film having a fine opening not greater than a wavelength of exposure light is placed close to a resist layer provided on a substrate and wherein exposure light is projected to the resist layer through the exposure mask, whereby the resist layer is exposed with near-field light leaking from the fine opening such that a pattern of the exposure mask is transferred to the resist layer. The method includes a resist layer forming step for forming, on the substrate, a negative type resist layer with a thickness not less than a leakage depth of the near-field light, an exposure step for exposing the negative type resist layer with the near-field light, and a development step for developing the exposed negative type resist layer by use of a developing liquid to form a pattern in a region being shallower than the thickness of the negative type resist layer.

A near-field light generating structure for generating near-field light has a pattern of a fine metal structure comprising a light blocking layer or a pattern of a fine opening provided in the light blocking layer. The fine metal structure or the fine opening has a size of not more than a wavelength of incident light. The fine metal structure or the fine opening has a sectional shape, in a plane parallel with the incident light, which is asymmetrical in terms of a member adjacent to the fine metal structure or the fine opening.

Disclosed is a photomask for near-field exposure, that includes a light blocking film having a group of small openings being arrayed and each having an opening width not greater than a wavelength of exposure light, wherein a shape and / or disposition of the small-opening group is set so that near-field light escaping from the small openings in response to projection of exposure light to the small openings has approximately even light intensity distributions.

An x-ray CT system that generates tomographic phase contrast or dark field exposures, has at least one grating interferometer with three grating structures arranged in series in the radiation direction, with a modular design of the second and third grating structures. The distance between the first grating structure of the x-ray source and the second grating structure (fashioned as a phase grating) of the respective grating / detector modules is adapted, depending on the fan angle, corresponding to a period of the grating structure of the x-ray source projected onto the grating detector module at a respective fan angle (φi).

A near-field photomask is made up of a light shield film and openings formed in the light shield film, the photomask being used to expose an exposure target with a near-field light generated through the openings. The openings formed in the light shield film comprise two or more parallel rows of first slit openings each having a width smaller than 100 nm, and a second slit opening having a width smaller than 100 nm and extended perpendicularly to the rows of first slit openings while interlinking at least two of the rows of first slit openings.

The torque characteristic is improved using a magnetic flux efficiently, and an eddy-current loss generated in a coil is reduced. Moreover, a loss is suppressed even if a metal member having a high thermal conductivity is closely disposed or closely contacted to a coil surface exposed by a variable magnetic field to improve the heat transfer property, thereby improving the cooling capability. A coil assembly for a rotational electric apparatus has first and second coil plates having wiring patterns formed in such a way that conductive coil segments adjoin with each other via slits, magnetic-flux-transfer-member slots formed in the slits and having a wider width than such slits, a coil constituted by the stacked coil plates so that the magnetic-flux-transfer-member slots overlap with each other, and a magnetic flux transfer member inserted into the magnetic-flux-transfer-member slots of the coil.

A near-field photoresist for formation of a fine pattern with by near-field exposure includes an alkali-soluble novalac resin, a diazyde-type photosensitizer which is photoreactive by near-field exposure, a photoacid generator which generates acid by the near-field exposure, and a solvent.

A photomask for near-field light exposure includes a transparent substrate, and a shading member on the substrate, a mask pattern including at least two apertures with different widths not greater than the wavelength of light from a light source. The shading member has a constant thickness that is set such that differences between light intensities directly below each of the apertures of different widths is 20% or less based on a largest light intensity of the light intensities directly below each of the apertures of different widths. A near-field light exposure apparatus includes a stage that holds the photomask, a light source, a sample table that holds a work substrate provided with a photoresist having a thickness that is less than the wavelength of exposure light, and a means for controlling the distance between the work substrate and the photomask.

A photomask for use in near-field exposure includes a mask support which is transparent to exposure light; a shading film which is formed on one side of the mask support, and has at least one-opening arranged to form a predetermined pattern; and at least one filler which is transparent to the exposure light, and is arranged in the at least one opening with a predetermined height above the level of the boundary between the mask support and the shading film. The difference between the thickness of the shading film and the height of each of the at least one filler does not exceed 50 nanometers.

A system is configured to shield an interior chamber of a structure. The system may include a power source, an outer shield assembly operatively connected to the power source and coupled to an outer wall of the structure, and an inner shield assembly surrounding the internal chamber. The outer shield assembly generates a magnetic field through and around the structure. The inner shield assembly deflects radiation particles away from the interior chamber and re-directs portions of the magnetic field around the interior chamber.

Disclosed is a method of detecting an attraction force between substrates, and a near-field exposure method and apparatus, wherein, in the attraction force detecting method, an elastically deformable first substrate is intimately contacted to a second substrate which is not elastically deformable as compared with the first substrate and, when the first and second substrates so contacted are separated from each other, an attraction force acting between the first and second substrates is detected. Specifically, the includes at least one of (i) a step for detecting an attraction force acting between the first and second substrates on the basis of a difference between (a) a physical quantity necessary for intimately contacting the first substrate to the second substrate and (b) a physical quantity necessary for separating the first substrate from the second substrate, and (ii) a step of detecting an attraction force acting between the first and second substrates on the basis of an amount of deformation of the first substrate relative to the second substrate.

The invention discloses a magnetic assisted tensioning device for digestive endoscopy surgery, which comprises an in-vitro electromagnet and also comprises an in-vivo branch matched with the in-vitro electromagnet, wherein the in-vivo branch is composed of an in-vivo magnet and micro-surgical forceps which are connected through connecting lines. The tensioning of the focus is completed by utilizing magnetic attraction to achieve the purpose of surgical field exposure. The magnetic assisted tensioning device is especially suitable for lower excision of the gastric mucosa through the digestive endoscopy. By using the device, a tensioning instrument can be used without occupying the operation channel of the digestive endoscopy, the surgical field exposure is still sufficient when the focus is excised, and the focus with the diameter greater than 20mm of the body of the stomach and duodenum can be possibly excised through the digestive endoscopy, thereby expanding the indications of the endoscopy surgery, meeting the requirements of more patients for minimally invasive surgery, and avoiding the wound to a patient due to the laparotomy.

The invention relates to the field of laparoscopic micro-invasive surgery, in particular to a spindly non-pneumoperitoneum device for a single-port laparoscopy. According to the spindly non-pneumoperitoneum device, the defects of small surgery space, poor surgical field exposure and great quantity of abdominal incisions in a traditional non-pneumoperitoneum technology can be overcome. The spindly non-pneumoperitoneum device consists of a fixed frame, a suspension mechanism and a spindle mechanism. Due to the adoption of the technical scheme that a support ring enables spindly spokes to be stretched off and be arrayed in an umbrella shape by upwards lifting a suspender, an anterior abdominal wall is semi-spherically lifted and suspended by the spokes arrayed in an umbrella shape and the phenomenon that the surgery space becomes smaller and narrower due to the fact that abdominal walls on two sides gather towards the middle to extrude intestinal canal to be concentrated to the middle by a suspending pull force of the abdominal walls is avoided; due to adoption of single incision in umbilical region, an illuminating probe, surgical instruments and the like extend into an abdominal cavity for surgery by using a hollow structure of the device; and due to the adoption of a rotational suspension device, the surgical instruments obtain a more favorable operation angle and the problems of small surgery space, insufficient surgical field exposure and great quantity of abdominal incisions in the traditional non-pneumoperitoneum technology are better solved.

A near-field exposure mask includes a mask base material and a light blocking layer formed on the base material, the light blocking layer includes a fine metal structure or fine opening formed in the light blocking layer. The size of the metal structure or the size of the opening is not more than a wavelength of light for exposure, and at least one of a cross section of the fine metal structure in a direction perpendicular to a surface of the mask, and a cross section of the fine opening in a direction perpendicular to the mask surface has an asymmetrical sectional shape with respect to an arbitrary axis perpendicular to the mask surface.

This invention provides methods of creating via or trench structures on a developer-soluble hardmask layer using a multiple exposure-development process. The hardmask layer is patterned while the imaging layer is developed. After the imaging layer is stripped using organic solvents, the same hardmask can be further patterned using subsequent exposure-development processes. Eventually, the pattern can be transferred to the substrate using an etching process.

A video processing method includes: dividing a currently processed frame into a top field and a bottom field, and performing field exposure on the top field and the bottom field respectively to acquire an exposed top field and an exposed bottom field, where a field exposure time length of the top field and that of the bottom field are different; processing the exposed top field and the exposed bottom field by using a de-interlacing technique to acquire two reconstructed exposed frames; and performing image enhancement processing on the two reconstructed exposed frames to acquire an image of the currently processed frame.

The invention discloses an abdominal cavity distraction device which comprises a support connected to a bed body. A sleeve is arranged on the support. Two abdomen distraction arms which are driven by a driving mechanism to move relatively are connected in the sleeve in a sliding mode. Abdomen distraction plates are arranged at the outer-extending ends of the two abdomen distraction arms respectively. Inserting long grooves are formed in the two abdomen distraction arms respectively. Pulling rods with the widths smaller than those of the inserting long grooves are inserted in the inserting long grooves. Viscera traction plates are arranged on the end portions, extending to the positions between the two abdomen distraction arms, of the pulling rods. The abdomen distraction arms are connected with locking bolts which extend into the inserting long grooves in a screwing mode. The abdominal cavity distraction device has the advantages that the angle and the force of viscera traction can be guaranteed, and surgical field exposure can be guaranteed.

In a near-field exposure system: a light source emits exposure light having a predetermined wavelength and being unpolarized; a polarizer plate linearly polarizes the exposure light; an exposure mask which has a pattern of openings each having a dimension smaller than the wavelength of the exposure light is placed at such a position that the exposure light is applied to the exposure mask; an exposure table holds a photosensitive material sensitive to the exposure light, at a position which near-field light emerging from the openings reaches; and a polarizer-plate holding means holds the polarizer plate in such a manner that the polarizer plate can be moved between first and second positions, where the first position is in an optical path of the exposure light from the light source to the exposure mask, and the second position is outside the optical path.

A method for measuring the imaging quality of a lithography machine, comprising the following steps: exposing uniformly distributed DFOCAL mark patterns on a mask to a silicon wafer under n defocus amounts of a lithography machine to form n exposure fields; using an alignment system Sampling and measuring n exposure fields at equal intervals to obtain the alignment position of each mark in n / m fields; using the change law between the deviation of the horizontal position of the mark imaging and the defocus of the silicon wafer to calculate each DFOCAL mark point in the exposure field The approximate position of the best focus; measure the alignment position of the corresponding DFOCAL mark in the n / m fields closest to the approximate position of the best focus of each DFOCAL marker in the exposure field; accurately fit the best focus of each DFOCAL marker position; calculate the axial image quality parameter. The method of the invention utilizes the DFOCAL mark to perform high-precision, wide-range, and rapid measurement of the axial image quality parameters used for evaluating the imaging quality of the lithography machine.

The invention relates to a method of non-chemical control measure for preventing rice from lodging, in particular to a method for preventing the rice from lodging, which solves other technical problems. The method is that the pure nitrogen content of nitrogenous fertilizer is controlled to be 8-12kg / mu; from the initial stage of stem pushing to grouting period, kalium is supplemented on leaf surface for two times consecutively so as to increase the tenacity of eustipes of the rice; water is used scientifically; the shallow water layer is kept in the period of seedling establishment; wetness irrigation is carried out in the tillering stage; the field exposure and field sunning are started when the number of the seedlings reach to 80-90% of the number of spikes, slight sunning is adopted for a plurality of times so as to control inefficient tillering, promote the root system to grow deeply and strengthen the boles and plants; after the spikes are differentiated, irrigation is carried out and the shallow water layer is kept till the heading flowering period; interval irrigation is carried out in the grouting maturity stage, and dryness and wetness are alternate; the water is broken about 7 days before the harvest; after the experiment, the phenomenon that only one plant leans appears in the experimental field of five mu, and the effect belongs the first one in the country at present.

The invention relates to the field of peritoneoscope minimally-invasive surgery, in particular to a direct-inserting type peritoneoscope pneumoperitoneum-avoiding device. The shortcomings that an existing pneumoperitoneum-avoiding technology operation is small in space and bad in surgical field exposure can be overcome. The direct-inserting type peritoneoscope pneumoperitoneum-avoiding device comprises a support, a cantilever beam, a hanging umbrella and a sleeve. The technical scheme that an abdominal wall is pulled and lifted through umbrella leaves is used, a front abdominal wall is lifted, pulled and hung through the umbrella leaves, and the problem that the existing pneumoperitoneum-avoiding technology operation is not sufficient in space exposure is well solved.

The invention provides a galvanometer correction system and method. The galvanometer correction system is implemented according to the following steps of S1, maintaining a galvanometer scanning systemfixed, allowing a galvanometer optical axis to sequentially perform in-field exposure along an x direction and a y direction, sequentially dotting in the x direction and the y direction, forming light spots, and measuring and recording positions of all light spots generated by the galvanometer scanning system by a light spot position measurement device; S2, bringing data obtained by measurement of the light spot position measurement device into an in-field alignment model to obtain an in-field error parameter of a current galvanometer; S3, performing calculation to obtain to-be-compensated galvanometer in-field error quantity; and S4, bringing the error quantity of the x direction and the y direction, obtained in the step S3, back to a galvanometer controller for dotting again, performingdetection and accuracy judgment on the light spots dotted again, repeating the steps S1 until S3 if the accuracy is not met, stopping if the accuracy is met, and completing correction. The galvanometer correction system and method, provided by the invention, are good in correction effect.

A near-field exposure mask includes a light blocking film having an opening smaller than a wavelength of exposure light, and a mask base material for holding the light blocking film. The near-field exposure mask is configured and positioned to effect exposure of an object to be exposed to near-field light generated corresponding to the opening during contact thereof with the object to be exposed. The mask base material is transparent to the exposure light and comprises a synthetic resin material having Young's modulus in a range of 1 GPa or more to 10 GPa or less.

A method for exposing a workpiece on the basis of near-field light escaping from an exposure mask having a light blocking film with a plurality of rectangular openings. The method includes protecting non-polarized near-field exposure light from a light source through the openings of the exposure mask to perform exposure of a pattern on the workpiece. The widths of the rectangular openings are smaller than that at a cross-point between a first curve on a coordinate of widths of the openings versus a near-field light intensity for an incident-light electric-field direction perpendicular to a lengthwise direction of a small-opening pattern and a second curve on the same coordinate for an incident-light electric-field direction parallel to the lengthwise direction of the small-opening pattern.

An optical imprinting apparatus, and a method for producing a two-dimensional pattern, have line widths less than the wavelength of an exposure light. The evanescent (proximity) field effect is adopted to realize the apparatus and method. An optical imprinting apparatus comprises a container in which light is enclosed, an exposure-mask having a proximity field exposure pattern firmly fixed to a section of the container for exposing the exposure pattern on a photo-sensitive material through an evanescent field by the light enclosed therein; and a light source for supplying the light in the container.

A near-field exposure method includes closely contacting an exposure mask having a light blocking film with small openings of a size not greater than a wavelength of exposure light of an exposure light source, to a photoresist layer formed on a substrate having surface unevenness, and projecting the exposure light of the exposure light source onto the exposure mask so that the photoresist is exposed based on near-field light escaping from the small openings, wherein the near-field exposure is carried out while keeping both a contact region in which the light blocking film and the photoresist layer are in contact with each other and a liquid region in which an interspace between the light blocking film and the photoresist layer is filled with a liquid, coexisting between the light blocking film and the photoresist layer, whereby fluctuation of exposure state of the near-field exposure due to surface unevenness of the substrate is reduced effectively.