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Holographic Scanning Exposure 2D Stage Displacement and Swing Angle Measurement Optical Path Structure

A technology for holographic scanning and measuring optical path, which is applied in the field of holographic scanning exposure two-dimensional table displacement and swing angle measurement optical path structure, which can solve the influence of interference field bearing platform measurement accuracy and the difficulty in processing and assembling Y-axis long reflectors and other problems to achieve the effect of reducing the difficulty of processing and assembly and improving the measurement accuracy

Active Publication Date: 2017-07-14
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

[0004] The purpose of the present invention is to propose a holographic scanning exposure two-dimensional worktable displacement and swing angle measurement optical path structure, to solve the influence of the thermal expansion of the interference field bearing platform on the measurement accuracy and the Y-axis long reflector with a meter-level size in the prior art Difficult processing and assembly problems

Method used

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  • Holographic Scanning Exposure 2D Stage Displacement and Swing Angle Measurement Optical Path Structure
  • Holographic Scanning Exposure 2D Stage Displacement and Swing Angle Measurement Optical Path Structure
  • Holographic Scanning Exposure 2D Stage Displacement and Swing Angle Measurement Optical Path Structure

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Embodiment 1

[0034] The method for measuring the displacement of the two-dimensional workbench 18 on the X-axis relative to the interference field is as follows: the laser light emitted by the dual-frequency laser 1 passes through the beam-splitting prism 2, and then enters the X-axis after being reflected by the steering prism 4 The beam direction adjuster 5 then enters the X-axis interferometer 6; after the beam passes through the X-axis interferometer 6, it is divided into two clusters of light up and down; the cluster of light on the top passes through the two periscope structures 7 to carry out the optical path After refraction, it is incident on the surface of the X-axis reference mirror 10, and then returns to the inside of the biaxial interferometer along the original optical path; a cluster of light located at the bottom of the X-axis interferometer 6 is reflected by the X-axis measurement After being reflected by the mirror 8, it returns to the interior of the X-axis interferomete...

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Abstract

Holographic scanning exposure two-dimensional table displacement and swing angle measurement optical path structure belongs to the field of holographic plane diffraction grating, the purpose is to solve the influence of thermal expansion of the interference field bearing platform on the measurement accuracy and the Y-axis strip reflection of meter-level size in the existing technology The processing and assembly of the mirror is difficult. The X-axis measurement system included in the present invention includes an X-axis beam direction adjuster, an X-axis interferometer, a periscope structure, an X-axis measurement mirror and an X-axis reference mirror; the Y-axis measurement system includes a Y-axis interferometer, a Y-axis reference reflector mirror and Y-axis measuring mirror; the laser emitted by the dual-frequency laser is split into two beams through the splitter prism, and enters the X-axis measurement system and the Y-axis measurement system through the steering prism respectively; the X-axis interferometer in the X-axis measurement system adopts The periscope structure realizes the measurement of the X-axis relative position of the workbench; the Y-axis measurement system uses multiple Y-axis interferometers to realize the measurement of the Y-axis relative position.

Description

technical field [0001] The invention belongs to the technical field of making holographic plane diffraction gratings, and in particular relates to a holographic scanning exposure two-dimensional workbench displacement and swing angle measurement optical path structure. Background technique [0002] There are two main methods for manufacturing meter-scale holographic gratings: one is the static interference field exposure method, in which two planar Gaussian beams are superimposed to form linear interference fringes, and the interference field and the grating substrate are always kept stationary, one exposure will interfere The fringes are recorded on the exposure glue, and the same or even larger interference field is required to fabricate meter-scale gratings. The other is the scanning exposure method, which uses two small-section Gaussian lasers to interfere with each other to form interference fringes (also known as interference fields) with a spot diameter of millimeters...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/02G01B11/26
Inventor 李晓天刘兆武于海利唐玉国巴音贺希格齐向东李文昊白志红
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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