Method for manufacturing binary optical element with transparent ceramic as substrate material

Abstract

The invention discloses a method for manufacturing a binary optical element with transparent ceramic as a substrate material. According to the method for manufacturing the binary optical element with the transparent ceramic as the substrate material, the non-doped yttrium yttrium aluminum garnet transparent ceramic is taken as the substrate material of the binary optical element, a compact anti-oxidant metal film is sputtered on the surface of the transparent ceramic through a magnetic-control sputtering system device, and binary optical element microstructures such as an optical grating in a mask plate are transferred into the metal film of the transparent ceramic by means of a touch type photoetching system so as to be reserved on the transparent ceramic. The substrate material has the advantages of being resistant to high temperature, high pressure and corrosion, high in hardness and high in transmittance in the infrared band and is suitable for manufacturing of transmission type or reflection type binary optical elements, and the defect that a traditional non-transparent silicon substrate material can not be used for manufacturing binary optical elements and can not be applied in special environments can be overcome.

Description

technical field [0001] The invention relates to a method for making a binary optical element by using transparent ceramics as a base material, in particular to a binary optical element material, and belongs to the technical field of optical materials. Background technique [0002] Traditional microlithography substrate materials are silicon substrate materials, ordinary optical glass, etc. These materials have some shortcomings: they can only be used in the visible light range; some materials themselves are opaque and brittle, and cannot be used as transmissive devices; Some materials have low melting point and low hardness, so they cannot be used in high-temperature, high-pressure, and high-strength environments; High temperature, high pressure resistance, corrosion resistance, high hardness, good transmittance in visible light and infrared bands, can become an excellent photolithography substrate material. [0003] In recent years, transparent ceramics, as a new optical f...

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Problems solved by technology

[0002] Traditional microlithography substrate materials are silicon substrate materials, ordinary optical glass, etc. These materials have some shortcomings: they can only be used in the visible light range; some materials themselves are opaque and brittle, and cannot be used as transmissive devices; Some materials have low melting point and low hardness, so they cannot be used in high-temperature, high-pressure, and high-strength environments; High temperature, high pressure resistance, corrosion resistance, high hardness, good transmittance in visible light and infrared bands, can become an excellent photolithography substrate material

At the same time, the many advantages of YAG transparent ceramics can also make it an ideal carrier for binary optical devices, but there is currently no technical report in this area in China

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