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Method for processing micro array on glass surface via femtosecond laser pulse sequence

A pulse sequence, femtosecond laser technology, applied in the field of femtosecond laser applications, can solve problems such as low etching efficiency, achieve the effect of improving etching efficiency and promoting material modification

Active Publication Date: 2015-05-06
BEIJING INSTITUTE OF TECHNOLOGYGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the problem of low etching efficiency in the existing femtosecond laser modification-assisted chemical etching processing method, and to provide a method for processing microarrays on the glass surface with a femtosecond laser pulse sequence

Method used

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  • Method for processing micro array on glass surface via femtosecond laser pulse sequence

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Experimental program
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Effect test

Embodiment 1

[0022] A method for processing a microarray on the glass surface with a femtosecond laser pulse sequence, the specific steps are as follows:

[0023] Step 1: Through the basic method of pulse shaping, the traditional femtosecond laser is modulated in the time domain into a femtosecond laser pulse sequence containing two sub-pulses; and the time interval between the two sub-pulses is 150 fs, the energy of the two sub-pulses The ratio is 5:1.

[0024] Step 2: Focus the femtosecond laser pulse sequence obtained in Step 1 on the surface of the fused silica glass, and scan a dot-shaped microarray with a dot pitch of 30 μm on the glass surface through the relative movement of the glass material and the laser focus.

[0025] Step 3: Immerse the fused silica glass with scanning microarray pattern obtained in Step 2 into a hydrofluoric acid solution with a concentration of 8%, and the scanned microarray pattern area reacts with the hydrofluoric acid solution to form a recessed microarray stru...

Embodiment 2

[0036] A method for processing a microarray on the glass surface with a femtosecond laser pulse sequence, the specific steps are as follows:

[0037] Step 1. Through the basic method of pulse shaping, the traditional femtosecond laser is modulated in the time domain into a femtosecond laser pulse sequence containing two sub-pulses; and the time interval between the two sub-pulses is 350 fs, the energy of the two sub-pulses The ratio is 1:1.

[0038] Step 2: Focus the femtosecond laser pulse sequence obtained in Step 1 on the surface of the fused silica glass, and scan a dot-shaped microarray with a dot pitch of 30 μm on the glass surface through the relative movement of the glass material and the laser focus.

[0039] Step 3: Immerse the fused silica glass with scanning microarray pattern obtained in Step 2 into a hydrofluoric acid solution with a concentration of 8%, and the scanned microarray pattern area reacts with the hydrofluoric acid solution to form a recessed microarray stru...

Embodiment 3

[0049] A method for processing a microarray on the glass surface with a femtosecond laser pulse sequence, the specific steps are as follows:

[0050] Step 1. Through the basic method of pulse shaping, the traditional femtosecond laser is modulated in the time domain into a femtosecond laser pulse sequence containing two sub-pulses; and the time interval between the two sub-pulses is 1 ps, the energy of the two sub-pulses The ratio is 1:5.

[0051] Step 2: Focus the femtosecond laser pulse sequence obtained in Step 1 on the surface of the fused silica glass, and scan a dot-shaped microarray with a dot pitch of 30 μm on the glass surface through the relative movement of the glass material and the laser focus.

[0052] Step 3: Immerse the fused silica glass with scanning microarray pattern obtained in Step 2 into a hydrofluoric acid solution with a concentration of 8%, and the scanned microarray pattern area reacts with the hydrofluoric acid solution to form a recessed microarray struct...

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Abstract

The invention relates to a method for processing a micro array on glass surface via femtosecond laser pulse sequence belonging to the technical field of femtosecond laser application. The method comprises the following steps: (1) modulating the conventional femtosecond laser into the femtosecond laser pulse sequence including two sub-pulses on a time domain via a pulse shaping method, wherein the time interval range of two sub-pulses is 50fs-2ps, and the energy ratio range of two sub-pulses is 0.2-5; (2) focusing the femtosecond laser pulse sequence on the surface of glass material, scanning the required micro array configuration pattern on the glass surface according to the relative movement between the glass material and the laser focal point; (3) immersing the glass material with micro array configuration pattern obtained in the step (2) in a hydrofluoric acid solution with the concentration being 1-10%, carrying out reaction on the micro array configuration pattern region and the hydrofluoric acid solution so as to from a concave micro array structure. The modification degree of the femtosecond laser irradiation region is increased and the etching efficiency of the irradiation region is finally improved.

Description

Technical field [0001] The invention relates to a method for irradiating glass by using a femtosecond laser pulse sequence to improve the chemical etching efficiency of the modified area, and belongs to the technical field of femtosecond laser application. Background technique [0002] As a transparent medium with good optical properties, glass is a substrate material widely used in microfluidic devices. The microarray structure processed on the substrate can control the flow state of the fluid and has high application value. [0003] Femtosecond laser is a kind of laser that operates in pulse form. Compared with traditional lasers, femtosecond lasers have extremely short pulse duration (good time resolution can be obtained), extremely high pulse peak power (instant power up to one trillion watts), can avoid thermal effects and shock waves, and are precise Targeting, focusing and positioning are widely used in the field of material micro-nano processing. At present, there are two...

Claims

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Application Information

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IPC IPC(8): C03C15/00
CPCC03C15/00
Inventor 姜澜赵梦娇胡洁
Owner BEIJING INSTITUTE OF TECHNOLOGYGY
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