A kind of photosensitive resin composition and its application

A technology of photosensitive resin and composition, which is applied in the direction of optics, optical filters, optical mechanical equipment, etc., can solve the adverse effects of substrate adhesion and development residues, reduce the accuracy of color filters, prolong exposure time and other problems, and achieve curing The effect is excellent, the pattern is complete and clear, and the effect of high optical transparency

Active Publication Date: 2019-04-09
CHANGZHOU TRONLY ADVANCED ELECTRONICS MATERIALS CO LTD +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In actual use, the pixels with high optical density and the resin base layer system often have high content of pigments, carbon black and other coloring materials, and the increase in the concentration of coloring materials will have adverse effects on resolution, substrate adhesion, and development residues, not only It is necessary to increase the exposure amount or extend the exposure time in the exposure process, and also reduce the accuracy of the color filter

Method used

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  • A kind of photosensitive resin composition and its application
  • A kind of photosensitive resin composition and its application
  • A kind of photosensitive resin composition and its application

Examples

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Effect test

specific Embodiment approach

[0073] The present invention will be further described by the following examples, but it should not be interpreted as limiting the protection scope of the present invention.

[0074] Preparation Example

[0075] According to the formula listed in table 1, the photosensitive resin composition of preparation embodiment 1-8 and comparative example 1-4, wherein the structure of photoinitiator A1-A4 in comparative example 1-4 is as follows:

[0076]

[0077] Table 1

[0078]

[0079] The prepared photosensitive resin composition is dissolved in 100 parts by mass of solvent propylene glycol monomethyl ether acetate (PGMEA), and mixed uniformly to form a liquid composition;

[0080] Use a spin coater to coat the liquid composition on a glass substrate, then dry at 100°C for 5 minutes to remove the solvent to form a coating film with a film thickness of 8 μm; in order to obtain a coating film with the above thickness, the coating process can be completed once It can also be d...

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Abstract

A photosensitive resin composition, containing ultraviolet photosensitive prepolymer resin, an active diluting monomer, an oxime ester photoinitiator represented by formula (I), and a colorant. The composition has good exposure sensibility and developing property. When a system is low in opacifier content or low in exposure dose, a cured pattern is complete, clear to develop and high in resolution ratio, and the adaptation between the cured pattern and a substrate is excellent. The photosensitive resin composition has a great application prospect in terms of optical color filters, light spacers, rib barriers and the like.

Description

technical field [0001] The invention belongs to the field of organic chemistry, in particular to a photosensitive resin composition and its application in optical color filters such as color televisions, liquid crystal display elements, solid-state imaging elements and cameras, as well as photospacers (phtospacer) and ribs (rib) applications in etc. Background technique [0002] The photosensitive composition is obtained by adding a photopolymerization initiator to a polymerizable compound having an unsaturated bond, and is polymerized and cured mainly by irradiating energy rays, which plays a decisive role in the production of optical color filters. In recent years, with the improvement of people's requirements for the quality of life, the requirements for the clarity of liquid crystal display screens are also getting higher and higher, which requires that the photosensitive composition used to form the color filter image has high resolution and is compatible with the subst...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/027G02B5/20G02F1/1335G02F1/1339
CPCC07C13/567C07C251/66C07D209/82C07D307/91C07D333/76C08F2/48G02B5/20G02F1/1335G02F1/1339G03F7/004G03F7/027
Inventor 钱晓春钱彬胡春青王兵朱文斌
Owner CHANGZHOU TRONLY ADVANCED ELECTRONICS MATERIALS CO LTD
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