Preparation method of FS-IGBT (Field Stop-Insulated Gate Bipolar Translator)
A silicon wafer and backside technology, applied in the field of power semiconductor devices, can solve the problems of silicon wafer warpage, high difficulty, low yield rate, etc., and achieve the effect of reduced forward conduction voltage, small turn-off loss, and low yield rate
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[0038] The principles and characteristics of the present invention will be further described below in conjunction with the accompanying drawings, and the examples given are only used to explain the present invention, and are not intended to limit the scope of the present invention.
[0039] Such as Figure 6 As shown, the implementation of the present invention provides a method for preparing an FS-IGBT with a thin drift region on a thick silicon wafer, including:
[0040] Step 1: Select two N-type monocrystalline silicon wafers as the first silicon wafer and the second silicon wafer. The thickness of the first silicon wafer is 300 microns, and lightly doped N-type FZ silicon is used with a doping concentration of 2.5* 10 14 piece / cm 3 , to form Figure 5 In the drift region 3 of the FS-IGBT mentioned in the above, the thickness of the second silicon wafer is 300 microns, and heavily doped N-type CZ silicon is used, and the doping concentration is 5*10 19 piece / cm 3 , to ...
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