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High-grade oxidization method for removing antibiotic resistance genes in sewage

An antibiotic resistance, advanced oxidation technology, applied in chemical instruments and methods, water/sewage multi-stage treatment, water/sludge/sewage treatment, etc. Economical effect, low cost, simple equipment effect

Active Publication Date: 2015-07-15
NANJING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Existing reports on the impact of disinfection technology (chlorination and UV) on ARGs focus on the monitoring of sewage treatment plants or the treatment of water samples prepared in laboratories, but the impact of specific disinfection process operating parameters on ARGs in actual sewage is still unknown. systematic research

Method used

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  • High-grade oxidization method for removing antibiotic resistance genes in sewage
  • High-grade oxidization method for removing antibiotic resistance genes in sewage
  • High-grade oxidization method for removing antibiotic resistance genes in sewage

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Embodiment

[0036] In this embodiment, sewage discharged from a hospital in the suburbs of Nanjing is treated as the purification object. The advanced oxidation method for removing antibiotic resistance genes in sewage includes the following steps:

[0037] 1) Let the sewage flow to the grid by gravity, remove large floating objects in the water through the grid, and the effluent from the grid enters the sedimentation tank for sedimentation and separation;

[0038] 2) Precipitate and separate the sewage in step 1), and add H in a mol ratio of 2 to 3:1 to the separated supernatant sewage 2 SO 4 and NaOH mixture to adjust the pH value of the supernatant sewage to 3-5, then place it in a six-connected agitator to stir, and add an appropriate amount of FeSO 4 ·7H 2 O solid as Fe 2+ , after adding 30% H by weight 2 o 2 solution such that H 2 o 2 The concentration in the supernatant sewage is 0.005-0.01mol, and Fe is controlled 2+ / H 2 o 2 The molar ratio of the solution is 1 / 30-1 / 2, ...

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Abstract

The invention discloses a high-grade oxidization method for removing antibiotic resistance genes in sewage. In the provided method, the antibiotic resistance genes in sewage are removed by the following steps: filtering the sewage by grating, performing precipitation separation, carrying out Fenton oxidation, performing UV / H2O2 oxidation, disinfecting, and discharging. In the Fenton oxidation method, the influences of Fe2+ / H2O2 mole ratio, H2O2 concentration, initial pH value and reaction time are all taken into account, and in the UV / H2O2 oxidation method, the influences of the illumination time, the addition amount of H2O2, pH value, and the like are considered so as to find the optimal operation parameters. The provided method can effectively remove the antibiotic resistance gene in sewage, and provides a novel technology for cutting off the propagation of antibiotic resistance genes in sewage.

Description

technical field [0001] The invention relates to the field of sewage purification treatment, in particular to an advanced oxidation method for removing antibiotic resistance genes in sewage. Background technique [0002] The excessive use of antibiotics has led to a large increase in resistant bacteria (Antibiotic resistance bacteria, ARB) and resistance genes (Antibiotic resistance genes, ARGs) in the environment, which has adverse effects on the ecosystem in the water environment and soil environment, especially the spread of ARGs , It also plays an "amplifying effect", making some native microorganisms in the environment acquire resistance. Most antibiotics are water-soluble, and 90% of antibiotics can be excreted with animal urine. Therefore, the threat of antibiotics and ARGs pollution to the water environment is the first to bear the brunt, and ARGs pollution has attracted increasing attention. ARGs in the water environment mainly exist in (1) wastewater discharged fro...

Claims

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Application Information

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IPC IPC(8): C02F9/14
Inventor 耿金菊张滢楹任洪强庄耀
Owner NANJING UNIV
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