Use of an adhesive composition based on silylated polymers for cryogenic applications

A silylation, polymer technology, applied in the direction of polyether adhesives, polyurea/polyurethane adhesives, adhesive types, etc., can solve the problem of not providing shock-absorbing buffers and absorbing deformation, to prevent harmful the effect of damage
CN104804696AActive Publication Date: 2015-07-29BOSTIK SA
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
BOSTIK SA
Publication Date
2015-07-29

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Abstract

The present invention relates to the use of an adhesive composition comprising at least one silylated polymer and at least one filler for the assembly of a tank comprising a fluid at a temperature less than or equal to -100 DEG C and a structure carrier selected from the hull of a ship, the cabin of an aircraft and a container.
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Description

technical field

[0001] The present invention relates to an adhesive composition comprising at least one silylated polymer and at least one filler for assembling sealed tanks containing fluids at temperatures below or equal to -100°C and selected from ships The hull of the ship, the fuselage of the aircraft and the load-bearing structure of the container. Background technique

[0002] In methane transporters, the tanks in which liquid methane is stored consist of different materials and barriers which ensure tightness.

[0003] Good insulation is necessary for storage and transport of liquid methane at temperatures of -163°C. Additionally, it is desirable to reduce the thickness of the insulation to maximize transported or stored volume.

[0004] Storage pressure is usually close to atmospheric pressure. Regulating the very slight positive pressure caused by evaporation, "boil out" may be recompression or liquefaction, or simply expendable to generate energy.

[0005] In ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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