High temperature resistant proton exchange membrane based on sulfonated graphene and preparation method therefor
A technology of sulfonated graphene and proton exchange membrane, which is applied in the field of high temperature resistant proton exchange membrane based on sulfonated graphene and its preparation, can solve the problems of high price, low working temperature, high methanol permeability and the like, and achieves low cost , good oxidation resistance, simple preparation process
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[0020] Example 1 Add fuming sulfuric acid and chlorosulfonic acid with a mass ratio of 3:4 into a multi-tube membrane reactor, and then add graphene (with a radial size of 500nm-50μm and a thickness of 1-20nm) and mix them evenly. The graphene content in the reactant reaches 2wt%, and the reaction is carried out at 80°C for 1 hour. After the reaction is completed, the mixed reactant is distilled at 165°C, and the residue is washed with water to obtain sulfonated graphene.
[0021] Dissolve the sulfonated graphene and partially quaternized polytrifluorostyrene sulfonated resin (see CN1346707A) and perfluorosulfonic acid resin with a mass ratio of 1:65:34 in dimethyl sulfoxide, and then The film is cast at room temperature and then dried in hot air at 80°C to form a proton exchange membrane. The thickness of the proton exchange membrane is 100μm and the average surface resistance is about 5.65×10 6 Ω, the proton conductivity at 100°C is 0.21S.cm-1, and the highest temperature resist...
Example Embodiment
[0022] Example 2 Put fuming sulfuric acid and chlorosulfonic acid into a multi-tube membrane reactor at a mass ratio of 4:4, and then add graphene (500nm-50μm in radial size, 1-20nm in thickness) and mix uniformly to make the mixing reaction The graphene content in the material reached 1% (wt), and the reaction was carried out at 80°C for 1 hour. After the reaction was completed, the mixed reactant was distilled at 165°C, and the residue was washed with water to obtain sulfonated graphene.
[0023] Dissolve the sulfonated graphene and partially quaternized polytrifluorostyrene sulfonated resin (refer to CN1346707A) and perfluorosulfonic acid resin with a mass ratio of 0.5:65:34.5 in dimethyl sulfoxide, and then The film is cast at room temperature and then dried in hot air at 80°C to form a proton exchange membrane. The thickness of the proton exchange membrane is 100μm and the average surface resistance is about 3.80×10 6 Ω, 100℃ proton conductivity is 0.25S.cm -1 , And the highe...
Example Embodiment
[0024] Example 3 Add oleum and chlorosulfonic acid into a multi-tube membrane reactor at a mass ratio of 3:5, and then add graphene (with a radial size of 500nm-50μm and a thickness of 1-20nm) and mix uniformly to make the mixed reactants The content of the graphene in the resin reaches 3% (wt), and the reaction is carried out at 80°C for 1 hour. After the reaction is completed, the mixed reactant is distilled at 165°C, and the residue is washed with water to obtain sulfonated graphene.
[0025] Dissolve the sulfonated graphene and partially quaternized polytrifluorostyrene sulfonated resin (refer to CN1346707A) and perfluorosulfonic acid resin with a mass ratio of 2:65:33 in dimethyl sulfoxide, and then The film is cast at room temperature and then dried at 80°C with hot air to form a proton exchange membrane. The thickness of the proton exchange membrane is 100μm and the average surface resistance is about 5.90×10 6 Ω, the proton conductivity of 100℃ is 0.20S.cm-1, and the highe...
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