High temperature resistant proton exchange membrane based on sulfonated graphene and preparation method therefor
A technology of sulfonated graphene and proton exchange membrane, which is applied in the field of high temperature resistant proton exchange membrane based on sulfonated graphene and its preparation, can solve the problems of high price, low working temperature, high methanol permeability and the like, and achieves low cost , good oxidation resistance, simple preparation process
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Embodiment 1
[0020] Example 1 Add oleum and chlorosulfonic acid with a mass ratio of 3:4 into a multi-tubular membrane reactor, then add graphene (with a radial dimension of 500nm to 50 μm and a thickness of 1 to 20nm) and mix evenly to make the mixture The graphene content in the reactant reaches 2 wt%, and the reaction is carried out at 80°C for 1 hour. After the reaction is completed, the mixed reactant is distilled at 165°C, and the residue is washed with water to obtain sulfonated graphene.
[0021] The sulfonated graphene with a mass ratio of 1:65:34 and partially quaternized polytrifluorostyrene sulfonated resin (referring to CN1346707A) and perfluorosulfonic acid resin are dissolved in dimethyl sulfoxide, and then Cast at room temperature to form a film, and then dry it with hot air at 80°C to form a proton exchange membrane. The thickness of the proton exchange membrane is 100 μm, and the average surface resistance is about 5.65×10 6 Ω, the proton conductivity at 100°C is 0.21S.cm...
Embodiment 2
[0022] Example 2 Add oleum and chlorosulfonic acid to a multi-tubular membrane reactor at a mass ratio of 4:4, then add graphene (with a radial dimension of 500nm to 50μm and a thickness of 1 to 20nm) and mix evenly to make the mixed reaction The graphene content in the product reaches 1% (wt), and react at a temperature of 80° C. for 1 hour. After the reaction is completed, the mixed reactant is distilled at 165° C., and the residue is washed with water to obtain sulfonated graphene.
[0023] The sulfonated graphene with a mass ratio of 0.5:65:34.5 and partially quaternized polytrifluorostyrene sulfonated resin (see CN1346707A) and perfluorosulfonic acid resin are dissolved in dimethyl sulfoxide, and then Cast at room temperature to form a film, and then dry it with hot air at 80°C to form a proton exchange membrane. The thickness of the proton exchange membrane is 100 μm, and the average surface resistance is about 3.80×10 6 Ω, 100 ℃ proton conductivity is 0.25S.cm -1 , and...
Embodiment 3
[0024] Example 3 Add nicotinic acid and chlorosulfonic acid to a multi-tube membrane reactor at a mass ratio of 3:5, and then add graphene (with a radial dimension of 500 nm to 50 μm and a thickness of 1 to 20 nm) and mix evenly to make the mixed reactant The graphene content in the mixture reaches 3% (wt), reacted at a temperature of 80°C for 1 hour, after the reaction was completed, the mixed reactant was distilled at 165°C, and the residue was washed with water to obtain sulfonated graphene.
[0025] The sulfonated graphene with a mass ratio of 2:65:33 and partially quaternized polytrifluorostyrene sulfonated resin (see CN1346707A) and perfluorosulfonic acid resin are dissolved in dimethyl sulfoxide, and then Cast at room temperature to form a film, and then dry it with hot air at 80°C to form a proton exchange membrane. The thickness of the proton exchange membrane is 100 μm, and the average surface resistance is about 5.90×10 6 Ω, the proton conductivity at 100°C is 0.20S...
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