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Composite nanoimprinting soft template and manufacturing method thereof

A technology of nanoimprinting and soft template, which is applied in the direction of photomechanical equipment, patterned surface photolithography, optics, etc., can solve the problems of inability to carry out large-scale industrial application, low hardness of PDMS, and shedding of hard materials, and achieve Good hardness, improve poor hardness, good compatibility

Active Publication Date: 2015-09-23
SUZHOU JINFU TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the low hardness of PDMS, problems such as structural deformation will occur during the imprinting process. At present, the method of compounding hard materials on PDMS is often used to solve the imprinting defects caused by the low hardness of PDMS, such as using plastic plates or glass. Plates and PDMS are combined to prepare high-hardness composite templates; however, this method also leads to new problems such as hard material shedding and self-cracking, which cannot be used in large-scale industrial applications

Method used

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  • Composite nanoimprinting soft template and manufacturing method thereof
  • Composite nanoimprinting soft template and manufacturing method thereof
  • Composite nanoimprinting soft template and manufacturing method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0048] (1) Pouring a layer of PDMS resin (GE Silicones company, the ratio of A and B components is 10:1) in the mold, and curing in vacuum at 60°C for 2 hours to obtain a PDMS resin layer with an elastic modulus of 3.0 MPa, which is the first One layer of PDMS resin layer; then cast a layer of PDMS resin on the first layer of PDMS resin layer, and obtain a PDMS resin layer with an elastic modulus of 10MPa after 4 hours of vacuum curing at 80 ° C, which is the second layer of PDMS resin layer; by 2 The PDMS resin layer constitutes the elastic layer.

[0049] (2) Spin-coat an anti-adhesive agent (1H, 1H, 2H, 2H-perfluorodecyltrichlorosilane) on the surface of the silicon wafer template; spin-coat a UV resin system on the surface of the master template after anti-adhesive treatment, and expose it to ultraviolet light for 2 minutes , the energy of ultraviolet light is 1500mJ / cm 2 After curing, the UV resin layer is obtained, which is the first layer of UV resin layer; then t...

Embodiment 2

[0054] (1) Pouring a layer of PDMS resin (GE Silicones company, the ratio of A and B components is 9:1) in the mold, and curing in vacuum at 60°C for 3 hours to obtain a PDMS resin layer, which is the first PDMS resin layer; then Pouring a layer of PDMS resin on the first layer of PDMS resin layer, the temperature is 70°C and vacuum curing for 2 hours to obtain a PDMS resin layer, which is the second layer of PDMS resin layer; then pour a layer of PDMS resin on the second layer of PDMS resin layer , the temperature is 80°C and vacuum cured for 2.5 hours to obtain a PDMS resin layer, which is the third PDMS resin layer; layer, which is the fourth layer of PDMS resin layer; then cast a layer of PDMS resin on the fourth layer of PDMS resin layer, the temperature is 150 ℃ vacuum curing for 2 hours to obtain the PDMS resin layer, which is the fifth layer of PDMS resin layer; The elastic layer of the layer PDMS resin layer; the modulus of elasticity of the first layer of PDMS resin ...

Embodiment 3

[0060] (1) Pouring a layer of PDMS resin (GE Silicones company, the ratio of A and B components is 9.5︰1) in the mold, the temperature is 70 ℃ and vacuum curing for 2 hours to obtain the PDMS resin layer, which is the first layer of PDMS resin layer; Then pour a layer of PDMS resin on the first layer of PDMS resin layer, the temperature is 80 ° C for 3 hours after vacuum curing to obtain a PDMS resin layer, which is the second layer of PDMS resin layer; then pour a layer of PDMS on the second layer of PDMS resin layer Resin, the temperature is 150 ℃ vacuum curing for 4 hours to obtain a PDMS resin layer, which is the third layer of PDMS resin layer; obtain an elastic layer comprising 3 layers of PDMS resin layers; the elastic modulus of the first layer of PDMS resin layer is 4.0MPa , with a thickness of 0.5mm; the modulus of elasticity of the second PDMS resin layer is 8.0MPa, and the thickness is 0.5mm; the modulus of elasticity of the third PDMS resin layer is 12.0MPa, and th...

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Abstract

The invention discloses a composite nanoimprinting soft template and a manufacturing method thereof. The method specifically comprises the following steps: preparing an elastic layer composed of a PDMS (Polydimethylsiloxane) resin layer; preparing a hard layer composed of a UV (Ultraviolet) resin layer; coating the hard layer with the elastic layer; and performing curing to obtain the composite nanoimprinting soft template. Through adoption of the composite nanoimprinting soft template manufactured with a multilayer progressive change method, a structural layer with high hardness can be obtained, and the problems of falling and cracking of the high-hardness layer can be solved. Moreover, the manufacturing process is simple; the cost is low; and the soft template and the manufacturing method are suitable for industrial production.

Description

technical field [0001] The invention relates to a nano-imprint template and a preparation method thereof, in particular to a composite nano-imprint soft template and a preparation method thereof, belonging to the field of micro-nano device production. Background technique [0002] Nanoimprint lithography is considered to be the most promising application due to the achievable pattern resolution that avoids the limitations caused by light diffraction or particle beam scattering in traditional techniques, and has the advantages of low cost, high resolution, and high productivity. photolithography technology. [0003] A high-quality template is a key component of nanoimprint lithography. Compared with traditional high-cost and fragile hard quartz and silicon templates, soft templates made of polymers can avoid fracture and permanent deformation, and can also perform curved surface imprinting, which greatly improves the quality of imprinting. [0004] Polydimethylsiloxane (...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00
Inventor 马慧军王鹏韦冬
Owner SUZHOU JINFU TECH
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