System and method for processing substrates

A technology for substrates and equipment, which is applied in the field of processing coated substrates, can solve the problems of interruption, leaking, and consumption, and achieve the effects of small wear, low investment costs and maintenance costs, and avoid loading of corrosive substances

Active Publication Date: 2015-09-23
(CNBM) BENGBU DESIGN & RES INST FOR GLASS IND CO LTD
View PDF10 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For this reason, the input costs for this process step take up a not insignificant share of the total input costs of a solar plant
Furthermore, it has been shown in practice that these technically complex and comparatively expensive components suffer from significant increases d

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • System and method for processing substrates
  • System and method for processing substrates
  • System and method for processing substrates

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0110] exist Figures 1 to 5A A process box oriented horizontally in a typical working position is illustrated in -5F. It is understood that the treatment tank can also be oriented differently and that the positions and orientations stated in the following description refer only to the illustration of the treatment tank in the figures, and this is not to be understood as limiting.

[0111] first observe figure 1 and 2 , which shows a generalized cross-sectional view of a processing box 1 for processing a coated substrate 2 ( figure 1 ) and a perspective view of such a treatment box 1 with an end-side closure part 9 ( figure 2 ).

[0112] The treatment box 1 is used for the treatment of substrates 2 coated on one side, for example for the thermal treatment of precursor layers for conversion into compound semiconductors, in particular chalcopyrite compounds. Although only a single substrate 2 is shown, the processing box 1 can equally be used for processing two or more sub...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The present invention relates to a system for processing coated substrates, having the following features: at least one evacuable process box for accommodating at least one substrate with a gas-tightly sealable housing, which forms a hollow space, wherein the housing comprises at least one housing section, which is implemented such that the substrate is thermally treatable by incident electromagnetic thermal radiation, wherein the housing has at least one housing section coupleable to a cooling device for its cooling and at least one housing section not coupled to the cooling device, wherein the hollow space is divided by at least one separating wall into a process space for accommodating the substrate and an intermediate space, wherein the separating wall has one or a plurality of openings and is arranged between the substrate and the housing section coupled to the cooling device, and wherein the housing is provided with at least one sealable gas passage that opens into the hollow space, for evacuating and introducing gas into the hollow space; a cooling device for cooling the process box housing section coupleable to the cooling device; at least one loading/unloading unit for loading and/or unloading the process box; at least one heating unit for heating the substrate in the process box; at least one cooling unit for cooling the substrate in the process box; at least one pumping-out device for draining the hollow space of the process box; at least one gas supply device for supplying the hollow space of the process box with at least one gas; at least one transport mechanism, which is implemented for the purpose of executing a relative movement between, on the one hand, the process box and, on the other, the heating, cooling, and loading/unloading unit.

Description

technical field [0001] The present invention relates to apparatus and methods for processing coated substrates in a processing chamber. Background technique [0002] Photovoltaic layer systems for the direct conversion of sunlight into electrical energy are well known. These photovoltaic layer systems are generally referred to as “solar cells”, where the term “thin-film solar cells” refers to layer systems with small thicknesses of only a few micrometers, which require a substrate for sufficient mechanical strength. Known substrates include mineral glass, plastics (polymers) or metals, especially metal alloys, and can be designed as rigid plates or flexible films, depending on the respective layer thickness and specific material properties. [0003] Thin-film solar cells with absorbers made of compound semiconductors have proven to be advantageous in terms of process maneuverability and efficiency. Thin-film solar cells have been described several times in the patent liter...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): H01L21/673H01L21/677H01L21/67
CPCH01L21/6776H01L31/206H01L21/67353H01L21/67393H01L21/67173C23C16/458Y02E10/541H01L21/67098
Inventor S.乔斯特M.费范格J.帕姆
Owner (CNBM) BENGBU DESIGN & RES INST FOR GLASS IND CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products