Two-level copper removing technology for treating low-concentration comprehensive wastewater in PCB electroplating
A comprehensive wastewater, low-concentration technology, applied in metallurgical wastewater treatment, water/sewage multi-stage treatment, water/sludge/sewage treatment, etc., can solve the problems of floating sludge in sedimentation tanks, affecting normal wastewater discharge, etc. The effect of drug cost
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0027] A secondary copper removal process for treating low-concentration comprehensive wastewater from PCB electroplating, including secondary copper removal processes: the first-level copper removal removes hydrated copper ions in the wastewater, and the second-level copper removal removes complex copper ions. The process includes the following steps:
[0028] (1) The first stage of copper removal: use a lift pump to introduce the comprehensive wastewater into the PH adjustment tank, add liquid caustic soda to the wastewater through the pump and stir evenly with a mixer, adjust the pH to 8.5, use a PH meter for measurement, and then introduce the fast In the mixing tank, add polyaluminum chloride PAC according to the amount of 25kg / 1000 cubic meters of waste water and stir evenly with a mixer, then introduce into the slow mixing tank, add polyacrylamide PAM according to the amount of 2kg / 1000 cubic meters of waste water and stir evenly with a mixer, and then introduce The first-...
Embodiment 2
[0031] A secondary copper removal process for treating low-concentration comprehensive wastewater from PCB electroplating, including secondary copper removal processes: the first-level copper removal removes hydrated copper ions in the wastewater, and the second-level copper removal removes complex copper ions. The process includes the following steps:
[0032] (1) The first stage of copper removal: use a lift pump to introduce the comprehensive wastewater into the PH adjustment tank, add flake caustic soda to the wastewater through the pump and stir evenly with a mixer, adjust the pH to 8.7, use a PH meter for measurement, and then introduce the fast In the mixing tank, add polyaluminum chloride PAC according to the amount of 25kg / 1000 cubic meters of waste water and stir evenly with a mixer, then introduce into the slow mixing tank, add polyacrylamide PAM according to the amount of 2kg / 1000 cubic meters of waste water and stir evenly with a mixer, and then introduce The first-l...
Embodiment 3
[0035] A secondary copper removal process for treating low-concentration comprehensive wastewater from PCB electroplating, including secondary copper removal processes: the first-level copper removal removes hydrated copper ions in the wastewater, and the second-level copper removal removes complex copper ions. The process includes the following steps:
[0036] (1) The first stage of copper removal: use a lift pump to introduce the comprehensive wastewater into the PH adjustment tank, add lime to the wastewater through the pump and stir evenly with a mixer, adjust the pH to 9.0, use a PH meter for measurement, and then introduce fast mixing In the tank, add polyaluminum chloride PAC according to the amount of 25kg / 1000 cubic meters of waste water and stir evenly with a mixer, and then introduce the slow mixing tank, add polyacrylamide PAM according to the amount of 2kg / 1000 cubic meters of waste water and stir evenly with a mixer, and then introduce another Grade sedimentation ta...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com