Micro needle tip with orientation structure and method thereof for continuously conveying liquid

Abstract

The invention discloses a micro needle tip with an orientation structure and a method thereof for continuously conveying liquid, belonging to the technical field of micro-nano manufacture. The tapered micro needle tip has a thin tip and a thick root. An oriented micro-nano groove-shaped structure is manufactured on the surface of the micro needle tip. Liquid drops are put on or supplemented to the micro needle tip with the micro-nano groove-shaped structure. Under the action of surface tension, the liquid drops automatically move to a liquid storage position of the micro needle tip. Under the control of a mobile device, the micro needle tip with the liquid drops moves to a target position. Under the action of capillary force of the micro-nano groove-shaped structure on the surface of the micro needle tip, liquid drops flow downward along the micro needle tip to a substrate of the target position. The liquid drops are solidified and stacked on the substrate of the target position so as to form a pattern or a stereostructure. The micro needle tip can be manufactured precisely from bottom to top. Compared with the prior art, the micro needle tip has the advantages of good continuity, controllable size, simple device, high resolution, and broad application range.

Description

technical field

[0001] The invention belongs to the technical field of micro-nano manufacturing, and in particular relates to a micro-needle tip with an orientation structure and a method for continuously transporting liquid thereof. Background technique

[0002] In today's era, a large number of electromechanical devices are developing in the direction of miniaturization, which makes various devices integrate more functions while being lightweight and portable. The miniaturization of devices puts forward higher requirements for related technologies such as manufacturing, packaging, and testing. Photolithography technology can produce microstructures with a minimum size of about 1 micron. Electron beam exposure technology further improves the resolution and can produce nanostructures with a scale of tens of nanometers. However, these traditional top-down manufacturing methods have certain limitations, such as the complicated process of manufacturing three-dimensional struct...

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