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A kind of colored sapphire substrate and preparation method thereof

A sapphire and substrate technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of poor reliability, poor surface flatness of sapphire color surface, low product yield, etc., to achieve product reliability High performance, easy control of environmental cleanliness, good bonding force and flatness

Active Publication Date: 2018-01-30
LENS TECH CHANGSHA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The invention solves the problems of poor surface flatness, low product yield and poor reliability of the sapphire color surface caused by silk screen printing in the prior art

Method used

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  • A kind of colored sapphire substrate and preparation method thereof
  • A kind of colored sapphire substrate and preparation method thereof

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Embodiment 1

[0036] This embodiment discloses a method for electroplating metallic aluminum on a circular sapphire substrate to form a white glossy sapphire substrate with metallic aluminum. Specific steps are as follows:

[0037] 1. Clean the sapphire substrate: use a special lotion for sapphire materials to clean through an automatic cleaning machine;

[0038] 2. Install the cleaned sapphire on the jig, and then load the jig with sapphire on the coating rack of the coating equipment;

[0039] 3. Close the door of the coating machine, evacuate the first cavity (not shown in the figure), the vacuum degree is 8.0E-3Pa, the heating pretreatment temperature is 120°C, and the time is 30 minutes;

[0040] 4. After the pretreatment is completed, open the gate of the second cavity (the gate separates the first cavity from the second cavity), transfer the coating frame loaded with sapphire into the second cavity, and vacuumize again, the vacuum degree is 2.0 E-4Pa;

[0041]5. Pretreatment of sa...

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Abstract

The present invention firstly provides a colored sapphire substrate, comprising a sapphire substrate and a first layer, a second layer and a third layer arranged sequentially from inside to outside on the outer surface of the sapphire substrate, the first layer is made of The silicon layer, the second layer is a metal film layer, and the third layer is a silicon dioxide layer. The invention also correspondingly provides a method for preparing the colored sapphire substrate. The invention adopts a coating method to obtain a sapphire base material with smooth surface, no pattern but color. The invention solves the problems of poor surface flatness, low product yield and poor reliability of the sapphire color surface caused by silk screen printing in the prior art.

Description

technical field [0001] The invention relates to the field of sapphire processing, in particular to a colored sapphire substrate and a preparation method thereof. Background technique [0002] Due to its high hardness, high light transmittance, and good physical, chemical and optical properties, sapphire has been widely used in electronic devices such as mobile phones and tablet computers. However, since sapphire itself is colorless and transparent, while making full use of its high hardness and other physical and chemical properties, in order to achieve the diversity of appearance colors, it is generally used to obtain sapphire materials with different appearance colors by using silk screen printing inks of different colors. However, the particles of the ink are generally thick, and it is difficult to obtain a smooth and smooth printing surface. At the same time, due to the influence of the particles of the ink itself and the dust particles in the environment, it is easy to ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/18
Inventor 周群飞饶桥兵胡波卫
Owner LENS TECH CHANGSHA