Continuous production and sintering device for self-supported ceramic thin film

A technology of ceramic film and sintering device, which is applied in the direction of furnace type, furnace, lighting and heating equipment, etc., can solve the problems of short uniform temperature zone, low degree of automation, and inability to realize continuous production and sintering, so as to ensure vacuum degree and realize The effect of production

Active Publication Date: 2015-12-09
XIAMEN UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0010] The purpose of the present invention is to provide a continuous production and sintering of a self-supporting ceramic film that can be used in a high-temperature ambient atmosphere in view of the limitations of the existing ceramic sintering device that has a short uniform temperature zone and a low degree of automation that cannot realize continuous production and sintering device

Method used

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  • Continuous production and sintering device for self-supported ceramic thin film
  • Continuous production and sintering device for self-supported ceramic thin film
  • Continuous production and sintering device for self-supported ceramic thin film

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Embodiment Construction

[0038] The following embodiments will describe the structure and working principle of the present invention in detail with reference to the accompanying drawings.

[0039] see Figure 1~4 , the embodiment of the present invention is provided with a high temperature furnace system 1 and a sample transfer system 2 .

[0040] The high temperature furnace system 1 is provided with a furnace body 11 , a heating device 12 and a vacuum device 13 .

[0041] The body of furnace 11 is a double-layer structure of an inner furnace and an outer furnace. The body of furnace 11 is provided with a hearth 111, an insulating layer 112 and a vacuum layer 113. The hearth 111 is divided into a sampling chamber 1111, a sintering chamber 1112, and a sintering chamber 1112 by the insulating layer 112. Cooling chamber 1113, sampling chamber 1114, vacuum layer 113 is set between the inner furnace body and the outer furnace body, sampling chamber 1111 is provided with sampling chamber glove box 1151, s...

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Abstract

The invention discloses a continuous production and sintering device for a self-supported ceramic thin film, and relates to a ceramic thin film. The continuous production and sintering device is provided with a high-temperature furnace system and a sample conveying system. The high-temperature furnace system is provided with a furnace body, a heating device and a vacuum device. The furnace body is provided with a hearth, a heat insulation layer and a vacuum layer. The hearth is divided by the heat insulation layer into a sample introduction chamber, a sintering chamber, a cooling chamber and a sample collection chamber. The heating device is provided with a thermocouple and a temperature controller. The vacuum device is provided with an inner furnace vacuum pump and a vacuum layer vacuum pump. The sample conveying system is provided with a sample introduction chamber sample winding device, a sample conveying device and a sample collection chamber sample winding device. The sample introduction chamber sample winding device is provided with a film winding drum, a fixing rod, a bearing, a motor shaft gear, a bearing gear and a film winding drum motor. The sample conveying device is provided with a sample carrier table, a fixing rod, a bearing, a motor shaft gear, a bearing gear, a big gear wheel, a conveying device motor, a chain and a conveying belt. The sampling chamber sample winding device is provided with a film winding drum, a fixing rod, a bearing, a motor shaft gear, a bearing gear and a film winding drum motor.

Description

technical field [0001] The invention relates to a ceramic thin film, in particular to a continuous production and sintering device for a self-supporting ceramic thin film under a high-temperature ambient atmosphere. Background technique [0002] Ceramic film is a kind of ceramic material that uses special technology to make ceramic materials with a thickness of micron level and still maintain the superior performance of ceramics. The manufactured thin film device can be used in technologies such as integrated circuits and semiconductor circuits. In recent years, microelectromechanical systems (MEMS), as an emerging technology, has achieved rapid development with its strong vitality, which has led to the research and improvement of a large number of new materials. Among them, various ceramic thin film materials are favored by many researchers because of their superior properties. Common ceramic films include: high dielectric constant barium titanate film and lead titanate f...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F27B9/04F27B9/06F27B9/24
Inventor 姚荣迁毛宇陈奋徐潇慧贾茹符长平冯祖德
Owner XIAMEN UNIV
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