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Heat treatment equipment and method for improving laser damage threshold of oxide thin film

A technology of laser damage threshold and heat treatment equipment, applied in metal material coating process, vacuum evaporation coating, coating and other directions, can solve the problems of structural and overall function changes, difficult to achieve process production, and high requirements for atmosphere. Short heating time, higher laser damage threshold, less demanding effects

Active Publication Date: 2018-11-16
XIAN TECH UNIV
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  • Application Information

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Problems solved by technology

However, in the prior art, oxide films usually need to be plated on optical components, such as various types of optical glass, etc. These materials are easily softened at high temperatures, resulting in deformation, changes in structure and overall function
In addition, aerobic heat treatment in a high-vacuum environment has high requirements for both equipment and atmosphere, and is only suitable for laboratory environments, which is difficult to achieve in process production

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  • Heat treatment equipment and method for improving laser damage threshold of oxide thin film
  • Heat treatment equipment and method for improving laser damage threshold of oxide thin film

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Embodiment Construction

[0033] In order to make the technical content disclosed in this application more detailed and complete, reference may be made to the drawings and the following various specific embodiments of the present invention, and the same symbols in the drawings represent the same or similar components. However, those skilled in the art should understand that the examples provided below are not intended to limit the scope of the present invention. In addition, the drawings are only for schematic illustration and are not drawn according to their original scale.

[0034] The specific implementation manners of various aspects of the present invention will be further described in detail below with reference to the accompanying drawings.

[0035] figure 1According to an embodiment of the present invention, a schematic structural diagram of a heat treatment device capable of increasing the laser damage threshold of an oxide thin film is shown. refer to figure 1 , the heat treatment equipmen...

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Abstract

The invention provides a thermal processing device and method for increasing the laser damage threshold value of oxide films. The device comprises a sample platform, heating devices, an input gas path pipe, a vacuum pump and a negative bias circuit, wherein the sample platform is located in a cavity and provided with quartz glass substrates and the optical oxide films, and the films are prepared through plating with a vacuum thermal evaporation technology or a magnetron sputtering technology; the heating devices are located above and on two sides of the sample platform and used for heating the sample platform; the input gas path pipe is used for charging the cavity with high-purity oxygen; the vacuum pump is used for performing vacuum pumping on the cavity, so that the vacuum degree is up to 2.0*10<-4> Pa; the negative bias circuit is electrically coupled to the sampling platform. Compared with the prior art, the device and the method have the advantages that the negative bias circuit regulates the voltage potential to 500 V, an applied electric field enables the charged high-purity oxygen to perform glow discharge, formed oxygen ions bombard surfaces of the films, so that the films are crystallized, and surface defects of the optical oxide films can be reduced.

Description

technical field [0001] The invention relates to a laser damage threshold testing technology of an optical thin film, in particular to a heat treatment device and method for improving the laser damage threshold of an oxide thin film. Background technique [0002] Since the advent of lasers, the interaction of light and matter has attracted widespread attention and emerged as a new scientific field. In optical components, an indispensable link is the optical film. In a sense, the optical film is the actual function of many optical components. However, lasers often cause damage to optical films, which limits the development of lasers and affects the life of optical components themselves. Therefore, the damage resistance of optical films has become the main factor restricting the development of laser systems to high power and high energy. one. On the other hand, the damage resistance of optical films is weaker than that of optical components themselves, so the research on opti...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/58C23C14/08
Inventor 惠迎雪苏俊宏徐均琪李建超梁海锋杨利红
Owner XIAN TECH UNIV