Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Phase modulation imaging mode scanning device and method of SICM

An imaging mode, phase modulation technology, applied in measurement devices, scanning probe technology, scanning probe microscopy, etc., can solve the problems of slow scanning speed, poor system stability, etc. The effect of speeding up scanning

Active Publication Date: 2016-02-03
SHENYANG INST OF AUTOMATION - CHINESE ACAD OF SCI
View PDF2 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to improve the above deficiencies such as slow scanning speed and poor system stability when working for a long time, the present invention proposes a scanning device and method based on a new scanning imaging mode-phase modulation mode of the SICM system

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Phase modulation imaging mode scanning device and method of SICM
  • Phase modulation imaging mode scanning device and method of SICM
  • Phase modulation imaging mode scanning device and method of SICM

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0049] 1. Use a standard grid of silicon material (P / N498-000-026, Digital Instruments) with a width of 5μm and a depth of 200nm for AFM calibration as the master, face up, and pour 10:1 PDMS (Sylgard184, DowCorning) The mixture of the main agent and hardener evenly stirred; vacuum for another 20 minutes to make the mixture free of bubbles; then place it on the heating plate (PC-600, Corning) and bake at 70°C for 4-5 hours; finally, after curing The PDMS layer is torn off from the silicon standard grid. At this time, the PDMS surface close to the silicon grid will be imprinted with a fine structure complementary to the grid, thus obtaining a PDMS material grid sample.

[0050] 2. Put the side of the PDMS sample with the imprinted structure facing up, and dip the bottom surface into a Φ35mm petri dish. Use a micropipette to pour phosphate buffer saline (PBS) into the petri dish. The best solution is 2mm above the surface of the PDMS sample;

[0051] 3. The glass tube probe is drawn ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a phase modulation imaging mode scanning device of an SICM. The scanning device comprises a signal generator, a phase-locked amplifier, a patch clamp amplifier, a controller, a probe, an XY nanometer platform and a Z-direction nanometer piezoelectric ceramic. The signal generator, the patch clamp amplifier, the phase-locked amplifier and the controller are connected in sequence; the signal generator is connected with the phase-locked amplifier; and the patch clamp amplifier is connected with the probe. The method comprises the following steps: the signal generator outputs two paths of AC signals to the phase-locked amplifier and the patch clamp amplifier respectively; the compensation capacitance of the patch clamp amplifier is adjusted; the phase-locked amplifier extracts current component and feeds back the amplitude to the controller; and the controller controls the height of the probe in real time according to the amplitude, and scanning of a sample is realized. According to the phase modulation imaging mode scanning device and method, only the alternating current component under some frequency is extracted to serve as the feedback value, so that the defects of DC drifting and easy electrical noise influence under a DC mode and the like can be overcome; and compared with a conventional AC mode, the method realizes higher modulation frequency, and the purpose of accelerating scanning can be realized.

Description

Technical field [0001] The invention relates to a novel micro-nano-level fast, high-stability and non-destructive imaging technology, in particular to a novel imaging mode-phase modulation mode scanning device and method based on scanning ion conductance microscope (SICM) technology. Background technique [0002] At present, scanning ion conductance microscope (SICM) has been widely used in biology, chemistry, materials and other fields. Especially in live cell imaging, it has become a powerful tool for researchers due to its unique non-destructive and non-force contact imaging characteristics. SICM is a member of the scanning probe microscope family, but different from other scanning probe microscopes, it relies on the current flowing through the ultramicro glass tube probe to vary with the distance between the probe samples. The probe and the sample are scanned. It can maintain a distance of tens of nanometers. At this time, the probe is weak to the sample, and the sample will ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01Q60/44
Inventor 刘连庆李鹏李广勇王越超杨洋张常麟
Owner SHENYANG INST OF AUTOMATION - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com