Micro-hemispherical resonant gyroscope based on borosilicate glass annealing forming and manufacturing method thereof

A technology of borosilicate glass and hemispherical resonant gyro, which is applied in the field of micro-inertial sensors, can solve the problems of low electrode consistency, difficulty in ensuring symmetry, and large surface stress, so as to reduce lithography and etching errors, structure Simple, low surface stress effect

Active Publication Date: 2016-03-23
NANJING UNIV OF SCI & TECH
View PDF9 Cites 13 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this type of technology has problems such as high equipment requirements, large surface stress, low yield, low electrode consistency, and difficulty in ensuring symmetry.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Micro-hemispherical resonant gyroscope based on borosilicate glass annealing forming and manufacturing method thereof
  • Micro-hemispherical resonant gyroscope based on borosilicate glass annealing forming and manufacturing method thereof
  • Micro-hemispherical resonant gyroscope based on borosilicate glass annealing forming and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0014] combine figure 1 with figure 2 , the present invention is based on borosilicate glass annealed miniature hemispherical resonator gyroscope, including:

[0015] a silicon substrate 1;

[0016] A hemispherical harmonic oscillator 2;

[0017] A central pillar 5 connects the hemispherical resonator and the silicon substrate;

[0018] Eight planar electrodes 3 arranged on the silicon substrate 1 and uniformly arranged around the hemispherical resonator, the eight planar electrodes 3 are four drive electrodes 3a, 3c, 3e, 3g and four detection electrodes 3b, 3d, 3f , composed of 3h, all driving electrodes, detecting electrodes and the hemispherical resonator are not in contact, and the driving electrodes and detecting electrodes are distributed sequentially at intervals, that is, there is a detecting electrode between every two driving electrodes, and similarly, between every two detecting electrodes is a driving electrode.

[0019] The present invention is based on the ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a micro-hemispherical resonant gyroscope based on borosilicate glass annealing forming and a manufacturing method thereof. A silicon wafer serves as a substrate to form a silicon substrate. A cylindrical cavity and a center supporting column in the circle center of the cavity are etched on the upper surface of the silicon wafer. The center supporting column is connected with the center of a hemispherical harmonic oscillator to form a suspended structure. Meanwhile, eight flat-plate electrodes are evenly distributed around the hemispherical harmonic oscillator and on the periphery of the cylindrical cavity of the upper surface of the silicon wafer. The eight flat-plate electrodes are composed of four drive electrodes and four detection electrodes, all the drive electrodes, the detection electrodes and the hemispherical harmonic oscillator are not in contact and have same gaps, and the drive electrodes and the detection electrodes are sequentially distributed at intervals. The glass metal blowing type micro-hemispherical resonant gyroscope manufactured through the method has stable performance and a wider application range because of the advantages of being simple in structure, low in surface stress, high in symmetry and the like.

Description

technical field [0001] The invention belongs to the technical field of micro inertial sensors in MEMS, in particular to a micro hemispherical resonant gyroscope based on borosilicate glass annealing and a manufacturing method. Background technique [0002] With the development of national defense technology and civilian industry, gyroscopes have become very important inertial devices in the fields of attitude control, navigation and positioning. Among them, the hemispherical resonant gyroscope is recognized as the best performance due to its precise scaling factor, satisfactory random drift and bias stability, and insensitivity to the external environment (acceleration, vibration, temperature, etc.). One of the gyro products. The precision of hemispherical resonant gyroscope is even higher than that of fiber optic gyroscope and laser gyroscope, and it also has the advantages of high resolution, wide measurement range, anti-overload, anti-radiation, and anti-interference. T...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01C19/5691
CPCG01C19/5691
Inventor 裘安萍施芹夏国明
Owner NANJING UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap