Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for plating X-ray parabolic reflector surface with high-reflective film

A parabolic reflector and X-ray technology, applied in the direction of coating, etc., can solve the problems of low target utilization rate, high roughness, weak film adhesion, etc., achieve high utilization rate, high reflectivity, and prevent dust from falling Effect on glass substrate surface

Inactive Publication Date: 2016-04-13
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The present invention aims to solve the problems of low target utilization rate, high roughness, and weak film adhesion existing in existing X-ray reflector surface coating methods, and proposes a double-layer film-based X-ray reflector surface Coating method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for plating X-ray parabolic reflector surface with high-reflective film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] Use 0.2mm thick borosilicate glass coating, and use glass cleaner, acetone, absolute ethanol and deionized water to clean ultrasonically for 10min, 10min, 10min, and 10min in sequence. Vacuum to 9.9×10 -4 At Pa, start baking at 100°C for 3h. Then, Ar gas was introduced to make the pressure in the cavity reach 0.1 Pa. Move the parabolic glass substrate directly above the Cr target, apply a DC voltage of 300V to the Cr target, rotate the target at a speed of 4r / min, pre-sputter for 5min, open the baffle, and coat the Cr film for 1min. Then move the parabolic glass substrate directly above the Ir target, keep the Ar gas flowing, the gas in the chamber is still at 0.1Pa, apply a voltage of 300V to the Ir target, rotate the target at a speed of 4r / min, pre-sputter for 5min, open the baffle, Plating Ir film for 10min.

Embodiment 2

[0019] A 0.2 mm thick borosilicate glass coating is used, and ultrasonically cleaned with glass cleaner, acetone, absolute ethanol and deionized water for 20 min, 20 min, 20 min, and 20 min in sequence. Vacuum down to 5×10 -4 At Pa, start baking at 200°C for 100min. Then, Ar gas was introduced to make the pressure in the cavity reach 1Pa. Move the parabolic glass substrate directly above the Cr target, apply 410V DC voltage to the Cr target, rotate the target at a speed of 10r / min, pre-sputter for 10min, open the baffle, and coat the Cr film for 3min. Then move the parabolic glass substrate to the top of the Ir target, keep the Ar gas flowing, the pressure in the chamber is still 1Pa, apply 470V voltage to the Ir target, rotate the target at a speed of 10 / min, pre-sputter for 10 min, open the baffle, and plate Ir Film 12min.

Embodiment 3

[0021] A 0.2mm thick borosilicate glass coating is used, followed by ultrasonic cleaning with glass cleaner, acetone, absolute ethanol and deionized water for 30min, 30min, 30min, and 30min. Vacuum to 1.0×10 -4 At Pa, start baking at 300°C for 30 minutes. Ar gas was introduced again, so that the pressure in the cavity reached 3Pa. Move the parabolic glass substrate directly above the Cr target, apply a 500V DC voltage to the Cr target, rotate the target at a speed of 15r / min, pre-sputter for 20min, open the baffle, and coat the Cr film for 5min. Then move the parabolic glass substrate to the top of the Ir target, keep the Ar gas flowing, the pressure in the chamber is still 3Pa, apply 600V voltage to the Ir target, rotate the target at a speed of 15 / min, pre-sputter for 20min, open the baffle, and plate Ir Film 20min.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
surface roughnessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a method for plating an X-ray parabolic reflector surface with high-reflective film. The method comprises the steps of, firstly, cleaning a glass substrate; secondly, clamping the glass substrate with a specific clamp and baking the glass substrate; thirdly, coating the glass substrate with Cr film; fourthly, coating the Cr film with Ir film. The method has the advantages that reflectivity and the target use rate are high, film coatings are uniform and film adsorption capacity is high.

Description

technical field [0001] The invention relates to the technical field of X-ray reflector coating, in particular to a method for coating the surface of an X-ray parabolic reflector with a high-reflection film. Background technique [0002] An X-ray pulsar is a high-speed rotating neutron star that radiates rays. Its rotation period is very stable, and the long-term stability of some millisecond pulsars is comparable to that of an atomic clock. According to the photon arrival time and estimated position measured on the detector, after a series of calculations, the attitude, position, speed and other information of the spacecraft can be determined. Therefore, pulsar navigation can free the spacecraft from relying on artificial beacons and realize high-precision autonomous deep space navigation. Therefore, it is of great significance to study a reflector that can effectively collect X-rays. Contents of the invention [0003] The present invention aims to solve the problems of ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/09
CPCC03C17/09C03C2217/26C03C2218/15C03C2218/31
Inventor 张颖苑永涛李海龙程云涛刘红方敬忠
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com