Plane-grating-measurement-based dynamic-magnetic-steel magnetic levitation dual-stage vector arc switching method and device

Abstract

The invention provides a plane-grating-measurement-based dynamic-magnetic-steel magnetic levitation dual-stage vector arc switching method and device and belongs to the technical field of semiconductor manufacture equipment. The plane-grating-measurement-based dynamic-magnetic-steel magnetic levitation dual-stage vector arc switching device comprises a support framework, a balancing mass block, wireless charging and wireless communication magnetic levitation stages, a stage measurement device and a stage driving device, wherein the two stages work between a measurement site and an exposure site; the positions of the stages are measured by plane gratings; a passive compensation structure formed by both a planar leaf spring and an electromagnetic damper is adopted for motion compensation for the balancing mass block; the stages are driven by a dynamic-magnetic-steel magnetic levitation planar motor; in the switching process of the two stages, the planar motor drives the two stages to achieve quick single-beat arc switching. The invention solves the problem that a conventional switching scheme is more in beat, long in track, more in start and stop process, long in stabilizing time, large in cable interference and the like, the switching processes are reduced, the switching time is shortened, and the productivity of a lithography machine is improved.

Description

technical field [0001] The invention belongs to the technical field of semiconductor manufacturing equipment, and mainly relates to a method and a device for a moving magnet steel maglev double workpiece table vector arc return conversion table based on plane grating measurement. Background technique [0002] Lithography machine is one of the important ultra-precision equipment in the manufacture of very large scale integrated circuits. As the key subsystem of the lithography machine, the workpiece table largely determines the resolution, overlay accuracy and productivity of the lithography machine. [0003] Productivity is one of the main goals of lithography machine development. Under the condition of satisfying the resolution and overlay accuracy, improving the operating efficiency of the workpiece table and thus improving the productivity of the lithography machine is the development direction of the workpiece table technology. The most direct way to improve the operat...

AI Technical Summary

Problems solved by technology

However, the transposition of the workpiece table by rotating the entire base has problems such as large moment of inertia, difficulty in precise positioning of high-power rotary motors, and high heat generation that cause system temperature rise. At the same time, the radius of gyration is large, which significantly increases the structure of the main body of the lithography machine.

Chinese patent CN102495528 adopts a rotary transfer table in the center of the abutment to complete the exchange of double workpiece tables. The table change is divided into three beats, which improves the efficiency of the table change. However, the structure of the rotary transfer table is complicated and the rotary positioning accuracy is low.

The workpiece table moves at a high speed, and the measurement scheme must meet the high-speed measurement and precision requirements. In US patents US6498350B2 and US20100279232A1, multiple laser interferometers are used to measure the position of a workpiece table. The laser interferometer has high measurement accuracy, The working distance is long, but the measurement optical path is too long, it is very sensitive to errors caused by humidity and air turbulence, and the cost is high

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