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Novel helium ion sputtering-resistant vanadium alloy and preparation method thereof

A technology of helium ion and vanadium alloy, which is applied in the field of new anti-helium ion sputtering vanadium alloy and its preparation, can solve the problems of affecting the performance of the alloy, easy oxidation, and not suitable for large-scale production, so as to improve the yield and cost-effective , Blistering and Peeling Reduction Effects

Inactive Publication Date: 2016-04-20
MATERIAL INST OF CHINA ACADEMY OF ENG PHYSICS
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Problems solved by technology

[0013] The preparation methods of V-4Cr-4Ti-Y alloy ingots reported in these two documents are all prepared by magnetic levitation melting method, which is not suitable for large-scale production; meanwhile, the addition form of yttrium is metal yttrium, because metal yttrium is very active, in It is very easy to oxidize before adding, so it also seriously affects the performance of the alloy

Method used

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  • Novel helium ion sputtering-resistant vanadium alloy and preparation method thereof
  • Novel helium ion sputtering-resistant vanadium alloy and preparation method thereof
  • Novel helium ion sputtering-resistant vanadium alloy and preparation method thereof

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Embodiment

[0055] The invention provides a novel anti-helium ion sputtering vanadium alloy, which is a V-Cr-Ti-Y alloy, and the weight percentages of various components are: Cr (chromium): 3.0-6.5%, Ti (titanium) : 3.0 to 6.5%, Y (yttrium): 0.1 to 2.0%, V (vanadium): balance.

[0056] Such as figure 1 Shown, the present invention prepares the method for this kind of novel anti-helium ion sputtering vanadium alloy as follows:

[0057] (1) Using pure vanadium dendrites, pure titanium particles, pure chromium particles, and titanium-yttrium master alloy as raw materials, after surface pretreatment, prepare materials respectively according to the weight percentage of the vanadium alloy composition;

[0058] (2) Mix various raw materials, then use non-consumable arc melting furnace or consumable arc melting furnace to melt the mixed raw materials, and make V-Cr-Ti-Y alloy ingots through casting; this implementation In the example, the smelting and pouring of the alloy are carried out under ...

example 1

[0069] (1) Select the V-4.4Cr-4.3Ti-0.3Y alloy composition ratio to form a vanadium alloy. The preparation method includes the following steps:

[0070] 1) Ingredients: Pure V dendrites (99.9wt.%), pure Ti particles (99.9wt.%), pure Cr particles (99.9wt.%), Ti-20Y master alloy (the actual detection content of yttrium is 20.3wt.%) ) is alloying raw material, carries out batching according to the weight percentage of above-mentioned vanadium alloy;

[0071] 2) Melting: Melting, stirring, cooling and solidifying in a non-consumable arc melting furnace under an argon protective atmosphere with a purity higher than 99.99% to prepare alloy ingots;

[0072] 3) Homogenization treatment: cast the alloy ingot obtained in the previous step in a vacuum degree better than 1×10 -3 Homogenization annealing under the condition of Pa, the annealing temperature is 900°C, the time is 10 hours, and the heating time is 90min;

[0073] 4) Sheath: Prepare a stainless steel sheath for encapsulating...

example 2

[0081] (1) Select the V-4.4Cr-4.3Ti-0.5Y alloy composition ratio to form a vanadium alloy. The preparation method includes the following steps:

[0082] 1) Ingredients: Pure V dendrites (99.9wt.%), pure Ti particles (99.9wt.%), pure Cr particles (99.9wt.%), Ti-20Y master alloy (the actual detection content of yttrium is 20.3wt.%) ) is alloying raw material, carries out batching according to the weight percentage of above-mentioned vanadium alloy;

[0083] 2) Melting: Melting, stirring, cooling and solidifying in a non-consumable arc melting furnace under an argon protective atmosphere with a purity higher than 99.99% to prepare alloy ingots;

[0084] 3) Homogenization treatment: cast the alloy ingot obtained in the previous step in a vacuum degree better than 1×10 -3 Homogenization annealing under the condition of Pa, the annealing temperature is 900°C, the time is 10 hours, and the heating time is 90min;

[0085] 4) Sheath: Prepare a stainless steel sheath for encapsulating...

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Abstract

The invention discloses a novel helium ion sputtering-resistant vanadium alloy. The problem of low helium ion sputtering resistance of the prior art is solved. The alloy comprises the following components in percentage by weight: 3.0 to 6.5 percent of Cr, 3.0 to 6.5 percent of Ti, 0.1 to 2.0 percent of Y and the balance of V. In addition, the invention further provides a method for preparing the alloy. According to the vanadium alloy, on the basis of a V-Cr-Ti ternary alloy system, Cr and Ti are employed as main alloy elements, the rare earth element Y is added to reduce the content of solid solution oxygen in the vanadium alloy and reduce the dimensions of ingot crystals by virtue of a simple alloying means, and a plastic deformation machining means is combined to disperse and distribute yttrium oxide with stable high-temperature performance on a substrate and remarkably reduce and uniformize the dimensions of the annealed alloy crystals, thereby improving the toughness of the alloy and greatly enhancing the helium ion sputtering resistance of the alloy.

Description

technical field [0001] The invention relates to the technical field of preparation of vanadium alloy, a candidate structural material for fusion reactors, in particular to a novel vanadium alloy resistant to helium ion sputtering and a preparation method thereof. Background technique [0002] Compared with other structural materials, vanadium alloy has the advantages of excellent low activation characteristics, high temperature strength and low ductile-brittle transition temperature. Attention, and the most promising application in Li / V cladding. After systematic and in-depth research, and based on a number of performance assessment results, the United States, Japan and other countries first recommended V-4Cr-4Ti as a candidate material for fusion reactor structural materials. All α particles will irradiate and sputter V-4Cr-4Ti alloy with helium ions, resulting in bubbling and peeling on the surface. Therefore, the ability of V-4Cr-4Ti alloy to resist helium ion sputtering...

Claims

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Application Information

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IPC IPC(8): C22C27/02C22C1/03C22F1/18
CPCC22C1/03C22C27/025C22F1/18
Inventor 彭丽霞赖新春蒋春丽胡殷龙重
Owner MATERIAL INST OF CHINA ACADEMY OF ENG PHYSICS
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