The invention discloses a
silicon-based substrate structure for
semiconductor epitaxial
stress regulation and control and a preparation method of the
silicon-based substrate structure, and belongs to the technical field of
semiconductor materials. The method comprises the following steps: firstly prefabricating vacancy gradient in a
silicon body by adopting silicon self-ions or
inert heavy ions, and then performing
helium ion implantation with a relatively
low dose, so that
helium atoms selectively nucleate in the formed vacancy gradient and grow through unified annealing to obtain a pore
volume fraction which continuously changes along with depth. According to the invention, through a division cooperation mechanism of'vacancy
prefabrication 'and'
helium pore-forming', a
coupling relationship between vacancy and gas is not generated by single helium injection any more, so that a pore gradient and a Young modulus gradient which can be designed and continuously adjusted in the thickness direction are realized, the
controllability, stability and process compatibility of a pore-forming structure are remarkably improved, and the production cost is reduced. By constructing a modulus gradient structure in the silicon body, the problems of
wafer warping, device layer
cracking, bonding failure and the like are reduced.