36results about How to "Good repeatability of the preparation process" patented technology

The invention discloses self-lubricating wear-resistant AlCrN / MoS2 nanometer composite film and a preparation method of the self-lubricating wear-resistant AlCrN / MoS2 nanometer composite film and belongs to the technical field of films. The AlCrN / MoS2 nanometer composite film is prepared on a cutter matrix by the adoption of high-power pulse and pulse direct current magnetic control combined filmcoating technology; in the deposition process, bias voltage is adjusted to be -50 - -150 V, and then mixed gas of N2 and Ar is fed; the work atmosphere pressure is kept at 0.5-1.0 Pa, the power of a AlCr target is kept at 0.5-1.0 kW, the power of the MoS2 target is 0.05-0.3 kW, and after deposition, the AlCrN / MoS2 nanometer composite film is obtained. The prepared AlCrN / MoS2 nanometer composite film has good lubricating performance, can significantly improve the wear resistance of the matrix and has good chemical stability, and wear debris is prone to transferring to a friction interface to form a lubricating film.

The invention discloses an epoxy resin-based nanometer composite material. The epoxy resin-based nanometer composite material comprises the following materials in percentage by weight: 91%-99% of E-51 type epoxy resin matrix and 1%-9% of organic rectorite, wherein the E-51 type epoxy resin matrix comprises the following components in percentage by weight (based on 100% of the total weight of the components): 3.5%-5% of 2-ethyl-4-methyl imidazole and 95%-96.5% of E-51 prepolymer. The invention further discloses a preparation method of the composite material. The preparation method of the composite material comprises the following steps of: heating up the E-51 prepolymer; adding the heated E-51 prepolymer to the organic rectorite for continuously stirring and moving a beaker to an oven for 4 hours to 6 hours; dropping 2-ethyl-4-methyl imidazole for continuously stirring, and moving the beaker to the vacuum oven for vacuum-pumping; moving out the beaker and casting the reaction mixture to a mould, moving the mould to the oven for carrying out vacuum-pumping on the oven, and starting curing; and flatly placing the oven under room temperature to obtain the epoxy resin-based nanometer composite material. The prepared epoxy resin-based nanometer composite material is good in comprehensive performance, good in flame resistance and heat resistance, and can be used for conventional EP (Epoxy Resin).

The invention provides a two-step hydrothermal synthesis of lead-free piezoelectric ceramics K 0.65 Na 0.35 NbO 3 In the powder method, excess potassium hydroxide and sodium hydroxide are respectively used as potassium source and sodium source, dissolved in deionized water; 3 , NaNbO 3 The precursor solution; after the precursor solution is sealed in a hydrothermal kettle, put it into a constant temperature box for hydrothermal synthesis at a certain temperature, after the reaction is completed and cooled to room temperature, the powder obtained by the reaction is washed several times with deionized water, Finally dry. After grinding process, accurately weigh KNbO 3 , NaNbO 3 The powder is mixed in deionized water; after stirring, it is shaken by microwave; it is poured into a hydrothermal reaction kettle and sealed for hydrothermal synthesis. After the reaction is completed, it is cooled to room temperature, and the resulting mixed solution is fully dried to obtain a powder. Adopt two-step hydrothermal method to synthesize K among the present invention 0.65 Na 0.35 NbO 3 Powder, the preparation process has good repeatability, the material composition ratio is accurate, the powder has good uniformity, high purity, complete grain development and uniform distribution.

The invention discloses an AlCrTiSiCN coating structure and a preparing method thereof. The AlCrTiSiCN coating structure comprises a base body, an Al-Cr-Ti alloy transition layer and an AlCrTiSiCN coating, the Al-Cr-Ti alloy transition layer and the base body are combined, the AlCrTiSiCN coating and the Al-Cr-Ti alloy transition layer are combined, and the AlCrTiSiCN coating forms a nano-compositestructure coating with amorphous phase Si3N4 wrapping nanocrystalline phases including AlN, TiN, CrN, Al8SiC7,Cr2N0.39C0.16 and the like. The nano-composite AlCrTiSiCN coating is stable in chemical properties and does not make contact with common chemical corrosive media. The nanocrystalline phases in the coating can effectively prevent generation and development of microcracks, and the coating toughness is greatly improved. The AlCrTiSiCN coating has the high hardness and toughness and is good in wear-resisting property. The AlCrTiSiCN coating is even in thickness and compact in structure, and the good bonding strength with the base body is achieved.

The invention relates to a laser structure and a method for measuring AlGaN / GaN superlattice resistivity in a GaN-based semiconductor laser. The laser for measuring the optical confinement layer resistivity of AlGaN / GaN superlattice is divided into two types of lasers with an n-type or p-type AlGaN / GaN superlattice optical confinement layers of different thicknesses; the serial resistance of eachtype of laser is determined through measuring the I-V (current / voltage) characteristic curve of the laser; the difference of the serial resistance of the laser for the AlGaN / GaN superlattice optical confinement layers of different thicknesses is the resistance of the AlGaN / GaN superlattice of changed thicknesses, thus the resistivity of the AlGaN / GaN superlattice optical confinement layers can beobtained. Through utilizing the laser with the structure, the resistivity of the n-type and p-type AlGaN / GaN superlattice optical confinement layers in the GaN-based semiconductor laser can be measured respectively, and reference data is provided for the structural design and development manufacturing of the GaN-based semiconductor laser.

The invention discloses a novel helium ion sputtering-resistant vanadium alloy. The problem of low helium ion sputtering resistance of the prior art is solved. The alloy comprises the following components in percentage by weight: 3.0 to 6.5 percent of Cr, 3.0 to 6.5 percent of Ti, 0.1 to 2.0 percent of Y and the balance of V. In addition, the invention further provides a method for preparing the alloy. According to the vanadium alloy, on the basis of a V-Cr-Ti ternary alloy system, Cr and Ti are employed as main alloy elements, the rare earth element Y is added to reduce the content of solid solution oxygen in the vanadium alloy and reduce the dimensions of ingot crystals by virtue of a simple alloying means, and a plastic deformation machining means is combined to disperse and distribute yttrium oxide with stable high-temperature performance on a substrate and remarkably reduce and uniformize the dimensions of the annealed alloy crystals, thereby improving the toughness of the alloy and greatly enhancing the helium ion sputtering resistance of the alloy.

The invention relates to a method for compounding one dimension single crystal bismuth oxide nanometer material, which comprises the following procedures: (1) Alpha phase bismuth oxide is used as rawmaterial, a mineralizer is sulphate; the molar ratio of the Alpha phase bismuth oxide and the sulphate is 1 / 3-1 / 50; solvent is water; after deionized water is added, the concentration of the Alpha phase bismuth oxide raw material is 0.01M-1.0M; (2) after being dispersed evenly in the deionized water, the raw material and the mineralizer are put into a reaction kettle with a polyfluortetraethylenelining; (3) the reaction kettle is placed in an oven for 2-48 hours at the temperature of 110-200 DEG C for thermal insulation; then the reaction kettle is cooled to the room temperature; a hopper isused for suction filtering; after being washed by the deionized water, a flaxen one dimension single crystal Alpha-Bi2O3 nanometer material is obtained. The raw material of the method is cheap and easy to get; the equipment is simple; the operation is safe and reliable; the material is pollution-free to the environment; the product has the bigger specific surface; the productivity is high; the repetitiveness of the preparation technique is good.

The invention discloses a method for preparing Cu micro-nano flake structure by chemical dealloying, comprising the following steps: (1) additively manufacturing Cu-Ni-Fe metastable eutectic structure: pure Cu, pure Ni and pure Fe After the powders are mixed in an atomic ratio of 17-18:17-18:62-68, the Cu-Ni-Fe metastable eutectic structure is prepared by an additive manufacturing system; (2) dealloying: the obtained The Cu-Ni-Fe metastable eutectic structure was placed in a 0.03-0.07mol / L nitric acid solution, and placed at room temperature for 2-8 hours to carry out chemical dealloying; (3) Cleaning and drying: after the obtained dealloying The Cu-Ni-Fe metastable eutectic structure was taken out, soaked and cleaned with deionized water and alcohol in turn, and dried to obtain a Cu micro-nano sheet-like structure. The preparation method obtains a Cu-Ni-Fe metastable structure through an additive manufacturing system, and uses a simple chemical dealloying method to prepare a Cu micro-nano flake structure, which provides a new technical approach for the preparation of complex metal micro-nano structures.

The invention relates to a nanocomposite coating and a preparation technology of the nanocomposite coating, in particular to a preparation process for a high-Al-content AlCrN nanocomposite coating. The AlCrN nanocomposite coating is prepared on a metal or cemented carbide substrate by the adoption of an electric arc ion plating technology. Pure metal Al and Cr are used as targets, and the content of Al and Cr in the coating is adjusted and controlled by controlling the current of the Al targets and the Cr targets. The four pure Cr targets and the four pure Al targets are evenly distributed on the inner wall of a furnace body at intervals. Ar gas is introduced firstly before film plating, the bias pressure of 600-1,000 V is adopted, glow cleaning is conducted on the substrate for 10-20 min, then the Cr targets are opened, bombardment cleaning is conducted on the substrate, the bias pressure is gradually lowered to 30-100 V, and the metal Cr layer is deposited. The preparation process of the AlCrN nanocomposite coating is simple, and industrial production is facilitated; and the prepared AlCrN coating has the high hardness and strength and good high-temperature and oxidation resistance and corrosion resistance.

The invention discloses a CrAlN nano-gradient coating with high hardness and high binding force and a preparation process thereof, belonging to the technical field of coating preparation. The CrAlN nano-gradient coating was prepared on the substrate by arc ion plating and magnetron sputtering composite plating technology. Ar gas was introduced before coating, and the substrate was glow-cleaned for 10-30 minutes with a bias voltage of -600-1000V. Then turn on the Cr target, and gradually reduce the bias voltage to -20 ~ -100V, deposit the metal Cr transition layer for 5 ~ 20min; 2 , keeping for 5-40min to deposit the CrN layer; turn on the Al target, increase the power of the Al target linearly, and deposit the CrAlN nanometer gradient coating with continuously changing composition. The CrAlN nano-gradient coating involved in the invention has compact structure, high hardness, high binding force with the substrate, simple preparation process, good repeatability, and easy industrial production.