Raw material for high-speed growth of silicon carbide crystals and silicon carbide crystal growing method
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- TAIZHOU BEYOND TECH
- Publication Date
- 2016-05-25
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a raw material for high-speed growth of silicon carbide crystals and a growth method of silicon carbide crystals, belonging to the technical field of semiconductors. Background technique
[0002] Silicon carbide single crystal has unique characteristics such as large band gap, high breakdown electric field, large thermal conductivity, small dielectric constant, and stable physical and chemical properties. It is considered to be an ideal semiconductor for manufacturing optoelectronic devices, high-frequency high-power devices, etc. Material.
[0003] Conventionally, as a method of producing silicon carbide crystals, a single crystal or polycrystal of silicon carbide is generally formed by sublimating and recrystallizing raw material silicon carbide powder under high temperature conditions, and growing on silicon carbide seed crystals. As we all know, silicon carbide powder as a raw material plays an important role in the speed ...