Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Mask for quartz glass acid etching and acid etching method for quart glass pendulous reed

A quartz glass and acid etching technology, applied in the field of acid etching of quartz glass acid etching mask and quartz glass swing piece, can solve the problem of poor batch consistency, high mold processing cost, and difficulty in ensuring the assembly of the pressure plate swing piece Alignment and other issues to achieve the effect of improving dimensional accuracy

Active Publication Date: 2016-06-22
CHINA BUILDING MATERIALS ACAD
View PDF6 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, there are following deficiencies in the above method: (1) fluorosilicone rubber cannot withstand hydrofluoric acid for a long time; (2) in order to ensure that the flexible beam of the pendulum plate is consistent up and down and left and right symmetrical, the dimensional accuracy of the pressure plate in the special mold is high, so that This leads to high mold processing costs; (3) It is also difficult to ensure the assembly alignment of the pressure plate, mask, and swing piece during the installation process, and the batch consistency is poor

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask for quartz glass acid etching and acid etching method for quart glass pendulous reed
  • Mask for quartz glass acid etching and acid etching method for quart glass pendulous reed

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] An embodiment of the present invention proposes a mask for quartz glass acid etching, which uses fluorocarbon glue as a matrix, and adjusts the properties of the glue film by adding 5-15% of the curing agent and 1-20% of the diluent; wherein , The fluorocarbon glue is a polymer obtained by substituting some or all hydrogen atoms in polyethylene or polypropylene with fluorine atoms, and the solid content is greater than 50%. The specific preparation method of the above-mentioned quartz glass acid etching mask is as follows: mixing the fluorocarbon glue, curing agent and diluent, stirring, standing for 30-45 minutes, and discharging the air bubbles in the glue solution. Described curing agent and diluent are used in conjunction with the above-mentioned fluorocarbon glue: curing agent is not only a necessary substance for fluorocarbon paint drying, but also an important component of fluorocarbon glue film-forming substances; the effect of diluent is to adjust the viscosity ...

Embodiment 2

[0036] The embodiment of the present invention also proposes an acid etching method for the flexible beam of the quartz glass swing plate, which mainly includes the steps of mask coating, pattern cutting, heating and curing, etching and stripping.

[0037] The mask coating step is to apply a mask on the surface of the quartz glass substrate, the mask covers the entire surface of the quartz glass substrate, and the mask is used for the above-mentioned quartz glass acid etching. Mask, the coating thickness of the mask on the surface of the quartz glass is 0.05-0.2mm; preferably, first coat the mask on the first surface of the quartz glass substrate, and carry out natural curing; then, on the quartz glass The second surface and sides are coated with a mask, and then cured naturally. The natural curing means that the adhesive film is cured under the action of the curing agent for about 8-10 hours at room temperature. The naturally cured adhesive film is elastic, has weak adhesion ...

example 6

[0043]For the acid etching method of the flexible beam of the quartz glass swing plate, first prepare the mask glue described in Example 1. Clean the glass substrate to remove impurities such as dust and oil, and wipe the substrate with a dust-free cloth. Use the centrifuge homogenizer to coat the mask glue described in Example 1 to the glass substrate. The area of ​​the glass substrate is 380mm 2 , the amount of glue required for each side is 0.05ml; fix the glass substrate on the homogenizer and set it to a slow speed (2-5rad / s), use a straw to suck 0.05ml of mixed glue onto the center of the first surface of the glass substrate, After the mask glue is evenly applied to the outer edge of the substrate, it is removed and cured naturally for 8 hours. Then reconfigure the mask glue described in the above example 1, apply glue to the second surface in the same way, and the glue film is 0.12mm thick. After the mask glue is naturally cured, it can be cut with an ultraviolet las...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
areaaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention provides a mask for quartz glass acid etching and an acid etching method for a quart glass pendulous reed.Fluorocarbon rubber serves as a matrix of the mask, and the properties of a coating are adjusted by adding, by mass, 5-15% of a curing agent and 1-20% of diluent, wherein fluorocarbon rubber is polymer obtained by substituting part of or all hydrogen atoms in polyethylene or polypropylene with fluorine atoms.The mask is excellent in hydrofluoric acid resistance, by means of the acid etching method of the mask, no special brass or tetrafluoroethylene mold is needed, dimensional precision is high, and machining cost can be lowered.

Description

technical field [0001] The invention relates to a mask and a method for preparing a quartz glass pendulum, in particular to a mask for acid etching of quartz glass and an acid etching method for the quartz glass pendulum. Background technique [0002] At present, the acid etching process of the flexible beam of the quartz glass pendulum uses a special etching mold such as brass and tetrafluoroethylene and an acid-resistant fluorosilicone rubber mask to protect the parts that do not need to be etched. The glass is in close contact; the mask is processed by mechanical pressing or laser cutting to make it the same shape as the pressing plate, and only a rectangular hole is exposed to etch the flexible beam of the quartz glass swing piece, and then it is placed in hydrogen at a certain concentration and temperature Acid etching in hydrofluoric acid solution. [0003] However, there are following deficiencies in the above method: (1) fluorosilicone rubber cannot withstand hydrof...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00C08L23/28
CPCC03C15/00C08J5/18C08J2323/28C08L23/28C08L2203/16
Inventor 杜秀蓉宋学富张晓强孙元成王慧
Owner CHINA BUILDING MATERIALS ACAD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com