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Preparation method of back junction N type solar battery, back junction N type solar battery, back junction N type solar battery assembly and back junction N type solar battery system

A solar cell, N-type technology, applied in the field of solar cells, can solve the problems of loss of open circuit voltage, high proportion of silver-containing paste, serious metal recombination, etc., to improve open circuit voltage, reduce silver paste consumption, and reduce production. cost effect

Inactive Publication Date: 2016-06-22
TAIZHOU ZHONGLAI PHOTOELECTRIC TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The p+ doped layer generally uses aluminum-doped silver paste to make electrodes, but the price of aluminum-doped silver paste is relatively expensive, which leads to a high proportion of silver-containing paste in battery manufacturing costs
In addition, although the aluminum-doped silver paste can form a good ohmic contact with the p+ doped layer, the metal recombination under it is very serious, which will lose a large part of the open circuit voltage

Method used

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  • Preparation method of back junction N type solar battery, back junction N type solar battery, back junction N type solar battery assembly and back junction N type solar battery system
  • Preparation method of back junction N type solar battery, back junction N type solar battery, back junction N type solar battery assembly and back junction N type solar battery system
  • Preparation method of back junction N type solar battery, back junction N type solar battery, back junction N type solar battery assembly and back junction N type solar battery system

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Embodiment 1

[0031] see figure 1 , Figure 3 to Figure 9 As shown, the preparation method of the back-junction N-type solar cell in this embodiment includes the following steps:

[0032] (1), prepare the back-junction N-type solar cell before metallization, comprise N-type crystalline silicon substrate 10, the front surface of N-type crystalline silicon substrate 10 comprises the n+ doped region 12 and front surface passivation reduction successively from inside to outside The reverse film 14 ; the back surface of the N-type crystalline silicon substrate 10 includes a p+ doped region 16 and a passivation film 18 on the back surface sequentially from inside to outside. Wherein the passivation anti-reflection film 14 on the front surface is SiO 2 and SiN x A composite dielectric film composed of a dielectric film, the passivation film 18 on the back surface is SiO 2 、SiN x and Al 2 o 3 One or more of the dielectric films. The thickness of the N-type crystalline silicon substrate 10 i...

Embodiment 2

[0038] see Figure 1 to Figure 9 As shown, the preparation method of the back-junction N-type solar cell in this embodiment includes the following steps:

[0039] (1), prepare the back-junction N-type solar cell before metallization, comprise N-type crystalline silicon substrate 10, the front surface of N-type crystalline silicon substrate 10 comprises the n+ doped region 12 and front surface passivation reduction successively from inside to outside The reverse film 14 ; the back surface of the N-type crystalline silicon substrate 10 includes a p+ doped region 16 and a passivation film 18 on the back surface sequentially from inside to outside. Wherein the passivation anti-reflection film 14 on the front surface is SiO 2 and SiN x A composite dielectric film composed of a dielectric film, the passivation film 18 on the back surface is SiO 2 、SiN x and Al 2 o 3 One or more of the dielectric films. The thickness of the N-type crystalline silicon substrate 10 is 50-300 μm;...

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Abstract

The invention discloses a preparation method of a back junction N type solar battery, a back junction N type solar battery, a back junction N type solar battery assembly and a back junction N type solar battery system. According to the preparation method of the back junction N type solar battery, an N type crystalline silicon substrate is processed; a slotted structure penetrating a passivation film is formed on the back surface of the N type crystalline silicon substrate; aluminium paste is printed on the back surface of the N type crystalline silicon substrate, thus forming a back aluminium electrode; silver paste is printed on the back surface of the N type crystalline silicon substrate, thus forming a back silver master gate electrode; the silver paste is printed on the front surface of the N type crystalline silicon substrate, thus forming a front electrode; and sintering is carried out, thus forming the back junction N type solar battery. The method, the battery, the assembly and the system provided by the invention has the advantages that the passivation film on the back surface is slotted; the aluminium paste is printed; the aluminium paste forms partial contact with the p+ doped layer on the back surface, only at the location of the slotted pattern; compared with the method of printing the electrode by aluminium doped silver paste, the method provided by the invention has the advantages of improving the open-circuit voltage of the battery, greatly reducing silver paste consumption of the battery sheet and reducing the preparation cost of the battery sheet.

Description

technical field [0001] The invention relates to the field of solar cells, in particular to a preparation method of a back-junction N-type solar cell and the cell, component and system thereof. Background technique [0002] A solar cell is a semiconductor device that converts solar energy into electricity. At present, the mainstream products in the industry are P-type crystalline silicon cells. The battery process is simple, but it has a light-induced decay effect, that is, the efficiency of the battery will gradually decay with time, which is mainly due to the combination of boron atoms doped into the P-type silicon substrate and oxygen atoms in the substrate. Produces boron-oxygen pair results. Studies have shown that the boron-oxygen pair acts as a carrier trap, reducing the minority carrier lifetime, which leads to the attenuation of the photoelectric conversion efficiency of the battery. Compared with P-type crystalline silicon cells, N-type solar cells have the advan...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/0224H01L31/068H01L31/18
CPCH01L31/022425H01L31/022441H01L31/0682H01L31/1804Y02E10/547Y02P70/50
Inventor 林建伟孙玉海刘志锋季根华张育政
Owner TAIZHOU ZHONGLAI PHOTOELECTRIC TECH CO LTD
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