High-purity octafluorocyclobutane purification method and system

A technology of octafluorocyclobutane and purification method, which is applied in the field of purification of high-purity octafluorocyclobutane, can solve problems such as difficulties, failure to achieve rectification purification, low purity, etc., and achieve simple structure, high product purity, Simple process and reliable effect

Inactive Publication Date: 2016-07-20
FOSHAN HUATE GASES +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The purity of the existing industrialized octafluorocyclobutane in my country is relatively low, only 99.9%. In addition to difluorochloromethane and hexafluoropropylene, it also contains a large amount of other fluorocarbons (such as HCl3, CCl2F2, CHClF2, C2HF5, C3F6, collectively referred to as "Other Organics" in the industry), and its boiling point is similar to that of octafluorocyclobutane (eight The boiling point of fluorocyclobutane is -6.04°

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  • High-purity octafluorocyclobutane purification method and system
  • High-purity octafluorocyclobutane purification method and system

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Embodiment Construction

[0025] Specific embodiments of the present invention are given below to further describe the composition of the present invention in detail.

[0026] The purification method of the high-purity octafluorocyclobutane of the present embodiment comprises the following steps successively:

[0027] Step A, system cleaning, purging the purification system with nitrogen gas, and vacuumizing the purification system after purging. Because there are various impurities in the whole purification system, these impurities may affect the purification effect of the octafluorocyclobutane product, therefore, the whole purification system needs to be purged with inert gas nitrogen; in addition, in order to allow The mixed gas inside the purification system is reduced, and the feed rate is increased, and the purification system is vacuumed until the gas pressure inside the system is below 5pa.

[0028] Step B1, the initial stage of adsorption, the raw material is adsorbed by the primary adsorber,...

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Abstract

The invention relates to a high-purity octafluorocyclobutane purification method, wherein the method comprises the following steps: step A, system cleaning: using nitrogen gas for purging a purification system, and after purging, vacuumizing the purification system; step B, low-boiling fraction removal and rectification; step C, high-boiling fraction removal and rectification; step D, finished production bottling: filling a preservation container with gas phase of a high-boiling fraction removal and rectification tower to obtain the finished product. The invention relates to a high-purity octafluorocyclobutane purification system including a primary adsorber, a low-boiling fraction removal and rectification tower, the high-boiling fraction removal and rectification tower, a membrane compressor, a first deep adsorber and a second deep adsorber. The high-purity octafluorocyclobutane purification method has simple and reliable process, and the finally obtained octafluorocyclobutane has high purity; the high-purity octafluorocyclobutane purification system has the advantages of simple structure, and has no need for large area reconstruction of conventional equipment.

Description

technical field [0001] The invention relates to the field of gas purification, in particular to a purification method and system for high-purity octafluorocyclobutane. Background technique [0002] Octafluorocyclobutane has stable chemical properties, non-toxicity, zero ozone depletion index, and low greenhouse effect potential. It is a green and environmentally friendly special gas. It has been widely used in the fields of high-voltage insulation, refrigeration, and semiconductor manufacturing in recent years. With the implementation of the Montreal Protocol and the rapid growth of the electronics industry, its role is becoming more and more important, and its usage is also increasing year by year. [0003] Octafluorocyclobutane is one of the etching or cleaning gases commonly used in semiconductor processes. With the upgrading of semiconductor devices, the requirements for the purity of etching and cleaning gases are becoming more and more stringent, and the concept of "ul...

Claims

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Application Information

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IPC IPC(8): C07C17/38C07C23/06
CPCC07C17/38C07C23/06
Inventor 马建修陈艳珊廖恒易
Owner FOSHAN HUATE GASES
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